SE7411634L - - Google Patents

Info

Publication number
SE7411634L
SE7411634L SE7411634A SE7411634A SE7411634L SE 7411634 L SE7411634 L SE 7411634L SE 7411634 A SE7411634 A SE 7411634A SE 7411634 A SE7411634 A SE 7411634A SE 7411634 L SE7411634 L SE 7411634L
Authority
SE
Sweden
Application number
SE7411634A
Inventor
K-U Stein
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732346720 external-priority patent/DE2346720C3/de
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of SE7411634L publication Critical patent/SE7411634L/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SE7411634A 1973-09-17 1974-09-16 SE7411634L (OSRAM)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732346720 DE2346720C3 (de) 1973-09-17 Vorrichtung zum Justieren von Halbleiterscheiben bezüglich einer Bestrahlungsmaske

Publications (1)

Publication Number Publication Date
SE7411634L true SE7411634L (OSRAM) 1975-03-18

Family

ID=5892800

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7411634A SE7411634L (OSRAM) 1973-09-17 1974-09-16

Country Status (9)

Country Link
JP (1) JPS5057656A (OSRAM)
BE (1) BE820006A (OSRAM)
CH (1) CH572664A5 (OSRAM)
DK (1) DK481574A (OSRAM)
FR (1) FR2244261A1 (OSRAM)
IT (1) IT1021303B (OSRAM)
LU (1) LU70922A1 (OSRAM)
NL (1) NL7412033A (OSRAM)
SE (1) SE7411634L (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5267570A (en) * 1975-12-03 1977-06-04 Hitachi Ltd Pattern printing device
JPS5313879A (en) * 1976-07-23 1978-02-07 Nec Corp Silicon mask for x-ray exposure and its production
DE2942990A1 (de) * 1979-10-24 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zur automatischen justierung von strukturen in zwei parallelen ebenen, insbesondere bei der herstellung von integrierten halbleiterschaltungen
DD151231A1 (de) * 1980-06-02 1981-10-08 Dietmar Klingenfeld Optische anordnung fuer projektionslithografische einrichtungen
GB2089524B (en) * 1980-12-17 1984-12-05 Westinghouse Electric Corp High resolution lithographic process
JPS61111535A (ja) * 1985-09-30 1986-05-29 Chiyou Lsi Gijutsu Kenkyu Kumiai X線露光方法
JPS61111534A (ja) * 1985-09-30 1986-05-29 Chiyou Lsi Gijutsu Kenkyu Kumiai X線露光装置

Also Published As

Publication number Publication date
LU70922A1 (OSRAM) 1975-02-24
JPS5057656A (OSRAM) 1975-05-20
DK481574A (OSRAM) 1975-06-02
DE2346720A1 (de) 1975-04-03
CH572664A5 (OSRAM) 1976-02-13
DE2346720B2 (de) 1975-07-17
IT1021303B (it) 1978-01-30
FR2244261A1 (en) 1975-04-11
NL7412033A (nl) 1975-03-19
BE820006A (fr) 1975-01-16

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