SE467976B - Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen - Google Patents

Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen

Info

Publication number
SE467976B
SE467976B SE9100507A SE9100507A SE467976B SE 467976 B SE467976 B SE 467976B SE 9100507 A SE9100507 A SE 9100507A SE 9100507 A SE9100507 A SE 9100507A SE 467976 B SE467976 B SE 467976B
Authority
SE
Sweden
Prior art keywords
anode
container
electrolyte
nickel
matrix
Prior art date
Application number
SE9100507A
Other languages
English (en)
Swedish (sv)
Other versions
SE9100507L (sv
SE9100507D0 (sv
Inventor
M Aa Haallberg
Original Assignee
Dcm Innovation Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dcm Innovation Ab filed Critical Dcm Innovation Ab
Priority to SE9100507A priority Critical patent/SE467976B/sv
Publication of SE9100507D0 publication Critical patent/SE9100507D0/xx
Priority to EP92850030A priority patent/EP0500513B1/de
Priority to DE69210650T priority patent/DE69210650T2/de
Priority to US07/838,556 priority patent/US5244563A/en
Publication of SE9100507L publication Critical patent/SE9100507L/
Publication of SE467976B publication Critical patent/SE467976B/sv
Priority to US08/084,543 priority patent/US5427674A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Optical Record Carriers (AREA)
SE9100507A 1991-02-20 1991-02-20 Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen SE467976B (sv)

Priority Applications (5)

Application Number Priority Date Filing Date Title
SE9100507A SE467976B (sv) 1991-02-20 1991-02-20 Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen
EP92850030A EP0500513B1 (de) 1991-02-20 1992-02-12 Vorrichtung und Verfahren zum Elektroplattieren
DE69210650T DE69210650T2 (de) 1991-02-20 1992-02-12 Vorrichtung und Verfahren zum Elektroplattieren
US07/838,556 US5244563A (en) 1991-02-20 1992-02-19 Apparatus and method for electroplating
US08/084,543 US5427674A (en) 1991-02-20 1993-06-28 Apparatus and method for electroplating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9100507A SE467976B (sv) 1991-02-20 1991-02-20 Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen

Publications (3)

Publication Number Publication Date
SE9100507D0 SE9100507D0 (sv) 1991-02-20
SE9100507L SE9100507L (sv) 1992-08-21
SE467976B true SE467976B (sv) 1992-10-12

Family

ID=20381949

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9100507A SE467976B (sv) 1991-02-20 1991-02-20 Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen

Country Status (4)

Country Link
US (2) US5244563A (de)
EP (1) EP0500513B1 (de)
DE (1) DE69210650T2 (de)
SE (1) SE467976B (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE467976B (sv) * 1991-02-20 1992-10-12 Dcm Innovation Ab Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen
US5807469A (en) * 1995-09-27 1998-09-15 Intel Corporation Flexible continuous cathode contact circuit for electrolytic plating of C4, tab microbumps, and ultra large scale interconnects
DE19602182C2 (de) * 1996-01-23 1998-08-13 Technotrans Gmbh Verfahren und Vorrichtung zur thermischen Prozessteuerung bei der elektrolytischen Beschichtung von Werkzeugen für die Herstellung von CD-Datenträgern
WO2000061498A2 (en) 1999-04-13 2000-10-19 Semitool, Inc. System for electrochemically processing a workpiece
US6174425B1 (en) 1997-05-14 2001-01-16 Motorola, Inc. Process for depositing a layer of material over a substrate
US6001235A (en) * 1997-06-23 1999-12-14 International Business Machines Corporation Rotary plater with radially distributed plating solution
US6818110B1 (en) 1997-09-30 2004-11-16 Symyx Technologies, Inc. Combinatorial electrochemical deposition and testing system
US6187164B1 (en) 1997-09-30 2001-02-13 Symyx Technologies, Inc. Method for creating and testing a combinatorial array employing individually addressable electrodes
US6565729B2 (en) 1998-03-20 2003-05-20 Semitool, Inc. Method for electrochemically depositing metal on a semiconductor workpiece
US6080288A (en) * 1998-05-29 2000-06-27 Schwartz; Vladimir System for forming nickel stampers utilized in optical disc production
US6228232B1 (en) 1998-07-09 2001-05-08 Semitool, Inc. Reactor vessel having improved cup anode and conductor assembly
US6497801B1 (en) 1998-07-10 2002-12-24 Semitool Inc Electroplating apparatus with segmented anode array
US7020537B2 (en) 1999-04-13 2006-03-28 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7438788B2 (en) 1999-04-13 2008-10-21 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US7189318B2 (en) 1999-04-13 2007-03-13 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7351315B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7351314B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7585398B2 (en) 1999-04-13 2009-09-08 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7264698B2 (en) 1999-04-13 2007-09-04 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US6916412B2 (en) 1999-04-13 2005-07-12 Semitool, Inc. Adaptable electrochemical processing chamber
US6231743B1 (en) 2000-01-03 2001-05-15 Motorola, Inc. Method for forming a semiconductor device
SE0001367L (sv) * 2000-04-13 2001-10-14 Obducat Ab Apparat och förfarande för elektrokemisk bearbetning av substrat
SE0001368L (sv) * 2000-04-13 2001-10-14 Obducat Ab Apparat och förfarande för elektrokemisk bearbetning av substrat
US6610189B2 (en) * 2001-01-03 2003-08-26 Applied Materials, Inc. Method and associated apparatus to mechanically enhance the deposition of a metal film within a feature
JP2005501180A (ja) * 2001-08-31 2005-01-13 セミトゥール・インコーポレイテッド 超小型電子ワークピースの電気化学処理のための装置及び方法
US7118658B2 (en) * 2002-05-21 2006-10-10 Semitool, Inc. Electroplating reactor
US20040055873A1 (en) * 2002-09-24 2004-03-25 Digital Matrix Corporation Apparatus and method for improved electroforming
US20070125652A1 (en) * 2005-12-02 2007-06-07 Buckley Paul W Electroform, methods of making electroforms, and products made from electroforms
US9455139B2 (en) 2009-06-17 2016-09-27 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US8962085B2 (en) 2009-06-17 2015-02-24 Novellus Systems, Inc. Wetting pretreatment for enhanced damascene metal filling
US9677188B2 (en) 2009-06-17 2017-06-13 Novellus Systems, Inc. Electrofill vacuum plating cell
EP2593587B1 (de) * 2010-07-15 2016-09-07 Luxembourg Institute of Science and Technology (LIST) Befüllung einer druckkammer und spannfutter dafür
KR102113883B1 (ko) * 2012-03-13 2020-05-22 노벨러스 시스템즈, 인코포레이티드 관통 레지스트 금속 도금을 위한 웨팅 전처리의 방법들 및 장치
US9613833B2 (en) 2013-02-20 2017-04-04 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US9435049B2 (en) 2013-11-20 2016-09-06 Lam Research Corporation Alkaline pretreatment for electroplating
US9617648B2 (en) 2015-03-04 2017-04-11 Lam Research Corporation Pretreatment of nickel and cobalt liners for electrodeposition of copper into through silicon vias

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1771680A (en) * 1927-03-29 1930-07-29 Ishisaka Sansaku Apparatus for electroplating
DE2011305A1 (de) * 1970-03-10 1971-10-14 Deutsche Grammophon Gmbh Verfahren zur Vorbehandlung von mit Nickeloberflächen versehenen Galvanos, insbesondere Schallplattengalvanos
JPS5524141Y2 (de) * 1976-10-16 1980-06-09
EP0020008B2 (de) * 1979-06-01 1987-04-15 EMI Limited Verfahren zur galvanischen Abscheidung mit grosser Geschwindigkeit und nach diesem Verfahren hergestellte Schallplattenpressform
JPS57126998A (en) * 1981-01-28 1982-08-06 Mishima Kosan Co Ltd Plating apparatus
EP0076569B1 (de) * 1981-10-01 1986-08-27 EMI Limited Elektroplattierungsvorrichtung
US4534831A (en) * 1982-09-27 1985-08-13 Inoue-Japax Research Incorporated Method of and apparatus for forming a 3D article
NL8300916A (nl) * 1983-03-14 1984-10-01 Philips Nv Werkwijze voor het galvanisch neerslaan van een homogeen dikke metaallaag, aldus verkregen metaallaag en toepassing van de aldus verkregen metaallaag, inrichting voor het uitvoeren van de werkwijze en verkregen matrijs.
US4750981A (en) * 1986-09-30 1988-06-14 The Boeing Company Apparatus for electroplating limited surfaces on a workpiece
DE3736240A1 (de) * 1987-10-27 1989-05-11 Flachglas Ag Vorrichtung zur galvanischen verstaerkung einer leiterspur auf einer glasscheibe
US4964958A (en) * 1988-10-14 1990-10-23 Philips & Du Pont Optical Company Method of producing a metal matrix
SE467976B (sv) * 1991-02-20 1992-10-12 Dcm Innovation Ab Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen

Also Published As

Publication number Publication date
US5427674A (en) 1995-06-27
SE9100507L (sv) 1992-08-21
EP0500513A1 (de) 1992-08-26
EP0500513B1 (de) 1996-05-15
DE69210650D1 (de) 1996-06-20
SE9100507D0 (sv) 1991-02-20
DE69210650T2 (de) 1996-09-19
US5244563A (en) 1993-09-14

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