ATE52349T1 - Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung. - Google Patents

Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung.

Info

Publication number
ATE52349T1
ATE52349T1 AT87850150T AT87850150T ATE52349T1 AT E52349 T1 ATE52349 T1 AT E52349T1 AT 87850150 T AT87850150 T AT 87850150T AT 87850150 T AT87850150 T AT 87850150T AT E52349 T1 ATE52349 T1 AT E52349T1
Authority
AT
Austria
Prior art keywords
composition
negative
mixture
photoresiste
chemical groups
Prior art date
Application number
AT87850150T
Other languages
English (en)
Inventor
Sven Goethe
Anders Hult
Original Assignee
Becker Wilhelm Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Becker Wilhelm Ab filed Critical Becker Wilhelm Ab
Application granted granted Critical
Publication of ATE52349T1 publication Critical patent/ATE52349T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Cosmetics (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Adhesives Or Adhesive Processes (AREA)
AT87850150T 1986-05-15 1987-05-07 Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung. ATE52349T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE8602224A SE453335B (sv) 1986-05-15 1986-05-15 Komposition for negativ fotoresist innehallande kemiska grupper som kan sjelv- eller samkondensera under sur katalys samt anvendning av kompositionen
EP87850150A EP0250377B1 (de) 1986-05-15 1987-05-07 Zusammensetzung für negative Photoresiste und Verwendung dieser Zusammensetzung

Publications (1)

Publication Number Publication Date
ATE52349T1 true ATE52349T1 (de) 1990-05-15

Family

ID=20364543

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87850150T ATE52349T1 (de) 1986-05-15 1987-05-07 Zusammensetzung fuer negative photoresiste und verwendung dieser zusammensetzung.

Country Status (8)

Country Link
EP (1) EP0250377B1 (de)
JP (1) JPS62295047A (de)
AT (1) ATE52349T1 (de)
DE (1) DE3762466D1 (de)
DK (1) DK248487A (de)
FI (1) FI872137A (de)
NO (1) NO872008L (de)
SE (1) SE453335B (de)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597748A1 (de) * 1967-10-27 1970-08-27 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
JPS492286B1 (de) * 1970-02-19 1974-01-19
DE2064079C2 (de) * 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
JPS50134420A (de) * 1974-04-10 1975-10-24
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same

Also Published As

Publication number Publication date
FI872137A (fi) 1987-11-16
SE453335B (sv) 1988-01-25
DE3762466D1 (de) 1990-05-31
DK248487D0 (da) 1987-05-14
EP0250377A1 (de) 1987-12-23
SE8602224L (sv) 1987-11-16
SE8602224D0 (sv) 1986-05-15
DK248487A (da) 1987-11-16
NO872008L (no) 1987-11-16
JPS62295047A (ja) 1987-12-22
NO872008D0 (no) 1987-05-14
EP0250377B1 (de) 1990-04-25
FI872137A0 (fi) 1987-05-14

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee