BE801747A - Procede permettant de realiser des u s et reservoirs etanches au gaz - Google Patents

Procede permettant de realiser des u s et reservoirs etanches au gaz

Info

Publication number
BE801747A
BE801747A BE132987A BE132987A BE801747A BE 801747 A BE801747 A BE 801747A BE 132987 A BE132987 A BE 132987A BE 132987 A BE132987 A BE 132987A BE 801747 A BE801747 A BE 801747A
Authority
BE
Belgium
Prior art keywords
tanks
tight
making gas
gas
making
Prior art date
Application number
BE132987A
Other languages
English (en)
French (fr)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of BE801747A publication Critical patent/BE801747A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • C23C16/345Silicon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
BE132987A 1972-07-01 1973-06-29 Procede permettant de realiser des u s et reservoirs etanches au gaz BE801747A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7209294A NL7209294A (tr) 1972-07-01 1972-07-01

Publications (1)

Publication Number Publication Date
BE801747A true BE801747A (fr) 1974-01-02

Family

ID=19816451

Family Applications (1)

Application Number Title Priority Date Filing Date
BE132987A BE801747A (fr) 1972-07-01 1973-06-29 Procede permettant de realiser des u s et reservoirs etanches au gaz

Country Status (10)

Country Link
JP (1) JPS4943880A (tr)
AU (1) AU5740573A (tr)
BE (1) BE801747A (tr)
BR (1) BR7304772D0 (tr)
DE (1) DE2330720C3 (tr)
FR (1) FR2190946B1 (tr)
GB (1) GB1420526A (tr)
IT (1) IT990832B (tr)
NL (1) NL7209294A (tr)
SE (1) SE384537B (tr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0024305B1 (de) * 1979-08-16 1985-05-02 International Business Machines Corporation Verfahren zum Aufbringen von SiO2-Filmen mittels chemischen Niederschlagens aus der Dampfphase
DE3441056A1 (de) * 1984-11-09 1986-05-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200015A (en) * 1962-09-10 1965-08-10 United Aircraft Corp Process for coating high temperature alloys
FR1524841A (fr) * 1966-06-01 1968-05-10 Siemens Ag Procédé pour la préparation de nitrure de silicium attaquable chimiquement sous forme de couches minces
US3637423A (en) * 1969-02-10 1972-01-25 Westinghouse Electric Corp Pyrolytic deposition of silicon nitride films
DE1957952A1 (de) * 1969-11-18 1971-05-27 Siemens Ag Siliciumnitridbeschichtung an Quarzwaenden fuer Diffusions- und Oxydationsreaktoren

Also Published As

Publication number Publication date
NL7209294A (tr) 1974-01-03
FR2190946A1 (tr) 1974-02-01
DE2330720A1 (de) 1974-01-10
BR7304772D0 (pt) 1974-08-15
GB1420526A (en) 1976-01-07
IT990832B (it) 1975-07-10
JPS4943880A (tr) 1974-04-25
DE2330720B2 (de) 1978-05-24
AU5740573A (en) 1975-01-09
FR2190946B1 (tr) 1977-05-13
SE384537B (sv) 1976-05-10
DE2330720C3 (de) 1979-01-18

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: N.V. PHILIPS'GLOEILAMPENFABRIEKEN

Effective date: 19910630