SG110218A1 - Lithographic apparatus, device manufacturing method - Google Patents

Lithographic apparatus, device manufacturing method

Info

Publication number
SG110218A1
SG110218A1 SG200406944A SG200406944A SG110218A1 SG 110218 A1 SG110218 A1 SG 110218A1 SG 200406944 A SG200406944 A SG 200406944A SG 200406944 A SG200406944 A SG 200406944A SG 110218 A1 SG110218 A1 SG 110218A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200406944A
Other languages
English (en)
Inventor
Jahannes Hubertus Joseph Moors
Vadim Yevgenyevich Banine
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG110218A1 publication Critical patent/SG110218A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
SG200406944A 2003-09-18 2004-09-14 Lithographic apparatus, device manufacturing method SG110218A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077957A EP1517184A1 (fr) 2003-09-18 2003-09-18 Appareil lithographique et méthode de fabrication d'un dispositif

Publications (1)

Publication Number Publication Date
SG110218A1 true SG110218A1 (en) 2005-04-28

Family

ID=34178542

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200406944A SG110218A1 (en) 2003-09-18 2004-09-14 Lithographic apparatus, device manufacturing method

Country Status (7)

Country Link
US (1) US7515245B2 (fr)
EP (1) EP1517184A1 (fr)
JP (1) JP2005094018A (fr)
KR (1) KR100674700B1 (fr)
CN (1) CN100504606C (fr)
SG (1) SG110218A1 (fr)
TW (1) TW200513806A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI245163B (en) * 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2007027237A (ja) * 2005-07-13 2007-02-01 Canon Inc 露光装置、光源装置及びデバイス製造方法
DE102007057252A1 (de) * 2007-03-07 2008-09-11 Carl Zeiss Smt Ag Verfahren zur Messung der Ausgasung in EUV-Lithographievorrichtungen sowie EUV-Lithographievorrichtung
WO2011072905A1 (fr) * 2009-12-17 2011-06-23 Asml Netherlands B.V. Appareil de lithographie et son procédé de fabrication
US8274046B1 (en) * 2011-05-19 2012-09-25 Hermes Microvision Inc. Monochromator for charged particle beam apparatus
DE102012210035A1 (de) * 2012-06-14 2013-05-23 Carl Zeiss Smt Gmbh EUV-Lithographieanlage und Verfahren zum Detektieren von Partikeln in einer EUV-Lithographieanlage
KR102211898B1 (ko) * 2014-11-27 2021-02-05 삼성전자주식회사 노광 장치용 액체 누출 감지 장치 및 방법
DE102018211234A1 (de) 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4035643A (en) 1974-06-11 1977-07-12 Allied Chemical Corporation Infrared gas analysis
US3939348A (en) * 1974-06-11 1976-02-17 Allied Chemical Corporation Infrared gas analysis
US4557603A (en) * 1981-02-25 1985-12-10 Oskar Oehler Detection means for the selective detection of gases, based on optical spectroscopy
US4622845A (en) 1985-03-21 1986-11-18 Westinghouse Electric Corp. Method and apparatus for the detection and measurement of gases
JPS6441215U (fr) 1987-09-07 1989-03-13
JP3399040B2 (ja) 1993-09-20 2003-04-21 株式会社日立製作所 半導体製造装置及び半導体製造方法
FI101749B1 (fi) 1996-12-30 1998-08-14 Instrumentarium Oy Kaasukomponentin pitoisuuden tarkka mittaaminen kaasuseoksessa, jossa muut komponentit vaikuttavat pitoisuusmääritykseen
US5989763A (en) * 1998-05-28 1999-11-23 National Semicondustor Corporation Chemical gas analysis during processing of chemically amplified photoresist systems
JP3413131B2 (ja) 1999-10-04 2003-06-03 キヤノン株式会社 光学装置及びデバイス製造方法
JP2001250854A (ja) * 1999-12-28 2001-09-14 Nikon Corp 搬送方法及び搬送装置、位置決め方法及び位置決め装置、基板保持方法及び基板保持装置、露光方法及び露光装置、デバイスの製造方法及びデバイス
US6592817B1 (en) * 2000-03-31 2003-07-15 Applied Materials, Inc. Monitoring an effluent from a chamber
US7508487B2 (en) * 2000-06-01 2009-03-24 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
TWI226972B (en) * 2000-06-01 2005-01-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002158155A (ja) 2000-11-17 2002-05-31 Canon Inc 露光装置および露光方法
US6924492B2 (en) 2000-12-22 2005-08-02 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1220038B1 (fr) * 2000-12-22 2007-03-14 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
JP2004207314A (ja) * 2002-12-24 2004-07-22 Tokyo Electron Ltd 膜改質の終点検出方法、その終点検出装置及び電子ビーム処理装置

Also Published As

Publication number Publication date
EP1517184A1 (fr) 2005-03-23
JP2005094018A (ja) 2005-04-07
CN100504606C (zh) 2009-06-24
CN1598697A (zh) 2005-03-23
US20050083504A1 (en) 2005-04-21
TW200513806A (en) 2005-04-16
US7515245B2 (en) 2009-04-07
KR20050028841A (ko) 2005-03-23
KR100674700B1 (ko) 2007-01-25

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