SE324271B - - Google Patents

Info

Publication number
SE324271B
SE324271B SE1140165A SE1140165A SE324271B SE 324271 B SE324271 B SE 324271B SE 1140165 A SE1140165 A SE 1140165A SE 1140165 A SE1140165 A SE 1140165A SE 324271 B SE324271 B SE 324271B
Authority
SE
Sweden
Application number
SE1140165A
Inventor
D Mattox
Original Assignee
Atomic Energy Commission
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atomic Energy Commission filed Critical Atomic Energy Commission
Publication of SE324271B publication Critical patent/SE324271B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE1140165A 1964-09-15 1965-09-01 SE324271B (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US39678464A 1964-09-15 1964-09-15

Publications (1)

Publication Number Publication Date
SE324271B true SE324271B (fr) 1970-05-25

Family

ID=23568590

Family Applications (1)

Application Number Title Priority Date Filing Date
SE1140165A SE324271B (fr) 1964-09-15 1965-09-01

Country Status (5)

Country Link
BE (1) BE669632A (fr)
DE (1) DE1521561B2 (fr)
FR (1) FR1449124A (fr)
GB (1) GB1115055A (fr)
SE (1) SE324271B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138027B (en) * 1983-04-12 1986-09-10 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
DE3518197A1 (de) * 1985-05-21 1986-11-27 Heinrich 7413 Gomaringen Grünwald Verfahren zur entfernung von metallionen aus koerpern aus glas, keramischen werkstoffen und sonstigen amorphen werkstoffen sowie kristallinen werkstoffen
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film
DE19503718A1 (de) * 1995-02-04 1996-08-08 Leybold Ag UV-Strahler
US6291345B1 (en) 1998-07-27 2001-09-18 Honeywell International Inc. Controlled-stress stable metallization for electronic and electromechanical devices

Also Published As

Publication number Publication date
GB1115055A (en) 1968-05-22
FR1449124A (fr) 1966-03-18
DE1521561A1 (de) 1969-11-27
BE669632A (fr) 1965-12-31
DE1521561B2 (de) 1975-07-03

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