SG103379A1 - A litographic apparatus and a device manufacturing method - Google Patents

A litographic apparatus and a device manufacturing method

Info

Publication number
SG103379A1
SG103379A1 SG200207470A SG200207470A SG103379A1 SG 103379 A1 SG103379 A1 SG 103379A1 SG 200207470 A SG200207470 A SG 200207470A SG 200207470 A SG200207470 A SG 200207470A SG 103379 A1 SG103379 A1 SG 103379A1
Authority
SG
Singapore
Prior art keywords
litographic
device manufacturing
manufacturing
litographic apparatus
Prior art date
Application number
SG200207470A
Other languages
English (en)
Inventor
Hernes Jacobs
Der Schoot Harmen Klaas Ven
Petrus Matthijs Henric Vosters
Groot Ton De
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG103379A1 publication Critical patent/SG103379A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200207470A 2001-12-11 2002-12-09 A litographic apparatus and a device manufacturing method SG103379A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01310332 2001-12-11

Publications (1)

Publication Number Publication Date
SG103379A1 true SG103379A1 (en) 2004-04-29

Family

ID=8182526

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200207470A SG103379A1 (en) 2001-12-11 2002-12-09 A litographic apparatus and a device manufacturing method

Country Status (7)

Country Link
US (1) US6815699B2 (zh)
JP (1) JP3676779B2 (zh)
KR (1) KR100554869B1 (zh)
CN (1) CN100412695C (zh)
DE (1) DE60225229T2 (zh)
SG (1) SG103379A1 (zh)
TW (1) TWI284921B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050162634A1 (en) * 2004-01-27 2005-07-28 Nikon Corporation Cable tray assembly for precision drive stage
JP2005294468A (ja) * 2004-03-31 2005-10-20 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
US7388195B2 (en) * 2004-09-30 2008-06-17 Charles Stark Draper Laboratory, Inc. Apparatus and systems for processing samples for analysis via ion mobility spectrometry
WO2006059634A1 (ja) * 2004-12-01 2006-06-08 Nikon Corporation ステージ装置及び露光装置
JP4677267B2 (ja) * 2005-04-04 2011-04-27 キヤノン株式会社 平面ステージ装置及び露光装置
JP5020662B2 (ja) * 2006-05-26 2012-09-05 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
US7538273B2 (en) * 2006-08-08 2009-05-26 Asml Netherlands B.V. Cable connection to decrease the passing on of vibrations from a first object to a second object
CN103901734B (zh) * 2012-12-28 2018-05-25 上海微电子装备（集团）股份有限公司 一种工件台线缆装置
CN103969959B (zh) * 2013-01-25 2016-09-28 上海微电子装备有限公司 用于光刻装置的立式线缆支撑装置
CN107561869B (zh) * 2016-06-30 2019-10-25 上海微电子装备（集团）股份有限公司 一种工件台锁定限位装置和采用该装置的工件台
CN108121165B (zh) * 2016-11-29 2020-01-24 上海微电子装备（集团）股份有限公司 粗动台防转装置和粗动台组件
CN109856920B (zh) * 2017-11-30 2021-06-04 上海微电子装备（集团）股份有限公司 防转装置、运动台系统与光刻设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100407A (nl) 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
US5412265A (en) * 1993-04-05 1995-05-02 Ford Motor Company Planar micro-motor and method of fabrication
US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
AU2958299A (en) * 1998-03-26 1999-10-18 Nikon Corporation Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
US6211599B1 (en) * 1999-08-03 2001-04-03 Sandia Corporation Microelectromechanical ratcheting apparatus
TWI264617B (en) * 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
JP4741115B2 (ja) * 2000-08-14 2011-08-03 イーリス エルエルシー リソグラフィ投影装置およびデバイス製造方法

Also Published As

Publication number Publication date
KR20030047822A (ko) 2003-06-18
TWI284921B (en) 2007-08-01
TW200410306A (en) 2004-06-16
US6815699B2 (en) 2004-11-09
CN1445609A (zh) 2003-10-01
JP3676779B2 (ja) 2005-07-27
CN100412695C (zh) 2008-08-20
JP2003257851A (ja) 2003-09-12
US20030132400A1 (en) 2003-07-17
DE60225229D1 (de) 2008-04-10
KR100554869B1 (ko) 2006-02-24
DE60225229T2 (de) 2009-03-26

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