SE419907B - PROCEDURE FOR UPLINING A SAMPLE INCLUDING EXPOSURE OF A NEGATIVE RESIST MATERIAL - Google Patents

PROCEDURE FOR UPLINING A SAMPLE INCLUDING EXPOSURE OF A NEGATIVE RESIST MATERIAL

Info

Publication number
SE419907B
SE419907B SE7412962A SE7412962A SE419907B SE 419907 B SE419907 B SE 419907B SE 7412962 A SE7412962 A SE 7412962A SE 7412962 A SE7412962 A SE 7412962A SE 419907 B SE419907 B SE 419907B
Authority
SE
Sweden
Prior art keywords
uplining
procedure
resist material
negative resist
sample including
Prior art date
Application number
SE7412962A
Other languages
Swedish (sv)
Other versions
SE7412962L (en
Inventor
E D Feit
L F Thompson
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE7412962L publication Critical patent/SE7412962L/xx
Publication of SE419907B publication Critical patent/SE419907B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SE7412962A 1973-10-23 1974-10-15 PROCEDURE FOR UPLINING A SAMPLE INCLUDING EXPOSURE OF A NEGATIVE RESIST MATERIAL SE419907B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40892773A 1973-10-23 1973-10-23

Publications (2)

Publication Number Publication Date
SE7412962L SE7412962L (en) 1975-04-24
SE419907B true SE419907B (en) 1981-08-31

Family

ID=23618345

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7412962A SE419907B (en) 1973-10-23 1974-10-15 PROCEDURE FOR UPLINING A SAMPLE INCLUDING EXPOSURE OF A NEGATIVE RESIST MATERIAL

Country Status (9)

Country Link
JP (1) JPS5929852B2 (en)
BE (1) BE821326A (en)
CA (1) CA1032392A (en)
DE (1) DE2450381C3 (en)
FR (1) FR2248289B1 (en)
GB (1) GB1484873A (en)
IT (1) IT1024658B (en)
NL (1) NL163633C (en)
SE (1) SE419907B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (en) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
GB2285141B (en) * 1993-12-23 1998-03-11 Motorola Ltd Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist

Also Published As

Publication number Publication date
FR2248289B1 (en) 1979-03-16
BE821326A (en) 1975-02-17
DE2450381B2 (en) 1979-07-19
CA1032392A (en) 1978-06-06
SE7412962L (en) 1975-04-24
IT1024658B (en) 1978-07-20
NL163633C (en) 1980-09-15
JPS5074427A (en) 1975-06-19
DE2450381A1 (en) 1975-04-24
GB1484873A (en) 1977-09-08
FR2248289A1 (en) 1975-05-16
DE2450381C3 (en) 1984-09-20
NL7413817A (en) 1975-04-25
NL163633B (en) 1980-04-15
JPS5929852B2 (en) 1984-07-24

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