SG10202008623SA - Wafer pre-aligner and method of pre-aligning wafer - Google Patents

Wafer pre-aligner and method of pre-aligning wafer

Info

Publication number
SG10202008623SA
SG10202008623SA SG10202008623SA SG10202008623SA SG10202008623SA SG 10202008623S A SG10202008623S A SG 10202008623SA SG 10202008623S A SG10202008623S A SG 10202008623SA SG 10202008623S A SG10202008623S A SG 10202008623SA SG 10202008623S A SG10202008623S A SG 10202008623SA
Authority
SG
Singapore
Prior art keywords
wafer
aligner
aligning
aligning wafer
wafer pre
Prior art date
Application number
SG10202008623SA
Inventor
Charles Rogers John
Kathleen Swiecicki Margaret
Original Assignee
Yaskawa Electric Corp
Yaskawa America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Electric Corp, Yaskawa America Inc filed Critical Yaskawa Electric Corp
Publication of SG10202008623SA publication Critical patent/SG10202008623SA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/43—Refractivity; Phase-affecting properties, e.g. optical path length by measuring critical angle
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG10202008623SA 2019-09-06 2020-09-04 Wafer pre-aligner and method of pre-aligning wafer SG10202008623SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962896866P 2019-09-06 2019-09-06
US17/005,378 US11929277B2 (en) 2019-09-06 2020-08-28 Wafer pre-aligner and method of pre-aligning wafer

Publications (1)

Publication Number Publication Date
SG10202008623SA true SG10202008623SA (en) 2021-04-29

Family

ID=72381028

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202008623SA SG10202008623SA (en) 2019-09-06 2020-09-04 Wafer pre-aligner and method of pre-aligning wafer

Country Status (10)

Country Link
US (1) US11929277B2 (en)
EP (1) EP3790041B1 (en)
JP (1) JP2021044548A (en)
KR (1) KR20210029691A (en)
CN (1) CN112466802A (en)
DK (1) DK3790041T3 (en)
ES (1) ES2928291T3 (en)
PL (1) PL3790041T3 (en)
SG (1) SG10202008623SA (en)
TW (1) TWI833988B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102501318B1 (en) * 2022-04-07 2023-02-16 양희찬 Arm for moving wafer
EP4273911A1 (en) 2022-05-03 2023-11-08 Werner Lieb GmbH Holding device and method for holding and/or transporting workpieces and/or components, optionally with tool-free replaceable suction elements
CN115332137A (en) * 2022-08-15 2022-11-11 北京北方华创微电子装备有限公司 Reaction chamber and wafer alignment method
JP2024054636A (en) * 2022-10-05 2024-04-17 川崎重工業株式会社 Robot system, aligner, and method for aligning semiconductor substrate
US12046501B2 (en) 2022-10-06 2024-07-23 Kawasaki Jukogyo Kabushiki Kaisha Substrate handling apparatus and method of handling substrate

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2694468B2 (en) 1989-12-20 1997-12-24 東京エレクトロン株式会社 Position detection method and inspection device
JPH10256350A (en) * 1997-03-06 1998-09-25 Toshiba Corp Semiconductor manufacturing method and apparatus therefor
JP2000021956A (en) 1998-07-02 2000-01-21 Mecs Corp Notch aligner
US6275742B1 (en) * 1999-04-16 2001-08-14 Berkeley Process Control, Inc. Wafer aligner system
WO2003043077A1 (en) 2001-11-14 2003-05-22 Rorze Corporation Wafer positioning method and apparatus, processing system, and method for positioning wafer seat rotating axis of wafer positioning apparatus
US6932558B2 (en) * 2002-07-03 2005-08-23 Kung Chris Wu Wafer aligner
US8634633B2 (en) * 2003-11-10 2014-01-21 Brooks Automation, Inc. Wafer center finding with kalman filter
JP4636934B2 (en) 2005-05-09 2011-02-23 タツモ株式会社 Substrate angular position correction device
CN100355055C (en) 2005-10-28 2007-12-12 清华大学 Method for controlling pre-aligning of silicon wafer
TWI315455B (en) * 2006-06-23 2009-10-01 Littelfuse Concord Semiconductor Inc A structure and exposure method of double sided dual exposure mask aligner
JP5689704B2 (en) * 2010-08-08 2015-03-25 日本電産サンキョー株式会社 Motor control device and motor control method
CN103199046B (en) 2012-01-05 2015-09-09 沈阳新松机器人自动化股份有限公司 Wafer notch edge center prealignment method
CN106030772B (en) * 2014-02-12 2020-04-14 科磊股份有限公司 Wafer notch detection
US10373858B2 (en) * 2016-04-06 2019-08-06 Lam Research Corporation Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal
JP6568986B1 (en) * 2018-06-28 2019-08-28 平田機工株式会社 Alignment apparatus, semiconductor wafer processing apparatus, and alignment method

Also Published As

Publication number Publication date
CN112466802A (en) 2021-03-09
KR20210029691A (en) 2021-03-16
TWI833988B (en) 2024-03-01
PL3790041T3 (en) 2023-02-06
EP3790041B1 (en) 2022-08-10
JP2021044548A (en) 2021-03-18
EP3790041A1 (en) 2021-03-10
ES2928291T3 (en) 2022-11-16
DK3790041T3 (en) 2022-10-31
US20210074566A1 (en) 2021-03-11
TW202115606A (en) 2021-04-16
US11929277B2 (en) 2024-03-12

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