SE453335B - Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen - Google Patents

Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen

Info

Publication number
SE453335B
SE453335B SE8602224A SE8602224A SE453335B SE 453335 B SE453335 B SE 453335B SE 8602224 A SE8602224 A SE 8602224A SE 8602224 A SE8602224 A SE 8602224A SE 453335 B SE453335 B SE 453335B
Authority
SE
Sweden
Prior art keywords
composition
chemical groups
negative photoresist
self
acid catalysis
Prior art date
Application number
SE8602224A
Other languages
English (en)
Swedish (sv)
Other versions
SE8602224L (sv
SE8602224D0 (sv
Inventor
S Gothe
A Hult
Original Assignee
Becker Wilhelm Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Becker Wilhelm Ab filed Critical Becker Wilhelm Ab
Priority to SE8602224A priority Critical patent/SE453335B/xx
Publication of SE8602224D0 publication Critical patent/SE8602224D0/xx
Priority to AT87850150T priority patent/ATE52349T1/de
Priority to EP87850150A priority patent/EP0250377B1/en
Priority to DE8787850150T priority patent/DE3762466D1/de
Priority to NO872008A priority patent/NO872008L/no
Priority to FI872137A priority patent/FI872137A/fi
Priority to DK248487A priority patent/DK248487A/da
Priority to JP62118737A priority patent/JPS62295047A/ja
Publication of SE8602224L publication Critical patent/SE8602224L/
Publication of SE453335B publication Critical patent/SE453335B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Cosmetics (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
SE8602224A 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen SE453335B (sv)

Priority Applications (8)

Application Number Priority Date Filing Date Title
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen
AT87850150T ATE52349T1 (de) 1986-05-15 1987-05-07 Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung.
EP87850150A EP0250377B1 (en) 1986-05-15 1987-05-07 Composition for negative photoresists and use of the composition
DE8787850150T DE3762466D1 (de) 1986-05-15 1987-05-07 Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung.
NO872008A NO872008L (no) 1986-05-15 1987-05-14 Negativt fotoresist-materiale.
FI872137A FI872137A (fi) 1986-05-15 1987-05-14 Hoegkaenslig negativ fotoresist.
DK248487A DK248487A (da) 1986-05-15 1987-05-14 Hoejfoelsom negativ fotoresist
JP62118737A JPS62295047A (ja) 1986-05-15 1987-05-15 ネガ型ホトレジスト用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen

Publications (3)

Publication Number Publication Date
SE8602224D0 SE8602224D0 (sv) 1986-05-15
SE8602224L SE8602224L (sv) 1987-11-16
SE453335B true SE453335B (sv) 1988-01-25

Family

ID=20364543

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen

Country Status (8)

Country Link
EP (1) EP0250377B1 (xx)
JP (1) JPS62295047A (xx)
AT (1) ATE52349T1 (xx)
DE (1) DE3762466D1 (xx)
DK (1) DK248487A (xx)
FI (1) FI872137A (xx)
NO (1) NO872008L (xx)
SE (1) SE453335B (xx)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597748A1 (de) * 1967-10-27 1970-08-27 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
JPS492286B1 (xx) * 1970-02-19 1974-01-19
DE2064079C2 (de) * 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
JPS50134420A (xx) * 1974-04-10 1975-10-24
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same

Also Published As

Publication number Publication date
DE3762466D1 (de) 1990-05-31
SE8602224L (sv) 1987-11-16
NO872008D0 (no) 1987-05-14
SE8602224D0 (sv) 1986-05-15
ATE52349T1 (de) 1990-05-15
EP0250377B1 (en) 1990-04-25
FI872137A (fi) 1987-11-16
NO872008L (no) 1987-11-16
DK248487D0 (da) 1987-05-14
FI872137A0 (fi) 1987-05-14
JPS62295047A (ja) 1987-12-22
DK248487A (da) 1987-11-16
EP0250377A1 (en) 1987-12-23

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