SE9902913D0 - Light activatable composition - Google Patents

Light activatable composition

Info

Publication number
SE9902913D0
SE9902913D0 SE9902913A SE9902913A SE9902913D0 SE 9902913 D0 SE9902913 D0 SE 9902913D0 SE 9902913 A SE9902913 A SE 9902913A SE 9902913 A SE9902913 A SE 9902913A SE 9902913 D0 SE9902913 D0 SE 9902913D0
Authority
SE
Sweden
Prior art keywords
acid
compound
light
photoinitiator
action
Prior art date
Application number
SE9902913A
Other languages
Swedish (sv)
Other versions
SE9902913L (en
Inventor
Christoph De Leo
Hartmut Bleier
Toshikage Asakura
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of SE9902913D0 publication Critical patent/SE9902913D0/en
Publication of SE9902913L publication Critical patent/SE9902913L/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07H—SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H9/00—Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical
    • C07H9/02—Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical the hetero ring containing only oxygen as ring hetero atoms
    • C07H9/04—Cyclic acetals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Genetics & Genomics (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biotechnology (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A composition which can be activated by light, at least one compound which may be crosslinked by the action of an acid and/or at least one compound which changes its solubility under the action of an acid, and as photoinitiator at least one compound generating an acid under the exposure of light of a wavelength of 240 to 390 nm and having a molar extinction coefficient e below 10 at i-line (365 nm) such compositions may be suitable for the preparation of negative and positive photoresists, printing plates, image recording materials or colour filters. Preferably, the photoinitiator is an oxime sulfonate having a structural unit of Formula I:
SE9902913A 1998-08-18 1999-08-16 Light activatable composition SE9902913L (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP98810796 1998-08-18

Publications (2)

Publication Number Publication Date
SE9902913D0 true SE9902913D0 (en) 1999-08-16
SE9902913L SE9902913L (en) 2000-02-19

Family

ID=8236258

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9902913A SE9902913L (en) 1998-08-18 1999-08-16 Light activatable composition

Country Status (17)

Country Link
JP (1) JP2000066385A (en)
KR (1) KR20000017347A (en)
CN (1) CN1246655A (en)
AU (1) AU4452799A (en)
BE (1) BE1012410A3 (en)
BR (1) BR9903726A (en)
CA (1) CA2280365A1 (en)
DE (1) DE19938796A1 (en)
DK (1) DK199901098A (en)
ES (1) ES2155799B1 (en)
FI (1) FI19991731A (en)
FR (1) FR2782560A1 (en)
GB (1) GB2340494A (en)
IT (1) IT1313611B1 (en)
NL (1) NL1012854C2 (en)
SE (1) SE9902913L (en)
SG (1) SG80060A1 (en)

Families Citing this family (176)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002538241A (en) * 1999-03-03 2002-11-12 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド Oxime derivatives and their use as photoinitiators
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TW594390B (en) 2001-05-21 2004-06-21 Tokyo Ohka Kogyo Co Ltd Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
TW589514B (en) * 2001-09-13 2004-06-01 Matsushita Electric Ind Co Ltd Pattern formation material and pattern formation method
JP4291638B2 (en) 2003-07-29 2009-07-08 富士フイルム株式会社 Alkali-soluble polymer and planographic printing plate precursor using the same
US20050153239A1 (en) 2004-01-09 2005-07-14 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method using the same
US20050208423A1 (en) 2004-03-19 2005-09-22 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
EP2246741A1 (en) 2004-05-19 2010-11-03 Fujifilm Corporation Image recording method
US20050263021A1 (en) 2004-05-31 2005-12-01 Fuji Photo Film Co., Ltd. Platemaking method for lithographic printing plate precursor and planographic printing method
JP2006021396A (en) 2004-07-07 2006-01-26 Fuji Photo Film Co Ltd Original lithographic printing plate and lithographic printing method
EP1619023B1 (en) 2004-07-20 2008-06-11 FUJIFILM Corporation Image forming material
US20060032390A1 (en) 2004-07-30 2006-02-16 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
US7745090B2 (en) 2004-08-24 2010-06-29 Fujifilm Corporation Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method
JP2006062188A (en) 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd Color image forming material and original plate of lithographic printing plate
JP2006068963A (en) 2004-08-31 2006-03-16 Fuji Photo Film Co Ltd Polymerizable composition, hydrophilic film using this composition and original lithographic printing plate
JP5089866B2 (en) 2004-09-10 2012-12-05 富士フイルム株式会社 Planographic printing method
US20060150846A1 (en) 2004-12-13 2006-07-13 Fuji Photo Film Co. Ltd Lithographic printing method
JP2006181838A (en) 2004-12-27 2006-07-13 Fuji Photo Film Co Ltd Original plate of lithographic printing plate
EP1685957B1 (en) 2005-01-26 2013-12-11 FUJIFILM Corporation Packaged body of lithographic printing plate precursors
EP3086176A1 (en) 2005-02-28 2016-10-26 Fujifilm Corporation A lithographic printing method
JP4815270B2 (en) 2005-08-18 2011-11-16 富士フイルム株式会社 Method and apparatus for producing a lithographic printing plate
JP4759343B2 (en) 2005-08-19 2011-08-31 富士フイルム株式会社 Planographic printing plate precursor and planographic printing method
JP2007241144A (en) 2006-03-10 2007-09-20 Fujifilm Corp Photosensitive composition, optical recording medium and method for manufacturing the same, optical recording method, and optical recording device
JP2007246418A (en) * 2006-03-14 2007-09-27 Canon Inc Photosensitive silane coupling agent, method for forming pattern and method for producing device
JP5171005B2 (en) 2006-03-17 2013-03-27 富士フイルム株式会社 Polymer compound, method for producing the same, and pigment dispersant
JP4698470B2 (en) 2006-03-31 2011-06-08 富士フイルム株式会社 Optical recording medium processing method and processing apparatus, and optical recording / reproducing apparatus
JP4777226B2 (en) 2006-12-07 2011-09-21 富士フイルム株式会社 Image recording materials and novel compounds
US8771924B2 (en) 2006-12-26 2014-07-08 Fujifilm Corporation Polymerizable composition, lithographic printing plate precursor and lithographic printing method
JP4945432B2 (en) 2006-12-28 2012-06-06 富士フイルム株式会社 Preparation method of lithographic printing plate
JP2009080445A (en) 2007-01-17 2009-04-16 Fujifilm Corp Method for preparing lithographic printing plate
JP4881756B2 (en) 2007-02-06 2012-02-22 富士フイルム株式会社 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dye
JP2008233660A (en) 2007-03-22 2008-10-02 Fujifilm Corp Automatic development device for immersion type lithographic printing plate and method thereof
ATE471812T1 (en) 2007-03-23 2010-07-15 Fujifilm Corp NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING PROCESS THEREFROM
JP4860525B2 (en) 2007-03-27 2012-01-25 富士フイルム株式会社 Curable composition and planographic printing plate precursor
EP1974914B1 (en) 2007-03-29 2014-02-26 FUJIFILM Corporation Method of preparing lithographic printing plate
JP5030638B2 (en) 2007-03-29 2012-09-19 富士フイルム株式会社 Color filter and manufacturing method thereof
EP1975702B1 (en) 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
EP1975706A3 (en) 2007-03-30 2010-03-03 FUJIFILM Corporation Lithographic printing plate precursor
EP1975710B1 (en) 2007-03-30 2013-10-23 FUJIFILM Corporation Plate-making method of lithographic printing plate precursor
JP5075450B2 (en) 2007-03-30 2012-11-21 富士フイルム株式会社 Planographic printing plate precursor
JP5046744B2 (en) 2007-05-18 2012-10-10 富士フイルム株式会社 Planographic printing plate precursor and printing method using the same
JP5376844B2 (en) 2007-06-21 2013-12-25 富士フイルム株式会社 Planographic printing plate precursor and planographic printing method
EP2006091B1 (en) 2007-06-22 2010-12-08 FUJIFILM Corporation Lithographic printing plate precursor and plate making method
DE602008002963D1 (en) 2007-07-02 2010-11-25 Fujifilm Corp Planographic printing plate precursor and planographic printing method with it
JP5213375B2 (en) 2007-07-13 2013-06-19 富士フイルム株式会社 Pigment dispersion, curable composition, color filter using the same, and solid-state imaging device
EP2048539A1 (en) 2007-09-06 2009-04-15 FUJIFILM Corporation Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
JP2009069761A (en) 2007-09-18 2009-04-02 Fujifilm Corp Plate making method for planographic printing plate
JP2009091555A (en) 2007-09-18 2009-04-30 Fujifilm Corp Curable composition, image forming material and planographic printing plate precursor
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
JP5002399B2 (en) 2007-09-28 2012-08-15 富士フイルム株式会社 Processing method of lithographic printing plate precursor
EP2042311A1 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method
US7955781B2 (en) 2007-09-28 2011-06-07 Fujifilm Corporation Negative-working photosensitive material and negative-working planographic printing plate precursor
JP5244518B2 (en) 2007-09-28 2013-07-24 富士フイルム株式会社 Planographic printing plate precursor and lithographic printing plate preparation method
JP5055077B2 (en) 2007-09-28 2012-10-24 富士フイルム株式会社 Image forming method and planographic printing plate precursor
JP4890408B2 (en) 2007-09-28 2012-03-07 富士フイルム株式会社 Polymerizable composition, lithographic printing plate precursor using the same, alkali-soluble polyurethane resin, and method for producing diol compound
JP4951454B2 (en) 2007-09-28 2012-06-13 富士フイルム株式会社 How to create a lithographic printing plate
JP5322537B2 (en) 2007-10-29 2013-10-23 富士フイルム株式会社 Planographic printing plate precursor
WO2009057523A1 (en) 2007-11-01 2009-05-07 Fujifilm Corporation Pigment dispersion composition, curable color composition, color filter and method for producing the same
JP2009139852A (en) 2007-12-10 2009-06-25 Fujifilm Corp Method of preparing lithographic printing plate and lithographic printing plate precursor
JP5066452B2 (en) 2008-01-09 2012-11-07 富士フイルム株式会社 Development processing method for lithographic printing plate
JP2009186997A (en) 2008-01-11 2009-08-20 Fujifilm Corp Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method
JP5155677B2 (en) 2008-01-22 2013-03-06 富士フイルム株式会社 Planographic printing plate precursor and its plate making method
JP5371449B2 (en) 2008-01-31 2013-12-18 富士フイルム株式会社 Resin, pigment dispersion, colored curable composition, color filter using the same, and method for producing the same
JP2009184188A (en) 2008-02-05 2009-08-20 Fujifilm Corp Lithographic printing original plate and printing method
JP5150287B2 (en) 2008-02-06 2013-02-20 富士フイルム株式会社 Preparation method of lithographic printing plate and lithographic printing plate precursor
JP5147499B2 (en) 2008-02-13 2013-02-20 富士フイルム株式会社 Photosensitive coloring composition, color filter and method for producing the same
JP5175582B2 (en) 2008-03-10 2013-04-03 富士フイルム株式会社 Preparation method of lithographic printing plate
JP2009214428A (en) 2008-03-11 2009-09-24 Fujifilm Corp Original plate of lithographic printing plate and lithographic printing method
JP5334624B2 (en) 2008-03-17 2013-11-06 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
WO2009116442A1 (en) 2008-03-17 2009-09-24 富士フイルム株式会社 Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display element, and solid image pickup element
JP2009229771A (en) 2008-03-21 2009-10-08 Fujifilm Corp Automatic developing method for lithographic printing plate
JP4940174B2 (en) 2008-03-21 2012-05-30 富士フイルム株式会社 Automatic development equipment for lithographic printing plates
JP5422146B2 (en) 2008-03-25 2014-02-19 富士フイルム株式会社 Processing solution for preparing a lithographic printing plate and processing method of a lithographic printing plate precursor
JP2009236942A (en) 2008-03-25 2009-10-15 Fujifilm Corp Planographic printing plate precursor and plate making method of the same
JP5020871B2 (en) 2008-03-25 2012-09-05 富士フイルム株式会社 Planographic printing plate manufacturing method
JP5422134B2 (en) 2008-03-25 2014-02-19 富士フイルム株式会社 Automatic development method for immersion lithographic printing plates
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
EP2105298B1 (en) 2008-03-28 2014-03-19 FUJIFILM Corporation Negative-working lithographic printing plate precursor and method of lithographic printing using same
JP5535444B2 (en) 2008-03-28 2014-07-02 富士フイルム株式会社 Green curable composition for solid-state image sensor, color filter for solid-state image sensor, and method for producing the same
JP5155920B2 (en) 2008-03-31 2013-03-06 富士フイルム株式会社 Photosensitive transparent resin composition, method for producing color filter, and color filter
JP4914864B2 (en) 2008-03-31 2012-04-11 富士フイルム株式会社 Preparation method of lithographic printing plate
JP5137662B2 (en) 2008-03-31 2013-02-06 富士フイルム株式会社 Curable composition, color filter and method for producing the same, and solid-state imaging device
JP5528677B2 (en) 2008-03-31 2014-06-25 富士フイルム株式会社 Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor
EP2110261B1 (en) 2008-04-18 2018-03-28 FUJIFILM Corporation Aluminum alloy plate for lithographic printing plate, ligthographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support
KR101441998B1 (en) 2008-04-25 2014-09-18 후지필름 가부시키가이샤 Polymerizable composition, light shielding color filter, black curable composition, light shielding color filter for solid-state imaging device, method of manufacturing the same, and solid-state imaging device
JP5296434B2 (en) 2008-07-16 2013-09-25 富士フイルム株式会社 Master for lithographic printing plate
JP5274151B2 (en) 2008-08-21 2013-08-28 富士フイルム株式会社 Photosensitive resin composition, color filter, method for producing the same, and solid-state imaging device
JP5444933B2 (en) 2008-08-29 2014-03-19 富士フイルム株式会社 Negative-type planographic printing plate precursor and planographic printing method using the same
JP5449898B2 (en) 2008-09-22 2014-03-19 富士フイルム株式会社 Planographic printing plate precursor and printing method using the same
JP5408942B2 (en) 2008-09-22 2014-02-05 富士フイルム株式会社 Planographic printing plate precursor and plate making method
EP2168767A1 (en) 2008-09-24 2010-03-31 Fujifilm Corporation Method of preparing lithographic printing plate
JP5079653B2 (en) 2008-09-29 2012-11-21 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
JP5171514B2 (en) 2008-09-29 2013-03-27 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
JP5127651B2 (en) 2008-09-30 2013-01-23 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
JP5660268B2 (en) 2008-09-30 2015-01-28 富士フイルム株式会社 Planographic printing plate precursor, lithographic printing plate making method and polymerizable monomer
JP5340102B2 (en) 2008-10-03 2013-11-13 富士フイルム株式会社 Dispersion composition, polymerizable composition, light-shielding color filter, solid-state imaging device, liquid crystal display device, wafer level lens, and imaging unit
KR101700980B1 (en) 2009-02-20 2017-01-31 산아프로 가부시키가이샤 Sulfonium salt, photo-acid generator, and photosensitive resin composition
JP5340198B2 (en) 2009-02-26 2013-11-13 富士フイルム株式会社 Dispersion composition
JP5277039B2 (en) 2009-03-30 2013-08-28 富士フイルム株式会社 Planographic printing plate precursor and plate making method
WO2010119924A1 (en) 2009-04-16 2010-10-21 富士フイルム株式会社 Polymerizable composition for color filter, color filter, and solid imaging element
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
JP2012003225A (en) 2010-01-27 2012-01-05 Fujifilm Corp Polymerizable composition for solder resist and method for forming solder resist pattern
JP5791874B2 (en) 2010-03-31 2015-10-07 富士フイルム株式会社 COLORING COMPOSITION, INKJET INK, COLOR FILTER AND ITS MANUFACTURING METHOD, SOLID-STATE IMAGING DEVICE, AND DISPLAY DEVICE
JP5638285B2 (en) 2010-05-31 2014-12-10 富士フイルム株式会社 Polymerizable composition, cured film, color filter, method for producing color filter, and solid-state imaging device
US8152863B2 (en) 2010-06-01 2012-04-10 Fujifilm Corporation Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
JP5622564B2 (en) 2010-06-30 2014-11-12 富士フイルム株式会社 Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device
JP5544239B2 (en) 2010-07-29 2014-07-09 富士フイルム株式会社 Polymerizable composition
KR101830206B1 (en) 2010-12-28 2018-02-20 후지필름 가부시키가이샤 Titanium black dispersion composition for forming light blocking film and method of producing the same, black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film
JP5417364B2 (en) 2011-03-08 2014-02-12 富士フイルム株式会社 Curable composition for solid-state imaging device, photosensitive layer, permanent pattern, wafer level lens, solid-state imaging device, and pattern forming method using the same
TWI548701B (en) 2011-09-14 2016-09-11 富士軟片股份有限公司 Colored radiation-sensitive composition for color filter, colored film, pattern forming method, color filter and method of producing the same, and solid-state image sensor
KR101426236B1 (en) * 2011-11-30 2014-08-06 엘지디스플레이 주식회사 Composition of organic insulating layer and Thin film Transistor substrate and Display Device using the same
JP5976523B2 (en) 2011-12-28 2016-08-23 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5922013B2 (en) 2011-12-28 2016-05-24 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5934664B2 (en) 2012-03-19 2016-06-15 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
JP5775479B2 (en) 2012-03-21 2015-09-09 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
JP5909468B2 (en) 2012-08-31 2016-04-26 富士フイルム株式会社 Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device
JP5934682B2 (en) 2012-08-31 2016-06-15 富士フイルム株式会社 Curable composition for forming microlenses or undercoat film for color filter, transparent film, microlens, solid-state imaging device, and method for producing curable composition
JP5894943B2 (en) 2012-08-31 2016-03-30 富士フイルム株式会社 Dispersion composition, curable composition using the same, transparent film, microlens, method for producing microlens, and solid-state imaging device
CN104918914A (en) 2012-10-18 2015-09-16 三亚普罗股份有限公司 Sulfonium salt, photoacid generator, curable composition, and resist composition
WO2014084288A1 (en) 2012-11-30 2014-06-05 富士フイルム株式会社 Curable resin composition, and image-sensor-chip production method and image sensor chip using same
SG11201504205WA (en) 2012-11-30 2015-07-30 Fujifilm Corp Curable resin composition, production method of image sensor chip using the same, and image sensor chip
JP6170673B2 (en) 2012-12-27 2017-07-26 富士フイルム株式会社 Composition for color filter, infrared transmission filter, method for producing the same, and infrared sensor
WO2014104136A1 (en) 2012-12-28 2014-07-03 富士フイルム株式会社 Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same
EP2940081A4 (en) 2012-12-28 2016-01-06 Fujifilm Corp Curable resin composition, infrared cut-off filter, and solid-state imaging element using same
JP6097128B2 (en) 2013-04-12 2017-03-15 富士フイルム株式会社 Far infrared light shielding layer forming composition
JP6162084B2 (en) 2013-09-06 2017-07-12 富士フイルム株式会社 Colored composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, polymer, xanthene dye
JP6708382B2 (en) 2015-09-03 2020-06-10 サンアプロ株式会社 Curable composition and cured product using the same
TWI634135B (en) 2015-12-25 2018-09-01 日商富士軟片股份有限公司 Resin, composition, cured film, method for producing cured film, and semiconductor element
CN105607417A (en) * 2015-12-30 2016-05-25 苏州瑞红电子化学品有限公司 Coumarin-based sulphonate photo-acid generator and preparation method therefor
EP3431513B1 (en) 2016-03-14 2020-12-23 FUJIFILM Corporation Composition, film, cured film, optical sensor and method for producing film
WO2017212963A1 (en) 2016-06-09 2017-12-14 サンアプロ株式会社 Sulfonium salt, photoacid generator, curable composition, and resist composition
WO2018003470A1 (en) 2016-06-29 2018-01-04 サンアプロ株式会社 Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof
JP6902031B2 (en) 2016-07-28 2021-07-14 サンアプロ株式会社 Sulfonium salt, heat or photoacid generator, heat or photocurable composition and cured product thereof
TW201821280A (en) 2016-09-30 2018-06-16 日商富士軟片股份有限公司 Laminate and manufacturing method for semiconductor element
WO2018084076A1 (en) 2016-11-04 2018-05-11 富士フイルム株式会社 Windshield glass, head-up display system, and half-mirror film
JP6867416B2 (en) 2017-02-09 2021-04-28 富士フイルム株式会社 Half mirror, half mirror manufacturing method, and mirror with image display function
WO2018159626A1 (en) 2017-02-28 2018-09-07 富士フイルム株式会社 Curable composition, lithographic printing plate precursor, and method for preparing lithographic printing plate
JP7062635B2 (en) 2017-02-28 2022-05-06 富士フイルム株式会社 Curable composition, lithographic printing plate original plate, lithographic printing plate preparation method, and compound
CN111051961B (en) 2017-09-07 2021-12-24 富士胶片株式会社 Half mirror film for projection image display, laminated glass for projection image display, and image display system
CN111095046B (en) 2017-09-15 2022-07-22 富士胶片株式会社 Composition, film, laminate, infrared transmission filter, solid-state imaging element, and infrared sensor
CN111566068B (en) 2018-02-23 2022-09-06 富士胶片株式会社 Method for producing image display laminated glass, and image display system
JP7016403B2 (en) 2018-03-13 2022-02-04 富士フイルム株式会社 Manufacturing method of cured film, manufacturing method of solid-state image sensor
CN111788181B (en) 2018-05-25 2023-01-17 三亚普罗股份有限公司 Sulfonium salt, photoacid generator, curable composition, and resist composition
CN112601912A (en) 2018-09-07 2021-04-02 富士胶片株式会社 Vehicle headlamp unit, headlamp shading film, and method for manufacturing headlamp shading film
WO2020059509A1 (en) 2018-09-20 2020-03-26 富士フイルム株式会社 Curable composition, cured film, infrared transmission filter, laminate, solid-state imaging element, sensor, and pattern formation method
EP3869245A4 (en) 2018-10-17 2021-12-15 FUJIFILM Corporation Projection image display member, windshield glass, and head-up display system
EP3895927A4 (en) 2018-12-10 2022-02-23 FUJIFILM Corporation Projection image displaying member, windshield glass, and head-up display system
CN113498487B (en) 2019-03-06 2023-07-04 富士胶片株式会社 Laminated film for projection image display, laminated glass for projection image display, and image display system
KR102603923B1 (en) 2019-03-29 2023-11-20 후지필름 가부시키가이샤 Photosensitive resin composition, cured film, inductor, antenna
WO2020262270A1 (en) 2019-06-27 2020-12-30 富士フイルム株式会社 Composition, film, and optical sensor
WO2021039205A1 (en) 2019-08-29 2021-03-04 富士フイルム株式会社 Composition, film, near-infrared cut-off filter, pattern formation method, laminate, solid-state imaging element, infrared sensor, image display device, camera module and compound
KR20220035458A (en) 2019-08-30 2022-03-22 후지필름 가부시키가이샤 Composition, film, optical filter and manufacturing method thereof, solid-state imaging device, infrared sensor, and sensor module
TWI851818B (en) 2019-09-26 2024-08-11 日商富士軟片股份有限公司 Method for manufacturing heat-conducting layer, method for manufacturing laminate, and method for manufacturing semiconductor device
EP4036644A4 (en) 2019-09-27 2022-11-30 FUJIFILM Corporation Projector for head-up display
EP4130812A4 (en) 2020-03-30 2023-11-22 FUJIFILM Corporation Reflective film, windshield glass, and head-up display system
JP7470780B2 (en) 2020-03-30 2024-04-18 富士フイルム株式会社 Composition, film and optical sensor
CN115698783A (en) 2020-06-03 2023-02-03 富士胶片株式会社 Reflecting film, method for producing laminated glass, and laminated glass
JPWO2022059706A1 (en) 2020-09-18 2022-03-24
WO2022065183A1 (en) 2020-09-24 2022-03-31 富士フイルム株式会社 Composition, magnetic particle-containing cured product, magnetic particle introduced substrate, and electronic material
EP4220859A4 (en) 2020-09-28 2024-03-27 FUJIFILM Corporation Laminate manufacturing method, antenna-in package manufacturing method, laminate, and composition
JPWO2022123946A1 (en) 2020-12-09 2022-06-16
JPWO2022131191A1 (en) 2020-12-16 2022-06-23
CN112650024B (en) * 2020-12-17 2023-08-01 江苏艾森半导体材料股份有限公司 High-film-thickness negative photoresist applied to chip packaging technology
WO2022130773A1 (en) 2020-12-17 2022-06-23 富士フイルム株式会社 Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor
TW202244147A (en) 2021-03-19 2022-11-16 日商富士軟片股份有限公司 Film and photosensor
KR20230146036A (en) 2021-03-22 2023-10-18 후지필름 가부시키가이샤 Composition, magnetic particle-containing cured material, magnetic particle-introduced substrate, electronic material
EP4318057A4 (en) 2021-03-29 2024-11-06 Fujifilm Corp Black photosensitive composition, manufacturing method of black photosensitive composition, cured film, color filter, light-shielding film, optical element, solid-state image capturing element, and headlight unit
WO2023032545A1 (en) 2021-08-31 2023-03-09 富士フイルム株式会社 Cured product production method, laminate production method, semiconductor device manufacturing method, and processing liquid
CN117916279A (en) 2021-09-29 2024-04-19 富士胶片株式会社 Composition, resin, film and optical sensor
EP4411452A1 (en) 2021-09-30 2024-08-07 FUJIFILM Corporation Head-up display system and transport
WO2023054565A1 (en) 2021-09-30 2023-04-06 富士フイルム株式会社 Method for producing magnetic particle-containing composition, magnetic particle-containing composition, magnetic particle-containing cured product, magnetic particle-introduced substrate, and electronic material
EP4428599A1 (en) 2021-11-05 2024-09-11 FUJIFILM Corporation Virtual image display device, head-up display system, and transport machine
EP4456133A1 (en) 2021-12-23 2024-10-30 FUJIFILM Corporation Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part
WO2023162687A1 (en) 2022-02-24 2023-08-31 富士フイルム株式会社 Resin composition, cured article, laminate, method for producing cured article, method for producing laminate, method for producing semiconductor device, and semiconductor device
KR20240156619A (en) 2022-03-29 2024-10-30 후지필름 가부시키가이샤 Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and, semiconductor device
WO2023200018A1 (en) 2022-04-15 2023-10-19 富士フイルム株式会社 Reflective film, multilayer body, windshield glass, and image display system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
EP0361907A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photoresist compositions for deep uv image reversal
JPH07159992A (en) * 1993-12-07 1995-06-23 Hitachi Ltd Pattern forming material and pattern forming method
JP3587413B2 (en) * 1995-12-20 2004-11-10 東京応化工業株式会社 Chemically amplified resist composition and acid generator used therein
BR9713311A (en) * 1996-09-02 2000-02-01 Ciba Sc Holding Ag Alquisulfonyloximaxes for high sensitivity high resolution i-line photorresists
JP3053072B2 (en) * 1996-09-10 2000-06-19 東京応化工業株式会社 Resist laminate and pattern forming method using the same
JP3655030B2 (en) * 1996-12-10 2005-06-02 東京応化工業株式会社 Negative chemically amplified resist composition

Also Published As

Publication number Publication date
NL1012854C2 (en) 2000-12-19
ES2155799B1 (en) 2002-02-01
SG80060A1 (en) 2001-04-17
AU4452799A (en) 2000-03-09
ITMI991819A1 (en) 2001-02-13
BR9903726A (en) 2000-10-03
FR2782560A1 (en) 2000-02-25
ES2155799A1 (en) 2001-05-16
CA2280365A1 (en) 2000-02-18
KR20000017347A (en) 2000-03-25
GB2340494A8 (en) 2000-02-29
DK199901098A (en) 2000-02-19
DE19938796A1 (en) 2000-02-24
JP2000066385A (en) 2000-03-03
SE9902913L (en) 2000-02-19
BE1012410A3 (en) 2000-10-03
FI19991731A (en) 2000-02-18
NL1012854A1 (en) 2000-02-21
GB9919007D0 (en) 1999-10-13
CN1246655A (en) 2000-03-08
IT1313611B1 (en) 2002-09-09
GB2340494A (en) 2000-02-23
ITMI991819A0 (en) 1999-08-13

Similar Documents

Publication Publication Date Title
SE9902913L (en) Light activatable composition
JPS5474728A (en) Photosensitive composition
ES474173A1 (en) 3- and 4-Azidophthalic acid derivatives and process for their preparation.
EP1655132A3 (en) Positive photosensitive lithographic printing plate
CA2428255A1 (en) Onium salts and the use therof as latent acids
GB2306958B (en) Oximesulfonic acid esters and the use thereof as latent sulfonic acids
MX168017B (en) DIELECTRIC COMPOSITIONS SUITABLE TO FORM A PATTERN WITH LIGHT, METHOD FOR ITS FORMATION AND USE
ATE360838T1 (en) FLAT PLATE PRINTING PLATE PRECURSOR AND METHOD FOR PRODUCING A PLATICAL PRINTING PLATE
ATE2581T1 (en) LIGHT SENSITIVE MIXTURE.
AU4455297A (en) Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
ES2066060T3 (en) HUMIDIFIED SOLUTION FOR LITHOGRAPHIC PRINTING.
ATE149164T1 (en) NEW TETRAZOLE DERIVATIVES, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE
ATE2288T1 (en) PHOTOPOLYMERIZABLE COMPOUND.
NO912283L (en) PROCEDURE FOR THE PREPARATION OF HEXINE HYDROAZEPINE DERIVATIVES.
AU542387B2 (en) Naphthoquinone diazide sulfonic ester
CA2118604A1 (en) Photopolymerizable composition comprising a squarylium compound
JPS5536838A (en) Novel light absorber and photoresist composition containing this
WO2002039186A3 (en) Photoacid generators in photoresist compositions for microlithography
ATE256106T1 (en) POSITIVELY WORKING LIGHT SENSITIVE COMPOSITION
BR8304780A (en) PHOTOPOLIMERIZABLE MIXTURE AND 1,3-DIAZA-9-TIA-ANTRACEN-2,4-DIONAS
BR8804486A (en) O-ALKYL-O- (6-METHYL-2-ALKYL-PYRIMIDINE-4-ILO) TINOALCANODIPHYPHONATES, PROCESS FOR ITS PREPARATION, INSECTICID COMPOSITIONS, PROCESS FOR COMBATING ATROPODES AND FOR THE PREPARATION OF ARTROPODICIDES
JPS5698196A (en) Copying paper
TH38804A3 (en) Sulfonyloxime for i line phthoresis with high sensitivit and high resis thickness.

Legal Events

Date Code Title Description
NAV Patent application has lapsed