SE406817B - Tryckform for vattenfri litografi, forfarande for framstellning av denna och presensibilirerad tryckplat for bildande av tryckformen - Google Patents

Tryckform for vattenfri litografi, forfarande for framstellning av denna och presensibilirerad tryckplat for bildande av tryckformen

Info

Publication number
SE406817B
SE406817B SE7505217A SE7505217A SE406817B SE 406817 B SE406817 B SE 406817B SE 7505217 A SE7505217 A SE 7505217A SE 7505217 A SE7505217 A SE 7505217A SE 406817 B SE406817 B SE 406817B
Authority
SE
Sweden
Prior art keywords
print
presentibilized
lithography
procedure
manufacture
Prior art date
Application number
SE7505217A
Other languages
English (en)
Swedish (sv)
Other versions
SE7505217L (sv
Inventor
J F Sanders
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of SE7505217L publication Critical patent/SE7505217L/
Publication of SE406817B publication Critical patent/SE406817B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
SE7505217A 1974-06-17 1975-05-06 Tryckform for vattenfri litografi, forfarande for framstellning av denna och presensibilirerad tryckplat for bildande av tryckformen SE406817B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/479,653 US3997349A (en) 1974-06-17 1974-06-17 Light-sensitive development-free driographic printing plate

Publications (2)

Publication Number Publication Date
SE7505217L SE7505217L (sv) 1975-12-18
SE406817B true SE406817B (sv) 1979-02-26

Family

ID=23904869

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7505217A SE406817B (sv) 1974-06-17 1975-05-06 Tryckform for vattenfri litografi, forfarande for framstellning av denna och presensibilirerad tryckplat for bildande av tryckformen

Country Status (5)

Country Link
US (1) US3997349A (fr)
BE (1) BE830117A (fr)
FR (1) FR2274950A1 (fr)
SE (1) SE406817B (fr)
SU (1) SU670247A3 (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4074009A (en) * 1975-12-08 1978-02-14 Minnesota Mining And Manufacturing Company Driographic master
US4599273A (en) * 1980-08-11 1986-07-08 Minnesota Mining And Manufacturing Co. Photolabile blocked surfactants and compositions containing the same
US4478967A (en) * 1980-08-11 1984-10-23 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
US4467022A (en) * 1980-08-11 1984-08-21 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant
US4369244A (en) * 1980-08-11 1983-01-18 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant
JPS589146A (ja) * 1981-07-09 1983-01-19 Nippon Paint Co Ltd 水不要平版用版材
US4511641A (en) * 1983-02-02 1985-04-16 Minnesota Mining And Manufacturing Company Metal film imaging structure
JPS6061288A (ja) * 1983-09-13 1985-04-09 Fuji Photo Film Co Ltd 感熱記録材料
JPS60121442A (ja) * 1983-12-06 1985-06-28 Canon Inc 感光性記録メモリ−媒体および記録再生方法
US4740600A (en) * 1984-05-10 1988-04-26 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
GB9700883D0 (en) 1997-01-17 1997-03-05 Horsell Graphic Ind Ltd Lithographic plate precursor
GB9700882D0 (en) 1997-01-17 1997-03-05 Horsell Graphic Ind Ltd Lithographic plate precursor
GB9713411D0 (en) * 1997-06-26 1997-08-27 Horsell Graphic Ind Ltd Waterless lithographic printing
US6014929A (en) * 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
GB9806478D0 (en) 1998-03-27 1998-05-27 Horsell Graphic Ind Ltd Pattern formation
US6071675A (en) * 1999-06-05 2000-06-06 Teng; Gary Ganghui On-press development of a lithographic plate comprising dispersed solid particles
US6245481B1 (en) 1999-10-12 2001-06-12 Gary Ganghui Teng On-press process of lithographic plates having a laser sensitive mask layer
US6245486B1 (en) 2000-06-30 2001-06-12 Gary Ganghui Teng Method for imaging a printing plate having a laser ablatable mask layer

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL267931A (fr) * 1960-08-05 1900-01-01
NL270834A (fr) * 1960-10-31
NL278337A (fr) * 1961-05-12
US3113023A (en) * 1961-07-25 1963-12-03 Polychrome Corp Photosensitive lithographic plate comprising photosensitive diazo resins and method for preparing same
NL136528C (fr) * 1962-04-03
NL128965C (fr) * 1963-09-06
GB1146618A (en) * 1965-10-11 1969-03-26 Harry Frank Gipe Method for preparing photo-lithographic plates
US3511178A (en) * 1967-01-06 1970-05-12 Minnesota Mining & Mfg Printing plate and method
US3703496A (en) * 1967-10-20 1972-11-21 Hooker Chemical Corp Hydrolytic stabilizer of phosphite esters and use as epoxy resin stabilizer
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3704311A (en) * 1969-03-14 1972-11-28 Minnesota Mining & Mfg Functional bis(perfluoroalkylsulfonyl)alkyl compounds
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
BE754692A (fr) * 1969-08-12 1971-02-11 Scott Paper Co Plaque d'impression planographique a sec et sa methode de preparation
US3632375A (en) * 1969-11-14 1972-01-04 Scott Paper Co Plate for dry planography and method of making same
NL7109179A (fr) * 1970-07-13 1972-01-17
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US3790556A (en) * 1971-04-28 1974-02-05 Scott Paper Co Organic solvent soluble diazonium compound formed from anionic sulfate or sulfonate surfactants
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors
US3779768A (en) * 1971-08-26 1973-12-18 Xidex Corp Fluorocarbon surfactants for vesicular films
US3910187A (en) * 1971-08-30 1975-10-07 Du Pont Dry planographic printing plate
US3847614A (en) * 1971-09-13 1974-11-12 Scott Paper Co Diazo photopolymer composition and article comprising carboxylated resin

Also Published As

Publication number Publication date
BE830117A (fr) 1975-12-11
FR2274950B1 (fr) 1979-10-05
SE7505217L (sv) 1975-12-18
FR2274950A1 (fr) 1976-01-09
US3997349A (en) 1976-12-14
SU670247A3 (ru) 1979-06-25

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