SG10201405908UA - Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates - Google Patents

Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates

Info

Publication number
SG10201405908UA
SG10201405908UA SG10201405908UA SG10201405908UA SG10201405908UA SG 10201405908U A SG10201405908U A SG 10201405908UA SG 10201405908U A SG10201405908U A SG 10201405908UA SG 10201405908U A SG10201405908U A SG 10201405908UA SG 10201405908U A SG10201405908U A SG 10201405908UA
Authority
SG
Singapore
Prior art keywords
texturing
single crystal
etching solution
silicon substrates
aqueous acidic
Prior art date
Application number
SG10201405908UA
Inventor
Simon Braun
Julian Prölss
Ihor Melnyk
Michael Michel
Stefan Mathijssen
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of SG10201405908UA publication Critical patent/SG10201405908UA/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
    • C11D2111/22—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
SG10201405908UA 2009-09-21 2010-09-09 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates SG10201405908UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24409009P 2009-09-21 2009-09-21

Publications (1)

Publication Number Publication Date
SG10201405908UA true SG10201405908UA (en) 2014-11-27

Family

ID=43064675

Family Applications (2)

Application Number Title Priority Date Filing Date
SG2012011235A SG178834A1 (en) 2009-09-21 2010-09-09 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
SG10201405908UA SG10201405908UA (en) 2009-09-21 2010-09-09 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG2012011235A SG178834A1 (en) 2009-09-21 2010-09-09 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates

Country Status (9)

Country Link
US (1) US8969276B2 (en)
EP (1) EP2480627A1 (en)
JP (1) JP5813643B2 (en)
KR (1) KR20120135185A (en)
CN (1) CN102656250B (en)
MY (1) MY158452A (en)
SG (2) SG178834A1 (en)
TW (1) TWI494416B (en)
WO (1) WO2011032880A1 (en)

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Also Published As

Publication number Publication date
JP2013505562A (en) 2013-02-14
SG178834A1 (en) 2012-04-27
TW201129680A (en) 2011-09-01
EP2480627A1 (en) 2012-08-01
CN102656250B (en) 2015-02-25
US20120160320A1 (en) 2012-06-28
TWI494416B (en) 2015-08-01
WO2011032880A1 (en) 2011-03-24
CN102656250A (en) 2012-09-05
US8969276B2 (en) 2015-03-03
MY158452A (en) 2016-10-14
KR20120135185A (en) 2012-12-12
JP5813643B2 (en) 2015-11-17

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