SE350343B - - Google Patents

Info

Publication number
SE350343B
SE350343B SE944567A SE944567A SE350343B SE 350343 B SE350343 B SE 350343B SE 944567 A SE944567 A SE 944567A SE 944567 A SE944567 A SE 944567A SE 350343 B SE350343 B SE 350343B
Authority
SE
Sweden
Prior art keywords
alkali
exposed
july
photo
developed
Prior art date
Application number
SE944567A
Inventor
F Uhlig
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of SE350343B publication Critical patent/SE350343B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

1,180,438. Photo-sensitive materials. KALLE A.G. July 6, 1967 [July 8, 1966], No.31195/67. Heading G2C. A light-sensitive material comprises a transparent polymeric support coated with an o-naphthoquinone diazide and at least two alkali-fast dyes which are opaque to ultraviolet light and soluble or dispersible in organic solvents so that the layer has a photographic density above 1. The material is exposed to an original bearing a silver image and developed with alkali to remove the exposed areas and produce a positive image which may be used as masters in photo-mechanical processes. In the examples a polyester support is coated with a layer containing one or two o-naphthoquinone diazides, two or three alkali-fast dyes and optionally polyvinyl acetate is exposed to a silver image original and developed with alkali metal silicates, phosphates or carbonates and/or ethanolamines, alkylenediamines to produce a positive image. Reference has been directed by the Comptroller to Specification 1,052,699.
SE944567A 1966-07-08 1967-06-28 SE350343B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1966K0059705 DE1572085B2 (en) 1966-07-08 1966-07-08 METHOD AND COPY MATERIAL FOR DUPLICATING SILVER FILMS

Publications (1)

Publication Number Publication Date
SE350343B true SE350343B (en) 1972-10-23

Family

ID=7229280

Family Applications (1)

Application Number Title Priority Date Filing Date
SE944567A SE350343B (en) 1966-07-08 1967-06-28

Country Status (8)

Country Link
AT (1) AT285321B (en)
BE (1) BE700948A (en)
CH (1) CH478422A (en)
DE (1) DE1572085B2 (en)
ES (1) ES342759A1 (en)
GB (1) GB1180438A (en)
NL (1) NL6709015A (en)
SE (1) SE350343B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
DE3830914A1 (en) * 1988-09-10 1990-03-22 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE, RECORDING MATERIAL MADE THEREOF, AND METHOD FOR PRODUCING COPIES

Also Published As

Publication number Publication date
ES342759A1 (en) 1968-08-01
CH478422A (en) 1969-09-15
NL6709015A (en) 1967-09-25
BE700948A (en) 1968-01-05
DE1572085A1 (en) 1970-02-12
DE1572085B2 (en) 1976-10-14
GB1180438A (en) 1970-02-04
AT285321B (en) 1970-10-27

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