SG10201704373UA - Fluorescence detecting apparatus - Google Patents
Fluorescence detecting apparatusInfo
- Publication number
- SG10201704373UA SG10201704373UA SG10201704373UA SG10201704373UA SG10201704373UA SG 10201704373U A SG10201704373U A SG 10201704373UA SG 10201704373U A SG10201704373U A SG 10201704373UA SG 10201704373U A SG10201704373U A SG 10201704373UA SG 10201704373U A SG10201704373U A SG 10201704373UA
- Authority
- SG
- Singapore
- Prior art keywords
- detecting apparatus
- fluorescence detecting
- fluorescence
- detecting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N2021/6463—Optics
- G01N2021/6471—Special filters, filter wheel
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
- G01N2021/8427—Coatings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
- G01N2021/95661—Inspecting patterns on the surface of objects for PCB's for leads, e.g. position, curvature
- G01N2021/95669—Inspecting patterns on the surface of objects for PCB's for leads, e.g. position, curvature for solder coating, coverage
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016123697A JP2017227532A (ja) | 2016-06-22 | 2016-06-22 | 蛍光検出装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201704373UA true SG10201704373UA (en) | 2018-01-30 |
Family
ID=60579378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201704373UA SG10201704373UA (en) | 2016-06-22 | 2017-05-29 | Fluorescence detecting apparatus |
Country Status (8)
Country | Link |
---|---|
US (1) | US9989468B2 (zh) |
JP (1) | JP2017227532A (zh) |
KR (1) | KR102235431B1 (zh) |
CN (1) | CN107525789A (zh) |
DE (1) | DE102017209946A1 (zh) |
MY (1) | MY186299A (zh) |
SG (1) | SG10201704373UA (zh) |
TW (1) | TWI758293B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6887722B2 (ja) * | 2016-10-25 | 2021-06-16 | 株式会社ディスコ | ウェーハの加工方法及び切削装置 |
DE102017215448A1 (de) * | 2017-09-04 | 2019-03-07 | Contitech Transportbandsysteme Gmbh | UV-Pigmente Förderband |
DE102018123047A1 (de) * | 2018-09-19 | 2020-03-19 | Dürr Dental SE | Vorrichtung zum Auslesen einer belichteten Speicherfolie |
JP7229729B2 (ja) * | 2018-11-08 | 2023-02-28 | 株式会社ディスコ | Facet領域の検出方法および検出装置ならびにウエーハの生成方法およびレーザー加工装置 |
CN112595718B (zh) * | 2020-12-04 | 2023-05-26 | 英华达(上海)科技有限公司 | 摄像系统、光学检测系统、摄像方法、设备及存储介质 |
CN114985932B (zh) * | 2022-07-29 | 2023-04-28 | 河北士达齿轮有限责任公司 | 一种变速箱薄壁离合器总成制造装置 |
CN115464266A (zh) * | 2022-09-27 | 2022-12-13 | 上海工程技术大学 | 一种激光双光束双螺旋点焊方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4479714A (en) * | 1981-04-14 | 1984-10-30 | Lehrer Leo K | Reflection densitometer with ellipsoid reflection surface |
US4841156A (en) * | 1987-05-15 | 1989-06-20 | Electronic Instrumentation And Technology, Inc. | Measurement of the thickness of thin films |
US5026159A (en) * | 1989-05-19 | 1991-06-25 | Acrogen, Inc. | Area-modulated luminescence (AML) |
US5023424A (en) * | 1990-01-22 | 1991-06-11 | Tencor Instruments | Shock wave particle removal method and apparatus |
JP2002124496A (ja) * | 2000-10-18 | 2002-04-26 | Hitachi Ltd | 研磨加工の終点検出計測方法及びその装置、並びにそれを用いた半導体デバイスの製造方法及びその製造装置 |
US6515742B1 (en) * | 2000-11-28 | 2003-02-04 | Memc Electronic Materials, Inc. | Defect classification using scattered light intensities |
US7671985B1 (en) * | 2006-03-13 | 2010-03-02 | Milan Milosevic | Device for small spot analysis using fiber optic interfaced spectrometers |
JP5465512B2 (ja) * | 2009-10-30 | 2014-04-09 | パナソニック株式会社 | 回路基板の製造方法 |
JP5681453B2 (ja) * | 2010-11-08 | 2015-03-11 | 株式会社ディスコ | 測定方法および測定装置 |
JP5681452B2 (ja) * | 2010-11-08 | 2015-03-11 | 株式会社ディスコ | 測定方法および測定装置 |
US8319181B2 (en) * | 2011-01-30 | 2012-11-27 | Fei Company | System and method for localization of large numbers of fluorescent markers in biological samples |
CN102253021B (zh) * | 2011-05-03 | 2012-12-05 | 杭州电子科技大学 | 一种线形激光光束增强型重金属含量检测方法 |
CN102305778B (zh) * | 2011-05-17 | 2013-10-30 | 易定容 | 微多光谱荧光接收和处理系统 |
US9645085B2 (en) * | 2012-02-17 | 2017-05-09 | Flir Detection, Inc. | Optical emission collection and detection device and method |
-
2016
- 2016-06-22 JP JP2016123697A patent/JP2017227532A/ja active Pending
-
2017
- 2017-05-11 TW TW106115661A patent/TWI758293B/zh active
- 2017-05-26 MY MYPI2017701945A patent/MY186299A/en unknown
- 2017-05-29 SG SG10201704373UA patent/SG10201704373UA/en unknown
- 2017-06-13 DE DE102017209946.1A patent/DE102017209946A1/de active Pending
- 2017-06-13 US US15/621,197 patent/US9989468B2/en active Active
- 2017-06-15 KR KR1020170076047A patent/KR102235431B1/ko active IP Right Grant
- 2017-06-16 CN CN201710455473.4A patent/CN107525789A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR102235431B1 (ko) | 2021-04-01 |
TW201807405A (zh) | 2018-03-01 |
CN107525789A (zh) | 2017-12-29 |
TWI758293B (zh) | 2022-03-21 |
US20170370845A1 (en) | 2017-12-28 |
MY186299A (en) | 2021-07-07 |
JP2017227532A (ja) | 2017-12-28 |
US9989468B2 (en) | 2018-06-05 |
DE102017209946A1 (de) | 2017-12-28 |
KR20180000304A (ko) | 2018-01-02 |
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