SG11201404222PA - Fe-BASED MAGNETIC MATERIAL SINTERED BODY - Google Patents

Fe-BASED MAGNETIC MATERIAL SINTERED BODY

Info

Publication number
SG11201404222PA
SG11201404222PA SG11201404222PA SG11201404222PA SG11201404222PA SG 11201404222P A SG11201404222P A SG 11201404222PA SG 11201404222P A SG11201404222P A SG 11201404222PA SG 11201404222P A SG11201404222P A SG 11201404222PA SG 11201404222P A SG11201404222P A SG 11201404222PA
Authority
SG
Singapore
Prior art keywords
magnetic material
sintered body
based magnetic
material sintered
sintered
Prior art date
Application number
SG11201404222PA
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11201404222PA publication Critical patent/SG11201404222PA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SG11201404222PA 2012-08-31 2013-08-06 Fe-BASED MAGNETIC MATERIAL SINTERED BODY SG11201404222PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012191052 2012-08-31
PCT/JP2013/071251 WO2014034390A1 (en) 2012-08-31 2013-08-06 Fe-BASED MAGNETIC MATERIAL SINTERED BODY

Publications (1)

Publication Number Publication Date
SG11201404222PA true SG11201404222PA (en) 2014-10-30

Family

ID=50183208

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201404222PA SG11201404222PA (en) 2012-08-31 2013-08-06 Fe-BASED MAGNETIC MATERIAL SINTERED BODY

Country Status (7)

Country Link
US (1) US10090012B2 (en)
JP (1) JP5689543B2 (en)
CN (1) CN104246882B (en)
MY (1) MY165751A (en)
SG (1) SG11201404222PA (en)
TW (1) TWI609368B (en)
WO (1) WO2014034390A1 (en)

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KR20180088491A (en) 2013-11-28 2018-08-03 제이엑스금속주식회사 Magnetic material sputtering target and method for producing same
WO2016047236A1 (en) 2014-09-22 2016-03-31 Ｊｘ金属株式会社 Sputtering target for magnetic recording film formation and production method therefor
CN107075665A (en) * 2014-09-26 2017-08-18 捷客斯金属株式会社 Magnetic recording film formation sputtering target and its manufacture method
US10644230B2 (en) 2015-03-04 2020-05-05 Jx Nippon Mining & Metals Corporation Magnetic material sputtering target and method for producing same
JP6553755B2 (en) 2016-02-19 2019-07-31 Ｊｘ金属株式会社 Sputtering target for magnetic recording media and magnetic thin film
SG11201800871SA (en) * 2016-09-12 2018-05-30 Jx Nippon Mining & Metals Corp Ferromagnetic material sputtering target
JP7057692B2 (en) * 2018-03-20 2022-04-20 田中貴金属工業株式会社 Fe-Pt-Oxide-BN-based sintered body for sputtering target
CN111971412B (en) * 2018-03-27 2022-08-16 Ｊｘ金属株式会社 Sputtering target, method for producing same, and method for producing magnetic recording medium
JP7104001B2 (en) * 2019-06-28 2022-07-20 田中貴金属工業株式会社 Fe-Pt-BN-based sputtering target and its manufacturing method
JP7462511B2 (en) * 2020-08-12 2024-04-05 田中貴金属工業株式会社 Fe-Pt-BN sputtering target and manufacturing method thereof
TWI752655B (en) * 2020-09-25 2022-01-11 光洋應用材料科技股份有限公司 Fe-pt based sputtering target and method of preparing the same

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MY156716A (en) 2010-12-21 2016-03-15 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording film and process for production thereof
MY161774A (en) 2011-09-26 2017-05-15 Jx Nippon Mining & Metals Corp Fe-pt-c based sputtering target
CN104169457A (en) * 2012-03-15 2014-11-26 吉坤日矿日石金属株式会社 Magnetic material sputtering target and manufacturing method thereof
JP5457615B1 (en) * 2012-07-20 2014-04-02 Ｊｘ日鉱日石金属株式会社 Sputtering target for forming a magnetic recording film and method for producing the same
MY169260A (en) * 2012-09-21 2019-03-20 Jx Nippon Mining & Metals Corp Fe-pt-based magnetic materials sintered compact
US20150107991A1 (en) * 2012-10-25 2015-04-23 Jx Nippon Mining & Metals Corporation Fe-Pt-Based Sputtering Target Having Nonmagnetic Substance Dispersed Therein

Also Published As

Publication number Publication date
TWI609368B (en) 2017-12-21
JPWO2014034390A1 (en) 2016-08-08
WO2014034390A1 (en) 2014-03-06
JP5689543B2 (en) 2015-03-25
MY165751A (en) 2018-04-23
CN104246882B (en) 2018-01-12
TW201428739A (en) 2014-07-16
US10090012B2 (en) 2018-10-02
CN104246882A (en) 2014-12-24
US20150107411A1 (en) 2015-04-23

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