SE431197B - Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm - Google Patents

Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm

Info

Publication number
SE431197B
SE431197B SE8008769A SE8008769A SE431197B SE 431197 B SE431197 B SE 431197B SE 8008769 A SE8008769 A SE 8008769A SE 8008769 A SE8008769 A SE 8008769A SE 431197 B SE431197 B SE 431197B
Authority
SE
Sweden
Prior art keywords
silica
cooling
reaction products
cooler
flame
Prior art date
Application number
SE8008769A
Other languages
English (en)
Swedish (sv)
Other versions
SE8008769L (sv
Inventor
Gosta Lennart Flemmert
Original Assignee
Flemmert Goesta Lennart
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Flemmert Goesta Lennart filed Critical Flemmert Goesta Lennart
Priority to SE8008769A priority Critical patent/SE431197B/sv
Priority to CA000391731A priority patent/CA1175638A/en
Priority to DE8181850242T priority patent/DE3169469D1/de
Priority to EP81850242A priority patent/EP0054531B1/de
Priority to JP56200785A priority patent/JPS57145022A/ja
Publication of SE8008769L publication Critical patent/SE8008769L/
Publication of SE431197B publication Critical patent/SE431197B/sv
Priority to US06/594,150 priority patent/US4572827A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C01B33/184—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/005—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out at high temperatures, e.g. by pyrolysis
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C01B7/193—Preparation from silicon tetrafluoride, fluosilicic acid or fluosilicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
SE8008769A 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm SE431197B (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE8008769A SE431197B (sv) 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm
CA000391731A CA1175638A (en) 1980-12-12 1981-12-08 Process and apparatus for preparing finely-divided silicon dioxide in good yield
DE8181850242T DE3169469D1 (en) 1980-12-12 1981-12-11 Process and apparatus for preparing finely-divided silicon dioxide in good yield
EP81850242A EP0054531B1 (de) 1980-12-12 1981-12-11 Verfahren und Vorrichtung zur Herstellung von feinteiligem Siliciumdioxid mit gutem Ausbringen
JP56200785A JPS57145022A (en) 1980-12-12 1981-12-12 Manufacture of fine powder silicon dioxide at high yield rate and apparatus therefor
US06/594,150 US4572827A (en) 1980-12-12 1984-10-18 Process for preparing finely-divided silicon dioxide in good yield

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8008769A SE431197B (sv) 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm

Publications (2)

Publication Number Publication Date
SE8008769L SE8008769L (sv) 1982-06-13
SE431197B true SE431197B (sv) 1984-01-23

Family

ID=20342463

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8008769A SE431197B (sv) 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm

Country Status (6)

Country Link
US (1) US4572827A (de)
EP (1) EP0054531B1 (de)
JP (1) JPS57145022A (de)
CA (1) CA1175638A (de)
DE (1) DE3169469D1 (de)
SE (1) SE431197B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5219761A (en) * 1986-05-20 1993-06-15 Agri-Diagnostics Associates Method and a kit for diagnosing plant diseases
DE4228711A1 (de) * 1992-08-28 1994-03-03 Degussa Silicium-Aluminium-Mischoxid
US6193944B1 (en) 1995-12-08 2001-02-27 Goldendale Aluminum Company Method of recovering fumed silica from spent potliner
US6217840B1 (en) 1995-12-08 2001-04-17 Goldendale Aluminum Company Production of fumed silica
US6248302B1 (en) 2000-02-04 2001-06-19 Goldendale Aluminum Company Process for treating red mud to recover metal values therefrom
DE102006052586B4 (de) * 2006-11-08 2008-07-03 Schott Solar Gmbh Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage
CN112390523A (zh) * 2019-08-13 2021-02-23 斯特里特技术有限公司 用于制造气化二氧化硅颗粒的系统
CN115095885B (zh) * 2022-06-06 2024-02-09 中国船舶集团有限公司系统工程研究院 一种组合型多点ldi斜进燃烧室

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2535036A (en) * 1946-09-03 1950-12-26 Cabot Godfrey L Inc Manufacture of finely divided silica
US2819151A (en) * 1954-03-02 1958-01-07 Flemmert Gosta Lennart Process for burning silicon fluorides to form silica
US2789886A (en) * 1954-03-03 1957-04-23 Du Pont Heat exchange process
BE609721A (fr) * 1960-11-03 1962-02-15 Goesta Lennart Flemmert Méthode de récupération du bioxyde de silicium finement divisé obtenu en faisant réagir en phase gazeuse des composés de silicium et de fluor avec de l'eau
US3233969A (en) * 1961-05-29 1966-02-08 Columbian Carbon Process for producing pigmentary silica
US3645684A (en) * 1970-07-01 1972-02-29 Cities Service Co Fractionation of silica aerosols
US4036938A (en) * 1975-08-28 1977-07-19 Reed Richard S Production of high purity hydrogen fluoride from silicon tetrafluoride

Also Published As

Publication number Publication date
EP0054531B1 (de) 1985-03-20
CA1175638A (en) 1984-10-09
DE3169469D1 (en) 1985-04-25
JPS621321B2 (de) 1987-01-13
JPS57145022A (en) 1982-09-07
EP0054531A1 (de) 1982-06-23
US4572827A (en) 1986-02-25
SE8008769L (sv) 1982-06-13

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