SG11201610107TA - Centrifugal casting of polymer polish pads - Google Patents

Centrifugal casting of polymer polish pads

Info

Publication number
SG11201610107TA
SG11201610107TA SG11201610107TA SG11201610107TA SG11201610107TA SG 11201610107T A SG11201610107T A SG 11201610107TA SG 11201610107T A SG11201610107T A SG 11201610107TA SG 11201610107T A SG11201610107T A SG 11201610107TA SG 11201610107T A SG11201610107T A SG 11201610107TA
Authority
SG
Singapore
Prior art keywords
centrifugal casting
polish pads
polymer polish
polymer
pads
Prior art date
Application number
SG11201610107TA
Inventor
Gary Quigley
Jorge Craik
Kevin Song
Koli Holani
Long Nguyen
Matt Richardson
Pepito Galvez
Peter Mckeever
Thomas West
Original Assignee
Thomas West Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/297,177 external-priority patent/US10722997B2/en
Application filed by Thomas West Inc filed Critical Thomas West Inc
Publication of SG11201610107TA publication Critical patent/SG11201610107TA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B24D11/003—Manufacture of flexible abrasive materials without embedded abrasive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C41/04—Rotational or centrifugal casting, i.e. coating the inside of a mould by rotating the mould
    • B29C41/042—Rotational or centrifugal casting, i.e. coating the inside of a mould by rotating the mould by rotating a mould around its axis of symmetry

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
SG11201610107TA 2014-06-05 2015-05-14 Centrifugal casting of polymer polish pads SG11201610107TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/297,177 US10722997B2 (en) 2012-04-02 2014-06-05 Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
PCT/US2015/030903 WO2015187338A1 (en) 2014-06-05 2015-05-14 Centrifugal casting of polymer polish pads

Publications (1)

Publication Number Publication Date
SG11201610107TA true SG11201610107TA (en) 2017-01-27

Family

ID=54767168

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610107TA SG11201610107TA (en) 2014-06-05 2015-05-14 Centrifugal casting of polymer polish pads

Country Status (4)

Country Link
KR (1) KR102376599B1 (en)
SG (1) SG11201610107TA (en)
TW (1) TWI665033B (en)
WO (1) WO2015187338A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10722997B2 (en) 2012-04-02 2020-07-28 Thomas West, Inc. Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
US11090778B2 (en) 2012-04-02 2021-08-17 Thomas West, Inc. Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods
US11219982B2 (en) 2012-04-02 2022-01-11 Thomas West, Inc. Method and systems to control optical transmissivity of a polish pad material

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI717183B (en) * 2020-01-03 2021-01-21 銓科光電材料股份有限公司 Wafer polishing pad
DE102022126743A1 (en) * 2022-10-13 2024-04-18 Ernst-Abbe-Hochschule Jena Körperschaft des öffentlichen Rechts Tool for material removal and method for its manufacture

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7374644B2 (en) * 2000-02-17 2008-05-20 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
JP3377780B2 (en) * 2000-09-05 2003-02-17 ヤマウチ株式会社 Method for producing elastic cylinder, method for producing elastic roll, elastic cylinder and elastic roll
WO2003103959A1 (en) * 2002-06-07 2003-12-18 Praxair S.T. Technology, Inc. Controlled penetration subpad
US8602851B2 (en) * 2003-06-09 2013-12-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Controlled penetration subpad
US6752690B1 (en) * 2002-06-12 2004-06-22 Clinton O. Fruitman Method of making polishing pad for planarization of semiconductor wafers
TWI264043B (en) * 2002-10-01 2006-10-11 Tokyo Electron Ltd Method and system for analyzing data from a plasma process
US8864859B2 (en) * 2003-03-25 2014-10-21 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
AU2004225931A1 (en) * 2003-03-25 2004-10-14 Neopad Technologies Corporation Chip customized polish pads for chemical mechanical planarization (CMP)
US6986705B2 (en) * 2004-04-05 2006-01-17 Rimpad Tech Ltd. Polishing pad and method of making same
US7452265B2 (en) * 2006-12-21 2008-11-18 3M Innovative Properties Company Abrasive article and methods of making same
US20080274674A1 (en) * 2007-05-03 2008-11-06 Cabot Microelectronics Corporation Stacked polishing pad for high temperature applications
KR101021783B1 (en) * 2009-02-25 2011-03-17 엠.씨.케이 (주) Polishing pad manufacturing device and manufacturing process using it
TWI396602B (en) * 2009-12-31 2013-05-21 Iv Technologies Co Ltd Method of manufacturing polishing pad having detection window and polishing pad having detection window
KR102100654B1 (en) * 2012-04-02 2020-04-14 토마스 웨스트 인코포레이티드 Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10722997B2 (en) 2012-04-02 2020-07-28 Thomas West, Inc. Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
US11090778B2 (en) 2012-04-02 2021-08-17 Thomas West, Inc. Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods
US11219982B2 (en) 2012-04-02 2022-01-11 Thomas West, Inc. Method and systems to control optical transmissivity of a polish pad material

Also Published As

Publication number Publication date
TW201607643A (en) 2016-03-01
WO2015187338A9 (en) 2016-11-17
KR102376599B1 (en) 2022-03-21
TWI665033B (en) 2019-07-11
KR20170018359A (en) 2017-02-17
WO2015187338A1 (en) 2015-12-10

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