SG10202101832YA - A method of forming nano-patterns on a substrate - Google Patents
A method of forming nano-patterns on a substrateInfo
- Publication number
- SG10202101832YA SG10202101832YA SG10202101832YA SG10202101832YA SG10202101832YA SG 10202101832Y A SG10202101832Y A SG 10202101832YA SG 10202101832Y A SG10202101832Y A SG 10202101832YA SG 10202101832Y A SG10202101832Y A SG 10202101832YA SG 10202101832Y A SG10202101832Y A SG 10202101832YA
- Authority
- SG
- Singapore
- Prior art keywords
- patterns
- substrate
- forming nano
- nano
- forming
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Laminated Bodies (AREA)
- Insulating Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201607372X | 2016-09-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202101832YA true SG10202101832YA (en) | 2021-04-29 |
Family
ID=61301253
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202101832YA SG10202101832YA (en) | 2016-09-05 | 2017-09-05 | A method of forming nano-patterns on a substrate |
SG11201901931UA SG11201901931UA (en) | 2016-09-05 | 2017-09-05 | A method of forming nano-patterns on a substrate |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201901931UA SG11201901931UA (en) | 2016-09-05 | 2017-09-05 | A method of forming nano-patterns on a substrate |
Country Status (3)
Country | Link |
---|---|
US (1) | US11287551B2 (en) |
SG (2) | SG10202101832YA (en) |
WO (1) | WO2018044240A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG10201805438TA (en) * | 2018-06-25 | 2020-01-30 | Iia Tech Pte Ltd | A diamond having nanostructures on one of its surface to generate structural colours and a method of producing thereof |
CN109160483B (en) * | 2018-08-01 | 2021-04-27 | 中国科学院微电子研究所 | Nano-pillar sensor, refractive index detection device and method |
CN110632063A (en) * | 2019-08-15 | 2019-12-31 | 中国科学院微电子研究所 | Colorimetric sensor and manufacturing method and test system thereof |
CN111399087A (en) * | 2020-03-25 | 2020-07-10 | 武汉大学 | Super surface based on medium nano brick array and method for realizing information multiplexing |
GB202009640D0 (en) * | 2020-06-24 | 2020-08-05 | Ams Sensors Singapore Pte Ltd | Optical detection system calibration |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7170666B2 (en) * | 2004-07-27 | 2007-01-30 | Hewlett-Packard Development Company, L.P. | Nanostructure antireflection surfaces |
CN101093867B (en) * | 2006-06-19 | 2010-12-08 | 财团法人工业技术研究院 | Substrate of vertical column array of nitride in second group |
US8514398B2 (en) * | 2009-11-10 | 2013-08-20 | The Regents Of The University Of California | Sensing devices and techniques using 3-D arrays based on surface plasmon excitations |
EP2375452A1 (en) * | 2010-04-06 | 2011-10-12 | FOM Institute for Atomic and Moleculair Physics | Nanoparticle antireflection layer |
KR20130034778A (en) | 2011-09-29 | 2013-04-08 | 주식회사 동진쎄미켐 | Method of forming fine pattern of semiconductor device using directed self assembly process |
US20150377815A1 (en) * | 2013-02-20 | 2015-12-31 | Empire Technology Development Llc | Nanotube sensors for conducting solutions |
JP5802233B2 (en) * | 2013-03-27 | 2015-10-28 | 株式会社東芝 | Pattern formation method |
US10290507B2 (en) * | 2013-06-15 | 2019-05-14 | Brookhaven Science Associates, Llc | Formation of antireflective surfaces |
WO2014205238A1 (en) * | 2013-06-19 | 2014-12-24 | The Board Of Trustees Of The Leland Stanford Junior University | Novel dielectric nano-structure for light trapping in solar cells |
JP6365817B2 (en) * | 2014-02-17 | 2018-08-01 | セイコーエプソン株式会社 | Analytical device and electronic device |
DE102014105939B4 (en) * | 2014-04-28 | 2019-08-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Process for producing an anti-reflection coating on a silicone surface and optical element |
US9537024B2 (en) * | 2015-04-30 | 2017-01-03 | The Board Of Trustees Of The Leland Stanford Junior University | Metal-dielectric hybrid surfaces as integrated optoelectronic interfaces |
-
2017
- 2017-09-05 WO PCT/SG2017/050440 patent/WO2018044240A1/en active Application Filing
- 2017-09-05 SG SG10202101832YA patent/SG10202101832YA/en unknown
- 2017-09-05 US US16/330,764 patent/US11287551B2/en active Active
- 2017-09-05 SG SG11201901931UA patent/SG11201901931UA/en unknown
Also Published As
Publication number | Publication date |
---|---|
US20190187337A1 (en) | 2019-06-20 |
SG11201901931UA (en) | 2019-04-29 |
WO2018044240A1 (en) | 2018-03-08 |
US11287551B2 (en) | 2022-03-29 |
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