SE8602224L - Hogkenslig negativ fotoresist - Google Patents

Hogkenslig negativ fotoresist

Info

Publication number
SE8602224L
SE8602224L SE8602224A SE8602224A SE8602224L SE 8602224 L SE8602224 L SE 8602224L SE 8602224 A SE8602224 A SE 8602224A SE 8602224 A SE8602224 A SE 8602224A SE 8602224 L SE8602224 L SE 8602224L
Authority
SE
Sweden
Prior art keywords
negative photoresist
mixture
chemical groups
cationic photoinitiators
highly negative
Prior art date
Application number
SE8602224A
Other languages
Unknown language ( )
English (en)
Other versions
SE8602224D0 (sv
SE453335B (sv
Inventor
S Gothe
A Hult
Original Assignee
Becker Wilhelm Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Becker Wilhelm Ab filed Critical Becker Wilhelm Ab
Priority to SE8602224A priority Critical patent/SE453335B/sv
Publication of SE8602224D0 publication Critical patent/SE8602224D0/sv
Priority to AT87850150T priority patent/ATE52349T1/de
Priority to DE8787850150T priority patent/DE3762466D1/de
Priority to EP87850150A priority patent/EP0250377B1/en
Priority to DK248487A priority patent/DK248487A/da
Priority to FI872137A priority patent/FI872137A/fi
Priority to NO872008A priority patent/NO872008L/no
Priority to JP62118737A priority patent/JPS62295047A/ja
Publication of SE8602224L publication Critical patent/SE8602224L/sv
Publication of SE453335B publication Critical patent/SE453335B/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Cosmetics (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
SE8602224A 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen SE453335B (sv)

Priority Applications (8)

Application Number Priority Date Filing Date Title
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen
AT87850150T ATE52349T1 (de) 1986-05-15 1987-05-07 Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung.
DE8787850150T DE3762466D1 (de) 1986-05-15 1987-05-07 Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung.
EP87850150A EP0250377B1 (en) 1986-05-15 1987-05-07 Composition for negative photoresists and use of the composition
DK248487A DK248487A (da) 1986-05-15 1987-05-14 Hoejfoelsom negativ fotoresist
FI872137A FI872137A (fi) 1986-05-15 1987-05-14 Hoegkaenslig negativ fotoresist.
NO872008A NO872008L (no) 1986-05-15 1987-05-14 Negativt fotoresist-materiale.
JP62118737A JPS62295047A (ja) 1986-05-15 1987-05-15 ネガ型ホトレジスト用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen

Publications (3)

Publication Number Publication Date
SE8602224D0 SE8602224D0 (sv) 1986-05-15
SE8602224L true SE8602224L (sv) 1987-11-16
SE453335B SE453335B (sv) 1988-01-25

Family

ID=20364543

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen

Country Status (8)

Country Link
EP (1) EP0250377B1 (sv)
JP (1) JPS62295047A (sv)
AT (1) ATE52349T1 (sv)
DE (1) DE3762466D1 (sv)
DK (1) DK248487A (sv)
FI (1) FI872137A (sv)
NO (1) NO872008L (sv)
SE (1) SE453335B (sv)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597748A1 (de) * 1967-10-27 1970-08-27 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
JPS492286B1 (sv) * 1970-02-19 1974-01-19
DE2064079C2 (de) * 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
JPS50134420A (sv) * 1974-04-10 1975-10-24
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same

Also Published As

Publication number Publication date
NO872008D0 (no) 1987-05-14
FI872137A (fi) 1987-11-16
ATE52349T1 (de) 1990-05-15
EP0250377A1 (en) 1987-12-23
NO872008L (no) 1987-11-16
DE3762466D1 (de) 1990-05-31
FI872137A0 (fi) 1987-05-14
SE8602224D0 (sv) 1986-05-15
EP0250377B1 (en) 1990-04-25
DK248487D0 (da) 1987-05-14
SE453335B (sv) 1988-01-25
DK248487A (da) 1987-11-16
JPS62295047A (ja) 1987-12-22

Similar Documents

Publication Publication Date Title
DE3769422D1 (de) Photopolymerisierbare aufzeichnungsmasse, insbesondere zur herstellung von druckplatten und reliefformen.
NO20011700D0 (no) Polymerisering i nærvær av et <beta>-substituert nitroksydradikal
TR22297A (tr) 1-oksa-3-aza-tetralin gruplarini ihtiva eden bilesiklerden ve sikloalifatik epoksit recinelesinden muetesekkil,kimyasal olarak sertlesebilen recineler,bunlarin ueretilmesine ve sertlestirilmesine mahsus usul ile bu gibi recinelerin kullanilmasi
BR9000416A (pt) Catalisadores para polimerizacao de olefinas
ES2016240B3 (es) Mixtura por fotopolimerizacion
EP1004936A4 (en) RESIST RESIN, RESIST RESIN COMPOSITION AND THIS METHOD FOR PRODUCING PATTERNS
ES2061437T3 (es) Mezcla endurecible a base de compuestos olefinicamente insaturados y compuestos con hidrogenos activos.
DE59711677D1 (de) Verfahren zur Herstellung Von Fenofibrat-Präparaten
KR890007722A (ko) 엑시폰과 수요성중합체를 함유하는 약학조성물
ATE171967T1 (de) Epoxyprepreg
FR2743510B1 (fr) Nouveau catalyseur d'alkylation, son procede de preparation et son utilisation dans des procedes d'alkylation
JPS5287453A (en) Crosslinked epihalohydrine polymer composition
DE58902747D1 (de) Wasserloeslicher haftkleber auf polyvinylcarbonsaeurebasis seine herstellung und seine verwendung.
PT77717B (de) Vinylencarbonat-polymerisate verfahren zu ihrer herstellung und ihre herstellung und ihre anwendung
SE8602224L (sv) Hogkenslig negativ fotoresist
BR9005748A (pt) Processo para preparacao de polimeros lineares de monoxido de carbono com um ou mais compostos olefinicamente insaturados
BR8008198A (pt) Processo para preparacao de polimeros e copolimeros de monomeros etilenicamente insaturados,e,composicao catalisadora para o mesmo
DE68915025D1 (de) Herstellung von 3,3-Diarylacrylsäureamiden.
JPS5614232A (en) Negative type resist resin
ATE16194T1 (de) Verfahren zur herstellung von blockcopolymeren auf der basis von ethylenpolymerisaten und anderen polymeren.
DE59204022D1 (de) Verfahren zur Herstellung von 2,2-Bis-(3,4-dimethyl-phenyl)-propan.
DE58907943D1 (de) Bindemittelkombinationen und ein Verfahren zur Herstellung von Flächengebilden.
DE69307591T2 (de) Verfahren zur Herstellung von vernetzten Olefinpolymeren
JPS57140166A (en) Manufacture of gravure plate
ATE18564T1 (de) Katalysatoren zur polymerisation und copolymerisation von aethylen und polymerisationsverfahren, die diese verwenden.

Legal Events

Date Code Title Description
NUG Patent has lapsed

Ref document number: 8602224-1

Effective date: 19911209

Format of ref document f/p: F