SG11201502333VA - Substrate orienter chamber - Google Patents

Substrate orienter chamber

Info

Publication number
SG11201502333VA
SG11201502333VA SG11201502333VA SG11201502333VA SG11201502333VA SG 11201502333V A SG11201502333V A SG 11201502333VA SG 11201502333V A SG11201502333V A SG 11201502333VA SG 11201502333V A SG11201502333V A SG 11201502333VA SG 11201502333V A SG11201502333V A SG 11201502333VA
Authority
SG
Singapore
Prior art keywords
orienter chamber
substrate orienter
substrate
chamber
orienter
Prior art date
Application number
SG11201502333VA
Inventor
Shin Kitamura
Yuji Aoki
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11201502333VA publication Critical patent/SG11201502333VA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
SG11201502333VA 2012-10-19 2013-10-07 Substrate orienter chamber SG11201502333VA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261716114P 2012-10-19 2012-10-19
US14/046,439 US20140111797A1 (en) 2012-10-19 2013-10-04 Substrate orienter chamber
PCT/US2013/063744 WO2014062406A1 (en) 2012-10-19 2013-10-07 Substrate orienter chamber

Publications (1)

Publication Number Publication Date
SG11201502333VA true SG11201502333VA (en) 2015-05-28

Family

ID=50485071

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201502333VA SG11201502333VA (en) 2012-10-19 2013-10-07 Substrate orienter chamber

Country Status (7)

Country Link
US (1) US20140111797A1 (en)
JP (1) JP2014086578A (en)
KR (1) KR20150070330A (en)
CN (1) CN104737269A (en)
SG (1) SG11201502333VA (en)
TW (1) TW201426900A (en)
WO (1) WO2014062406A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5893461B2 (en) * 2011-04-07 2016-03-23 日産自動車株式会社 Position detection apparatus and position detection method
CN111201594A (en) 2017-10-25 2020-05-26 艾克塞利斯科技公司 Shallow angle, multi-wavelength, multi-photoreceptor, adjustable sensitivity calibration sensor for semiconductor manufacturing equipment
US10854442B2 (en) 2018-06-29 2020-12-01 Taiwan Semiconductor Manufacturing Co., Ltd. Orientation chamber of substrate processing system with purging function
US10720354B2 (en) * 2018-08-28 2020-07-21 Axcelis Technologies, Inc. System and method for aligning light-transmitting birefringent workpieces
WO2020180470A1 (en) 2019-03-01 2020-09-10 Applied Materials, Inc. Transparent wafer center finder

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09266156A (en) * 1996-03-28 1997-10-07 Dainippon Screen Mfg Co Ltd End position detector, peripheral exposure apparatus and end position detection method
US6162008A (en) * 1999-06-08 2000-12-19 Varian Semiconductor Equipment Associates, Inc. Wafer orientation sensor
JP4942129B2 (en) * 2000-04-07 2012-05-30 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド Wafer direction sensor for GaAs wafers
JP3823805B2 (en) * 2001-10-30 2006-09-20 ウシオ電機株式会社 Exposure equipment
US6729824B2 (en) * 2001-12-14 2004-05-04 Applied Materials, Inc. Dual robot processing system
JP3768443B2 (en) * 2002-01-09 2006-04-19 大日本スクリーン製造株式会社 Width dimension measuring device and thin film position measuring device
WO2003098668A2 (en) * 2002-05-16 2003-11-27 Asyst Technologies, Inc. Pre-aligner
KR100503525B1 (en) * 2002-12-28 2005-07-22 삼성전자주식회사 Wafer aligner and method for aligning a wafer
JP4343640B2 (en) * 2003-10-02 2009-10-14 キヤノン株式会社 Transparent substrate alignment method
JP4566798B2 (en) * 2005-03-30 2010-10-20 東京エレクトロン株式会社 Substrate positioning device, substrate positioning method, program
DE102007047352B4 (en) * 2007-10-02 2009-09-17 Vistec Semiconductor Systems Gmbh Lighting device and inspection device with lighting device
JP2010003795A (en) * 2008-06-19 2010-01-07 Sinfonia Technology Co Ltd Substrate position detector and substrate position detecting method

Also Published As

Publication number Publication date
TW201426900A (en) 2014-07-01
WO2014062406A1 (en) 2014-04-24
CN104737269A (en) 2015-06-24
JP2014086578A (en) 2014-05-12
KR20150070330A (en) 2015-06-24
US20140111797A1 (en) 2014-04-24

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