SE313997B - - Google Patents

Info

Publication number
SE313997B
SE313997B SE10425/64A SE1042564A SE313997B SE 313997 B SE313997 B SE 313997B SE 10425/64 A SE10425/64 A SE 10425/64A SE 1042564 A SE1042564 A SE 1042564A SE 313997 B SE313997 B SE 313997B
Authority
SE
Sweden
Application number
SE10425/64A
Inventor
S Chu
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of SE313997B publication Critical patent/SE313997B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
SE10425/64A 1963-09-06 1964-08-31 SE313997B (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US307025A US3300309A (en) 1963-09-06 1963-09-06 Moisture-resistant planographic plates and methods of producing same

Publications (1)

Publication Number Publication Date
SE313997B true SE313997B (en:Method) 1969-08-25

Family

ID=23187917

Family Applications (1)

Application Number Title Priority Date Filing Date
SE10425/64A SE313997B (en:Method) 1963-09-06 1964-08-31

Country Status (6)

Country Link
US (1) US3300309A (en:Method)
BE (1) BE652748A (en:Method)
DE (1) DE1447916B2 (en:Method)
GB (1) GB1055079A (en:Method)
NL (2) NL6410224A (en:Method)
SE (1) SE313997B (en:Method)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL156092B (nl) * 1968-03-25 1978-03-15 Polychrome Corp Werkwijze voor de vervaardiging van een lithografische drukplaat.
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3891516A (en) * 1970-08-03 1975-06-24 Polychrome Corp Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
JPS5539825B2 (en:Method) * 1972-05-12 1980-10-14
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US4230492A (en) * 1978-01-17 1980-10-28 The Richardson Company Aryl sulfonic acid based stabilizers for presensitized planographic plates
US4299907A (en) * 1978-08-10 1981-11-10 Polychrome Corporation Storage stable photosensitive diazo lithographic printing plates
US4414315A (en) * 1979-08-06 1983-11-08 Howard A. Fromson Process for making lithographic printing plate
US4401743A (en) * 1980-04-30 1983-08-30 Minnesota Mining And Manufacturing Company Aqueous developable photosensitive composition and printing plate
US4326020A (en) * 1980-09-10 1982-04-20 Polychrome Corporation Method of making positive acting diazo lithographic printing plate
US4499170A (en) * 1983-06-17 1985-02-12 Richardson Graphics Company Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
US5122442A (en) * 1989-07-28 1992-06-16 Hoechst Celanese Corporation Method for forming an image from a high speed screen printing composition on a screen mesh
US5232813A (en) * 1990-01-31 1993-08-03 Fuji Photo Film Co., Ltd. Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
CN1037552C (zh) * 1991-03-21 1998-02-25 北京大学 一种负性感光印刷版及其制法
US5942368A (en) * 1996-04-23 1999-08-24 Konica Corporation Pigment dispersion composition
JP3567402B2 (ja) * 1996-06-12 2004-09-22 コニカミノルタホールディングス株式会社 平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版
WO2012002361A1 (ja) 2010-07-02 2012-01-05 Dic株式会社 フッ素系界面活性剤、それを用いたコーティング組成物及びレジスト組成物
US9359547B2 (en) * 2013-01-31 2016-06-07 Halliburton Energy Services, Inc. Wellbore servicing compositions and methods of making and using same
EP4083098A4 (en) 2019-12-25 2024-01-17 DIC Corporation POLYMER AND COATING COMPOSITION CONTAINING SUCH POLYMER
US20230323002A1 (en) 2020-09-03 2023-10-12 Dic Corporation Polymer, coating composition, resist composition, and article
KR20230066097A (ko) 2020-12-17 2023-05-12 디아이씨 가부시끼가이샤 화합물, 레벨링제, 코팅 조성물, 레지스트 조성물 및 물품
TW202311331A (zh) 2021-05-18 2023-03-16 日商Ｄｉｃ股份有限公司 含矽酮鏈的聚合物、塗敷組成物、抗蝕劑組成物及物品
TW202336058A (zh) 2022-03-08 2023-09-16 日商Ｄｉｃ股份有限公司 化合物、該化合物的製造方法、調平劑、塗敷組成物、抗蝕劑組成物、硬化物及物品
CN119654359A (zh) 2022-07-29 2025-03-18 Dic株式会社 含硅酮的共聚物、调平剂、涂敷组合物、抗蚀剂组合物、彩色滤光片及含硅酮的共聚物的制造方法
KR20250043342A (ko) 2022-07-29 2025-03-28 디아이씨 가부시끼가이샤 실리콘 함유 공중합체, 레벨링제, 코팅 조성물, 레지스트 조성물, 컬러 필터 및 실리콘 함유 공중합체의 제조 방법
TW202419491A (zh) 2022-11-10 2024-05-16 日商Ｄｉｃ股份有限公司 抗蝕劑組成物及其硬化物
TW202419466A (zh) 2022-11-14 2024-05-16 日商Ｄｉｃ股份有限公司 隨機共聚物及其製造方法、包含該共聚物的塗敷組成物、抗蝕劑組成物以及物品
TW202440690A (zh) 2023-04-06 2024-10-16 日商Ｄｉｃ股份有限公司 共聚物、塗敷組成物、塗膜、抗蝕劑組成物、硬化物及物品

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE857739C (de) * 1950-08-13 1952-12-01 Kalle & Co Ag Verfahren zum Fixieren von Druckformen, die mit Hilfe von Diazoverbindungen hergestellt sind
DE1183919B (de) * 1958-12-29 1964-12-23 Polychrome Corp Verfahren zur Herstellung einer vorsensibilisierten Flachdruckplatte mit metallischer Grundschicht unter Verwendung einer Haftschicht
NL132197C (en:Method) * 1959-12-30
BE624581A (en:Method) * 1961-11-11
US3169864A (en) * 1962-05-15 1965-02-16 Minnesota Mining & Mfg Photosensitive materials comprising diazonium salts of bisphenol esters

Also Published As

Publication number Publication date
NL128965C (en:Method)
DE1447916A1 (de) 1968-11-14
DE1447916B2 (de) 1976-11-04
NL6410224A (en:Method) 1965-03-08
BE652748A (en:Method) 1964-12-31
US3300309A (en) 1967-01-24
GB1055079A (en) 1967-01-11

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