SG10201703768VA - Pressure-less ozonated di -water (dio3) recirculation reclaim system and method - Google Patents
Pressure-less ozonated di -water (dio3) recirculation reclaim system and methodInfo
- Publication number
- SG10201703768VA SG10201703768VA SG10201703768VA SG10201703768VA SG10201703768VA SG 10201703768V A SG10201703768V A SG 10201703768VA SG 10201703768V A SG10201703768V A SG 10201703768VA SG 10201703768V A SG10201703768V A SG 10201703768VA SG 10201703768V A SG10201703768V A SG 10201703768VA
- Authority
- SG
- Singapore
- Prior art keywords
- dio3
- ozonated
- recirculation
- pressure
- water
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0063—Regulation, control including valves and floats
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0068—General arrangements, e.g. flowsheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0073—Degasification of liquids by a method not covered by groups B01D19/0005 - B01D19/0042
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/23—O3
- C02F2209/235—O3 in the gas phase
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/38—Gas flow rate
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/04—Flow arrangements
- C02F2301/046—Recirculation with an external loop
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/85978—With pump
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/87249—Multiple inlet with multiple outlet
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Water Treatments (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261724006P | 2012-11-08 | 2012-11-08 | |
| US13/836,842 US9056262B2 (en) | 2012-11-08 | 2013-03-15 | Pressure-less ozonated Di-water (DIO3) recirculation reclaim system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201703768VA true SG10201703768VA (en) | 2017-06-29 |
Family
ID=50621237
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201503149UA SG11201503149UA (en) | 2012-11-08 | 2013-11-04 | Pressure-less ozonated di -water (di03) recirculation reclaim system and method |
| SG10201703768VA SG10201703768VA (en) | 2012-11-08 | 2013-11-04 | Pressure-less ozonated di -water (dio3) recirculation reclaim system and method |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201503149UA SG11201503149UA (en) | 2012-11-08 | 2013-11-04 | Pressure-less ozonated di -water (di03) recirculation reclaim system and method |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US9056262B2 (en) |
| EP (2) | EP3348520A1 (en) |
| JP (2) | JP6092413B2 (en) |
| KR (2) | KR101821314B1 (en) |
| CN (1) | CN106395954B (en) |
| IL (3) | IL238427A (en) |
| SG (2) | SG11201503149UA (en) |
| TW (2) | TWI587902B (en) |
| WO (1) | WO2014074455A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2014233069A1 (en) * | 2013-03-15 | 2015-09-24 | Nantbioscience, Inc. | Substituted indol-5-ol derivatives and their therapeutic applications |
| US20180235110A1 (en) * | 2017-02-16 | 2018-08-16 | Lam Research Corporation | Cooling system for rf power electronics |
| GB2564662B (en) * | 2017-07-18 | 2022-01-12 | Olof Sonander Sven | Vacuum and Degassing System |
| CN112601720A (en) * | 2018-08-29 | 2021-04-02 | Mks仪器公司 | Ozone water delivery system and method of use |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0564706A (en) * | 1991-09-06 | 1993-03-19 | Ngk Insulators Ltd | Deoxidized water manufacturing apparatus |
| JP4347426B2 (en) | 1996-09-26 | 2009-10-21 | 芝浦メカトロニクス株式会社 | Cleaning processing equipment |
| US7163588B2 (en) | 1997-05-09 | 2007-01-16 | Semitool, Inc. | Processing a workpiece using water, a base, and ozone |
| DE19825063A1 (en) | 1998-06-04 | 1999-12-09 | Astex Sorbios Gmbh | Method for suppressing the decay rate of ozone in ultra pure water |
| US6805791B2 (en) | 2000-09-01 | 2004-10-19 | Applied Science And Technology, Inc. | Ozonated water flow and concentration control apparatus |
| JP2003142445A (en) * | 2001-11-08 | 2003-05-16 | Mitsubishi Electric Corp | Washing apparatus and method therefor |
| US6649018B2 (en) | 2002-01-17 | 2003-11-18 | Akrion, Llc | System for removal of photoresist using sparger |
| US20030139057A1 (en) * | 2002-01-18 | 2003-07-24 | Richard Novak | Process and apparatus for removal of photoresist from semiconductor wafers |
| US20040154641A1 (en) | 2002-05-17 | 2004-08-12 | P.C.T. Systems, Inc. | Substrate processing apparatus and method |
| WO2006010109A2 (en) * | 2004-07-08 | 2006-01-26 | Akrion Technologies, Inc. | Method and apparatus for creating ozonated process solutions having high ozone concentration |
| CN101243369B (en) * | 2005-07-07 | 2010-12-15 | Mks仪器股份有限公司 | Ozone system for multi-chamber tools |
| KR100626869B1 (en) * | 2005-09-07 | 2006-09-20 | 주식회사 실트론 | System for cleaning semiconductor wafers |
| JP2007098244A (en) * | 2005-10-03 | 2007-04-19 | Nippon Rensui Co Ltd | Recycling method of ozone-containing drain |
| JP2007111618A (en) * | 2005-10-19 | 2007-05-10 | Pre-Tech Co Ltd | Ozone water decomposition device |
| CN1820824A (en) * | 2006-01-20 | 2006-08-23 | 徐名勇 | Ozone exhaust gas treating device |
| JP2007326101A (en) | 2006-03-20 | 2007-12-20 | Eiji Matsumura | Ozone water treating method |
| JP2008006332A (en) * | 2006-06-27 | 2008-01-17 | Kurita Water Ind Ltd | Method for manufacturing specific-gas-dissolved water, and apparatus and method for circulating specific-gas-dissolved water |
| US7731161B2 (en) * | 2006-10-17 | 2010-06-08 | Mks Instruments, Inc. | Devices, systems, and methods for carbonation of deionized water |
| JP2008311591A (en) * | 2007-06-18 | 2008-12-25 | Sharp Corp | Substrate treatment method and substrate treatment equipment |
| JP2007275893A (en) | 2007-06-20 | 2007-10-25 | Eiji Matsumura | Method for producing gas-liquid mixture, and the gas-liquid mixture |
| JP2009297588A (en) * | 2008-06-10 | 2009-12-24 | Nomura Micro Sci Co Ltd | Method of preparing heated ozone water |
| JP5779321B2 (en) * | 2010-06-18 | 2015-09-16 | シャープ株式会社 | High concentration ozone water manufacturing method and high concentration ozone water manufacturing apparatus |
| JP2012119491A (en) * | 2010-11-30 | 2012-06-21 | Sharp Corp | Photoresist removing method |
| DE112012001221B4 (en) | 2011-03-15 | 2021-07-15 | Mks Instruments, Inc. | System and method for the optional purging of dissolved gases from liquids |
-
2013
- 2013-03-15 US US13/836,842 patent/US9056262B2/en active Active
- 2013-11-04 EP EP17204270.7A patent/EP3348520A1/en not_active Withdrawn
- 2013-11-04 CN CN201610982023.6A patent/CN106395954B/en active Active
- 2013-11-04 SG SG11201503149UA patent/SG11201503149UA/en unknown
- 2013-11-04 SG SG10201703768VA patent/SG10201703768VA/en unknown
- 2013-11-04 JP JP2015541833A patent/JP6092413B2/en active Active
- 2013-11-04 KR KR1020177000525A patent/KR101821314B1/en active IP Right Grant
- 2013-11-04 KR KR1020157014813A patent/KR101699480B1/en active IP Right Grant
- 2013-11-04 WO PCT/US2013/068304 patent/WO2014074455A1/en active Application Filing
- 2013-11-04 EP EP13799418.2A patent/EP2917152B1/en active Active
- 2013-11-07 TW TW105136151A patent/TWI587902B/en active
- 2013-11-07 TW TW102140565A patent/TWI587900B/en active
-
2015
- 2015-04-22 IL IL238427A patent/IL238427A/en active IP Right Grant
- 2015-05-12 US US14/710,255 patent/US9597613B2/en active Active
-
2017
- 2017-02-02 US US15/423,267 patent/US9796603B2/en active Active
- 2017-02-08 JP JP2017021242A patent/JP6348619B2/en active Active
- 2017-07-31 IL IL253747A patent/IL253747A0/en unknown
-
2018
- 2018-09-13 IL IL261762A patent/IL261762B/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| EP2917152B1 (en) | 2018-02-21 |
| TWI587902B (en) | 2017-06-21 |
| CN104903245A (en) | 2015-09-09 |
| TW201438802A (en) | 2014-10-16 |
| CN106395954A (en) | 2017-02-15 |
| WO2014074455A1 (en) | 2014-05-15 |
| US20150315037A1 (en) | 2015-11-05 |
| KR20170005902A (en) | 2017-01-16 |
| KR101821314B1 (en) | 2018-03-08 |
| IL238427A (en) | 2017-08-31 |
| US9056262B2 (en) | 2015-06-16 |
| EP2917152A1 (en) | 2015-09-16 |
| TWI587900B (en) | 2017-06-21 |
| US9796603B2 (en) | 2017-10-24 |
| JP6092413B2 (en) | 2017-03-08 |
| TW201706029A (en) | 2017-02-16 |
| JP2017121628A (en) | 2017-07-13 |
| JP6348619B2 (en) | 2018-06-27 |
| US9597613B2 (en) | 2017-03-21 |
| KR20150081353A (en) | 2015-07-13 |
| IL261762A (en) | 2018-10-31 |
| US20140124036A1 (en) | 2014-05-08 |
| IL261762B (en) | 2019-03-31 |
| KR101699480B1 (en) | 2017-01-24 |
| JP2016503340A (en) | 2016-02-04 |
| CN106395954B (en) | 2019-09-03 |
| IL253747A0 (en) | 2017-09-28 |
| IL238427A0 (en) | 2015-06-30 |
| EP3348520A1 (en) | 2018-07-18 |
| SG11201503149UA (en) | 2015-06-29 |
| US20170144894A1 (en) | 2017-05-25 |
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