SE384537B - Sett att framstella ror och behallare av metall eller metallegering som er korrosionsherdiga och gasteta vid temperaturer upp till ca +1000cc - Google Patents

Sett att framstella ror och behallare av metall eller metallegering som er korrosionsherdiga och gasteta vid temperaturer upp till ca +1000cc

Info

Publication number
SE384537B
SE384537B SE7309131A SE7309131A SE384537B SE 384537 B SE384537 B SE 384537B SE 7309131 A SE7309131 A SE 7309131A SE 7309131 A SE7309131 A SE 7309131A SE 384537 B SE384537 B SE 384537B
Authority
SE
Sweden
Prior art keywords
metal
gastable
corrosionable
containers
temperatures
Prior art date
Application number
SE7309131A
Other languages
English (en)
Swedish (sv)
Inventor
G A A Asselman
W J M Hamers
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of SE384537B publication Critical patent/SE384537B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
SE7309131A 1972-07-01 1973-06-28 Sett att framstella ror och behallare av metall eller metallegering som er korrosionsherdiga och gasteta vid temperaturer upp till ca +1000cc SE384537B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7209294A NL7209294A (tr) 1972-07-01 1972-07-01

Publications (1)

Publication Number Publication Date
SE384537B true SE384537B (sv) 1976-05-10

Family

ID=19816451

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7309131A SE384537B (sv) 1972-07-01 1973-06-28 Sett att framstella ror och behallare av metall eller metallegering som er korrosionsherdiga och gasteta vid temperaturer upp till ca +1000cc

Country Status (10)

Country Link
JP (1) JPS4943880A (tr)
AU (1) AU5740573A (tr)
BE (1) BE801747A (tr)
BR (1) BR7304772D0 (tr)
DE (1) DE2330720C3 (tr)
FR (1) FR2190946B1 (tr)
GB (1) GB1420526A (tr)
IT (1) IT990832B (tr)
NL (1) NL7209294A (tr)
SE (1) SE384537B (tr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3070578D1 (en) * 1979-08-16 1985-06-05 Ibm Process for applying sio2 films by chemical vapour deposition
DE3441056A1 (de) * 1984-11-09 1986-05-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200015A (en) * 1962-09-10 1965-08-10 United Aircraft Corp Process for coating high temperature alloys
FR1524841A (fr) * 1966-06-01 1968-05-10 Siemens Ag Procédé pour la préparation de nitrure de silicium attaquable chimiquement sous forme de couches minces
US3637423A (en) * 1969-02-10 1972-01-25 Westinghouse Electric Corp Pyrolytic deposition of silicon nitride films
DE1957952A1 (de) * 1969-11-18 1971-05-27 Siemens Ag Siliciumnitridbeschichtung an Quarzwaenden fuer Diffusions- und Oxydationsreaktoren

Also Published As

Publication number Publication date
NL7209294A (tr) 1974-01-03
BE801747A (fr) 1974-01-02
BR7304772D0 (pt) 1974-08-15
AU5740573A (en) 1975-01-09
DE2330720C3 (de) 1979-01-18
DE2330720A1 (de) 1974-01-10
GB1420526A (en) 1976-01-07
IT990832B (it) 1975-07-10
FR2190946A1 (tr) 1974-02-01
JPS4943880A (tr) 1974-04-25
FR2190946B1 (tr) 1977-05-13
DE2330720B2 (de) 1978-05-24

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