SG10201402805UA - Inactive gas supply facility and inactive gas supply method - Google Patents

Inactive gas supply facility and inactive gas supply method

Info

Publication number
SG10201402805UA
SG10201402805UA SG10201402805UA SG10201402805UA SG10201402805UA SG 10201402805U A SG10201402805U A SG 10201402805UA SG 10201402805U A SG10201402805U A SG 10201402805UA SG 10201402805U A SG10201402805U A SG 10201402805UA SG 10201402805U A SG10201402805U A SG 10201402805UA
Authority
SG
Singapore
Prior art keywords
gas supply
inactive gas
control device
processing
facility
Prior art date
Application number
SG10201402805UA
Inventor
Shin Takeshi
Nishikawa Tadashi
Takahara Masahiro
Ueda Toshihito
Original Assignee
Daifuku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daifuku Kk filed Critical Daifuku Kk
Publication of SG10201402805UA publication Critical patent/SG10201402805UA/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C5/00—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures
    • F17C5/002—Automated filling apparatus
    • F17C5/007—Automated filling apparatus for individual gas tanks or containers, e.g. in vehicles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/04—Methods for emptying or filling
    • F17C2227/047—Methods for emptying or filling by repeating a process cycle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/03—Control means
    • F17C2250/034—Control means using wireless transmissions
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0443—Flow or movement of content
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2270/00—Applications
    • F17C2270/05—Applications for industrial use
    • F17C2270/0518—Semiconductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Packages (AREA)
  • Pipeline Systems (AREA)

Abstract

40 INACTIVE GAS SUPPLY FACILITY AND INACTIVE GAS SUPPLY A first control device executes, if it is determined that a second 5 control device has become unable to output an operation instruction, continued operation processing for operating an inactive gas supply portion based on the operation instruction that was last output by the second control device. The first control device further executes, if it is determined during execution of continued operation processing that a stop condition is satisfied, 10 operation stop processing for stopping the inactive gas supply portion by suspending the continued operation processing. Fig. 9
SG10201402805UA 2013-06-26 2014-06-02 Inactive gas supply facility and inactive gas supply method SG10201402805UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013134271A JP5874691B2 (en) 2013-06-26 2013-06-26 Inert gas supply equipment

Publications (1)

Publication Number Publication Date
SG10201402805UA true SG10201402805UA (en) 2015-01-29

Family

ID=52114441

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201402805UA SG10201402805UA (en) 2013-06-26 2014-06-02 Inactive gas supply facility and inactive gas supply method

Country Status (6)

Country Link
US (1) US9822929B2 (en)
JP (1) JP5874691B2 (en)
KR (1) KR102204816B1 (en)
CN (1) CN104253068B (en)
SG (1) SG10201402805UA (en)
TW (1) TWI625813B (en)

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US9550219B2 (en) * 2014-12-29 2017-01-24 Daifuku Co., Ltd. Apparatus of inhalation type for stocking wafer at ceiling and inhaling type wafer stocking system having the same
JP6451453B2 (en) * 2015-03-31 2019-01-16 Tdk株式会社 GAS PURGE DEVICE, LOAD PORT DEVICE, PURGE CONTAINER CONTAINER STAND, AND GAS PURGE METHOD
JP6554872B2 (en) * 2015-03-31 2019-08-07 Tdk株式会社 GAS PURGE DEVICE, LOAD PORT DEVICE, PURGE CONTAINER CONTAINER STAND, AND GAS PURGE METHOD
US10586721B2 (en) * 2015-08-25 2020-03-10 Murata Machinery, Ltd. Purge device, purge stocker, and purge method
JP6414525B2 (en) * 2015-09-02 2018-10-31 株式会社ダイフク Storage facilities
US10855971B2 (en) * 2015-09-16 2020-12-01 HashD, Inc. Systems and methods of creating a three-dimensional virtual image
JP6455404B2 (en) 2015-11-17 2019-01-23 株式会社ダイフク Container transfer equipment
JP6551240B2 (en) * 2016-01-06 2019-07-31 株式会社ダイフク Article storage rack and article storage facility provided with the same
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JP6610476B2 (en) * 2016-09-09 2019-11-27 株式会社ダイフク Container storage equipment
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US10703563B2 (en) * 2017-11-10 2020-07-07 Taiwan Semiconductor Manufacturing Co., Ltd. Stocker
JP6856015B2 (en) * 2017-12-20 2021-04-14 株式会社ダイフク Storage equipment
KR20200022682A (en) * 2018-08-23 2020-03-04 세메스 주식회사 Buffer unit, Apparatus and Method for treating substrate with the unit
JP7501497B2 (en) 2021-11-10 2024-06-18 株式会社ダイフク Container storage facilities
JP7501498B2 (en) 2021-11-10 2024-06-18 株式会社ダイフク Container storage facilities

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Also Published As

Publication number Publication date
JP5874691B2 (en) 2016-03-02
JP2015012042A (en) 2015-01-19
TW201508854A (en) 2015-03-01
CN104253068B (en) 2018-09-07
TWI625813B (en) 2018-06-01
KR102204816B1 (en) 2021-01-18
US20150000785A1 (en) 2015-01-01
CN104253068A (en) 2014-12-31
US9822929B2 (en) 2017-11-21
KR20150001614A (en) 2015-01-06

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