NL163633C - METHOD FOR MAKING A PATTERN IN A NEGATIVE RESISTING MATERIAL ON A SUBSTRATE. - Google Patents

METHOD FOR MAKING A PATTERN IN A NEGATIVE RESISTING MATERIAL ON A SUBSTRATE.

Info

Publication number
NL163633C
NL163633C NL7413817.A NL7413817A NL163633C NL 163633 C NL163633 C NL 163633C NL 7413817 A NL7413817 A NL 7413817A NL 163633 C NL163633 C NL 163633C
Authority
NL
Netherlands
Prior art keywords
negative
pattern
substrate
making
resisting material
Prior art date
Application number
NL7413817.A
Other languages
Dutch (nl)
Other versions
NL163633B (en
NL7413817A (en
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of NL7413817A publication Critical patent/NL7413817A/en
Publication of NL163633B publication Critical patent/NL163633B/en
Application granted granted Critical
Publication of NL163633C publication Critical patent/NL163633C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Epoxy Resins (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7413817.A 1973-10-23 1974-10-22 METHOD FOR MAKING A PATTERN IN A NEGATIVE RESISTING MATERIAL ON A SUBSTRATE. NL163633C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40892773A 1973-10-23 1973-10-23

Publications (3)

Publication Number Publication Date
NL7413817A NL7413817A (en) 1975-04-25
NL163633B NL163633B (en) 1980-04-15
NL163633C true NL163633C (en) 1980-09-15

Family

ID=23618345

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7413817.A NL163633C (en) 1973-10-23 1974-10-22 METHOD FOR MAKING A PATTERN IN A NEGATIVE RESISTING MATERIAL ON A SUBSTRATE.

Country Status (9)

Country Link
JP (1) JPS5929852B2 (en)
BE (1) BE821326A (en)
CA (1) CA1032392A (en)
DE (1) DE2450381C3 (en)
FR (1) FR2248289B1 (en)
GB (1) GB1484873A (en)
IT (1) IT1024658B (en)
NL (1) NL163633C (en)
SE (1) SE419907B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (en) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
GB2285141B (en) * 1993-12-23 1998-03-11 Motorola Ltd Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist

Also Published As

Publication number Publication date
NL163633B (en) 1980-04-15
BE821326A (en) 1975-02-17
SE7412962L (en) 1975-04-24
DE2450381A1 (en) 1975-04-24
IT1024658B (en) 1978-07-20
GB1484873A (en) 1977-09-08
DE2450381B2 (en) 1979-07-19
FR2248289B1 (en) 1979-03-16
SE419907B (en) 1981-08-31
CA1032392A (en) 1978-06-06
DE2450381C3 (en) 1984-09-20
JPS5074427A (en) 1975-06-19
JPS5929852B2 (en) 1984-07-24
FR2248289A1 (en) 1975-05-16
NL7413817A (en) 1975-04-25

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Legal Events

Date Code Title Description
V4 Discontinued because of reaching the maximum lifetime of a patent