SG10201800387SA - Laser processing apparatus - Google Patents

Laser processing apparatus

Info

Publication number
SG10201800387SA
SG10201800387SA SG10201800387SA SG10201800387SA SG10201800387SA SG 10201800387S A SG10201800387S A SG 10201800387SA SG 10201800387S A SG10201800387S A SG 10201800387SA SG 10201800387S A SG10201800387S A SG 10201800387SA SG 10201800387S A SG10201800387S A SG 10201800387SA
Authority
SG
Singapore
Prior art keywords
ingot
processing apparatus
unit
laser beam
laser processing
Prior art date
Application number
SG10201800387SA
Inventor
Iizuka Kentaro
Honoki Koyo
Torii Shuichi
Kobayashi Yutaka
Yamamoto Ryohei
Hirata Kazuya
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201800387SA publication Critical patent/SG10201800387SA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/046—Automatically focusing the laser beam
    • B23K26/048—Automatically focusing the laser beam by controlling the distance between laser head and workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03—Observing, e.g. monitoring, the workpiece
    • B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/083—Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50—Working by transmitting the laser beam through or within the workpiece
    • B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

LASER PROCESSING APPARATUS Disclosed herein is a laser processing apparatus for forming a separation layer inside an ingot by applying a laser beam to an end surface of the ingot in the condition where the focal point of the laser beam is set inside the ingot, the laser beam having a transmission wavelength to the ingot. The laser processing apparatus includes a holding unit for holding the ingot, a moving unit for moving the holding unit in a direction parallel to the end surface of the ingot held by the holding unit, a laser beam applying unit for applying the laser beam to the ingot held by the holding unit, an imaging unit for detecting the position of the ingot in the direction parallel to the end surface of the ingot, and a height detecting unit for detecting the height of the end surface of the ingot held by the holding unit. (Figure 2A)
SG10201800387SA 2017-01-27 2018-01-16 Laser processing apparatus SG10201800387SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017013073A JP6831253B2 (en) 2017-01-27 2017-01-27 Laser processing equipment

Publications (1)

Publication Number Publication Date
SG10201800387SA true SG10201800387SA (en) 2018-08-30

Family

ID=62843054

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201800387SA SG10201800387SA (en) 2017-01-27 2018-01-16 Laser processing apparatus

Country Status (8)

Country Link
US (1) US10799987B2 (en)
JP (1) JP6831253B2 (en)
KR (1) KR102325714B1 (en)
CN (1) CN108356408B (en)
DE (1) DE102018201209B4 (en)
MY (1) MY191252A (en)
SG (1) SG10201800387SA (en)
TW (1) TWI743297B (en)

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US20190060972A1 (en) * 2017-08-24 2019-02-28 Wilson Tool International Inc. Systems for enhancing functionality of industrial punch presses
JP7128067B2 (en) * 2018-09-14 2022-08-30 株式会社ディスコ WAFER PRODUCTION METHOD AND LASER PROCESSING APPARATUS
US10576585B1 (en) * 2018-12-29 2020-03-03 Cree, Inc. Laser-assisted method for parting crystalline material
US10562130B1 (en) 2018-12-29 2020-02-18 Cree, Inc. Laser-assisted method for parting crystalline material
US11024501B2 (en) 2018-12-29 2021-06-01 Cree, Inc. Carrier-assisted method for parting crystalline material along laser damage region
US10611052B1 (en) 2019-05-17 2020-04-07 Cree, Inc. Silicon carbide wafers with relaxed positive bow and related methods
CN111318812B (en) * 2020-04-01 2024-09-20 重庆金樾光电科技有限公司 Laser rust removing robot for large steel structure surface

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JP2000094221A (en) 1998-09-24 2000-04-04 Toyo Advanced Technologies Co Ltd Electric discharge wire saw
JP2004001002A (en) * 2002-05-29 2004-01-08 Y E Data Inc Laser marking device
JP2004243383A (en) * 2003-02-14 2004-09-02 Sumitomo Heavy Ind Ltd Laser beam machine, and laser beam machining method
JP4977411B2 (en) * 2006-07-06 2012-07-18 株式会社ディスコ Laser processing equipment
JP2008119718A (en) * 2006-11-10 2008-05-29 Marubun Corp Laser beam machining apparatus
JP4885762B2 (en) * 2007-02-27 2012-02-29 株式会社ディスコ Measuring device for workpiece held on chuck table and laser processing machine
JP4402708B2 (en) * 2007-08-03 2010-01-20 浜松ホトニクス株式会社 Laser processing method, laser processing apparatus and manufacturing method thereof
JP4814187B2 (en) * 2007-09-11 2011-11-16 株式会社ディスコ Device for detecting the height position of the workpiece held on the chuck table
US8198564B2 (en) * 2008-09-09 2012-06-12 Electro Scientific Industries, Inc. Adaptive optic beamshaping in laser processing systems
JP2010232326A (en) * 2009-03-26 2010-10-14 Toray Eng Co Ltd Coating applicator
JP5206733B2 (en) * 2010-05-25 2013-06-12 株式会社デンソー Wafer processing method and polishing apparatus and cutting apparatus used therefor
JP5917862B2 (en) 2011-08-30 2016-05-18 浜松ホトニクス株式会社 Processing object cutting method
JP6002982B2 (en) 2011-08-31 2016-10-05 株式会社フジシール Pouch container
JP6109010B2 (en) * 2013-08-14 2017-04-05 株式会社ディスコ Grinding equipment
JP2015225909A (en) * 2014-05-27 2015-12-14 株式会社ディスコ Processing method of wafer
JP6399914B2 (en) * 2014-12-04 2018-10-03 株式会社ディスコ Wafer generation method
JP6494382B2 (en) * 2015-04-06 2019-04-03 株式会社ディスコ Wafer generation method
JP6552898B2 (en) * 2015-07-13 2019-07-31 株式会社ディスコ Method for producing polycrystalline SiC wafer
KR101825923B1 (en) * 2015-09-03 2018-03-22 주식회사 이오테크닉스 Laser processing apparatus and laser processing method

Also Published As

Publication number Publication date
JP2018118296A (en) 2018-08-02
CN108356408A (en) 2018-08-03
MY191252A (en) 2022-06-10
CN108356408B (en) 2021-07-09
KR20180088582A (en) 2018-08-06
US20180214976A1 (en) 2018-08-02
KR102325714B1 (en) 2021-11-11
TW201827151A (en) 2018-08-01
US10799987B2 (en) 2020-10-13
DE102018201209B4 (en) 2024-06-06
TWI743297B (en) 2021-10-21
DE102018201209A1 (en) 2018-08-02
JP6831253B2 (en) 2021-02-17

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