SG111208A1 - Method of and apparatus for supplying a dynamic protective layer to a mirror - Google Patents
Method of and apparatus for supplying a dynamic protective layer to a mirrorInfo
- Publication number
- SG111208A1 SG111208A1 SG200405599A SG200405599A SG111208A1 SG 111208 A1 SG111208 A1 SG 111208A1 SG 200405599 A SG200405599 A SG 200405599A SG 200405599 A SG200405599 A SG 200405599A SG 111208 A1 SG111208 A1 SG 111208A1
- Authority
- SG
- Singapore
- Prior art keywords
- mirror
- supplying
- protective layer
- dynamic protective
- dynamic
- Prior art date
Links
- 239000011241 protective layer Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03078140 | 2003-10-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG111208A1 true SG111208A1 (en) | 2005-05-30 |
Family
ID=34626391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200405599A SG111208A1 (en) | 2003-10-06 | 2004-10-01 | Method of and apparatus for supplying a dynamic protective layer to a mirror |
Country Status (7)
Country | Link |
---|---|
US (1) | US20050120953A1 (de) |
JP (1) | JP4073904B2 (de) |
KR (1) | KR100629321B1 (de) |
CN (1) | CN100476589C (de) |
DE (1) | DE602004003015T2 (de) |
SG (1) | SG111208A1 (de) |
TW (1) | TWI251118B (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7279690B2 (en) * | 2005-03-31 | 2007-10-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7365349B2 (en) * | 2005-06-27 | 2008-04-29 | Cymer, Inc. | EUV light source collector lifetime improvements |
US7394083B2 (en) * | 2005-07-08 | 2008-07-01 | Cymer, Inc. | Systems and methods for EUV light source metrology |
US7561247B2 (en) * | 2005-08-22 | 2009-07-14 | Asml Netherlands B.V. | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
US7714306B2 (en) * | 2006-08-30 | 2010-05-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP5732392B2 (ja) * | 2008-08-14 | 2015-06-10 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源およびリソグラフィ装置 |
DE102015221209A1 (de) | 2015-10-29 | 2017-05-04 | Carl Zeiss Smt Gmbh | Optische Baugruppe mit einem Schutzelement und optische Anordnung damit |
DE102017213181A1 (de) | 2017-07-31 | 2019-01-31 | Carl Zeiss Smt Gmbh | Optische Anordnung für EUV-Strahlung mit einer Abschirmung zum Schutz vor der Ätzwirkung eines Plasmas |
US10631392B2 (en) * | 2018-04-30 | 2020-04-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV collector contamination prevention |
DE102019200208A1 (de) * | 2019-01-10 | 2020-07-16 | Carl Zeiss Smt Gmbh | Verfahren zum in situ dynamischen Schutz einer Oberfläche und optische Anordnung |
WO2023217495A1 (en) * | 2022-05-11 | 2023-11-16 | Asml Netherlands B.V. | Lithographic apparatus and associated methods |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4222838A (en) * | 1978-06-13 | 1980-09-16 | General Motors Corporation | Method for controlling plasma etching rates |
JPS5687672A (en) * | 1979-12-15 | 1981-07-16 | Anelva Corp | Dry etching apparatus |
US6231930B1 (en) * | 1999-09-15 | 2001-05-15 | Euv Llc | Process for producing radiation-induced self-terminating protective coatings on a substrate |
-
2004
- 2004-09-29 DE DE602004003015T patent/DE602004003015T2/de active Active
- 2004-09-30 CN CNB2004100903298A patent/CN100476589C/zh not_active Expired - Fee Related
- 2004-10-01 SG SG200405599A patent/SG111208A1/en unknown
- 2004-10-01 TW TW093129919A patent/TWI251118B/zh not_active IP Right Cessation
- 2004-10-05 US US10/957,753 patent/US20050120953A1/en not_active Abandoned
- 2004-10-05 KR KR1020040078991A patent/KR100629321B1/ko not_active IP Right Cessation
- 2004-10-05 JP JP2004292354A patent/JP4073904B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE602004003015D1 (de) | 2006-12-14 |
JP2005136393A (ja) | 2005-05-26 |
DE602004003015T2 (de) | 2007-02-08 |
CN100476589C (zh) | 2009-04-08 |
TW200517776A (en) | 2005-06-01 |
US20050120953A1 (en) | 2005-06-09 |
TWI251118B (en) | 2006-03-11 |
KR100629321B1 (ko) | 2006-09-29 |
CN1605941A (zh) | 2005-04-13 |
JP4073904B2 (ja) | 2008-04-09 |
KR20050033475A (ko) | 2005-04-12 |
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