SA516380527B1 - طريقة للحصول منتج مقولب كمرشح - Google Patents
طريقة للحصول منتج مقولب كمرشحInfo
- Publication number
- SA516380527B1 SA516380527B1 SA516380527A SA516380527A SA516380527B1 SA 516380527 B1 SA516380527 B1 SA 516380527B1 SA 516380527 A SA516380527 A SA 516380527A SA 516380527 A SA516380527 A SA 516380527A SA 516380527 B1 SA516380527 B1 SA 516380527B1
- Authority
- SA
- Saudi Arabia
- Prior art keywords
- carbon nanomaterial
- carbon
- molded article
- hole
- desired size
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 8
- 229910052799 carbon Inorganic materials 0.000 abstract 6
- 239000002086 nanomaterial Substances 0.000 abstract 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 239000002041 carbon nanotube Substances 0.000 abstract 1
- 229910021393 carbon nanotube Inorganic materials 0.000 abstract 1
- 229910021389 graphene Inorganic materials 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000002116 nanohorn Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0039—Inorganic membrane manufacture
- B01D67/0053—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
- B01D67/006—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
- B01D67/0062—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods by micromachining techniques, e.g. using masking and etching steps, photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0079—Manufacture of membranes comprising organic and inorganic components
- B01D67/00791—Different components in separate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/107—Organic support material
- B01D69/1071—Woven, non-woven or net mesh
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1213—Laminated layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1216—Three or more layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/021—Carbon
- B01D71/0211—Graphene or derivates thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/08—Specific temperatures applied
- B01D2323/081—Heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/34—Use of radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/64—Use of a temporary support
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/734—Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Architecture (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Structural Engineering (AREA)
- Carbon And Carbon Compounds (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Filtering Materials (AREA)
Abstract
يتعلق الاختراع الحالي بأداة تستخدم لعمل ثقب hole بحجم مطلوب بدقة وبشكل موحد في مادة نانونية من الكربون carbon nanomaterial تستخدم كمرشح filter أو ما إلى ذلك، مثل جرافين graphene أو أنبوب نانوي من الكربون carbon nanotube أو بوق نانوي من الكربون carbon nanohorn. كما يتعلق الاختراع الحالي بطريقة لتثقيب مادة نانونية من الكربون لعمل ثقب بحجم مطلوب في مادة نانوية من الكربون، حيث يتم تسخين المادة النانونية من الكربون وإبقائها في درجة حرارة منخفضة في الهواء الذي يحتوي على الأكسجين oxygen عند 160 إلى 250 درجة مئوية لفترة زمنية محددة مسبقًا، وبذلك يتم عمل ثقب بحجم مطلوب وبشكل موحد في المادة النانونية من الكربون عن طريق التحكم من طول الفترة الزمنية للتسخين heating time. شكل 1أ.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014134449 | 2014-06-30 | ||
PCT/JP2015/067400 WO2016002509A1 (ja) | 2014-06-30 | 2015-06-17 | カーボンナノ素材の穿孔方法およびフィルター成形体の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SA516380527B1 true SA516380527B1 (ar) | 2022-04-28 |
Family
ID=55019056
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SA516380527A SA516380527B1 (ar) | 2014-06-30 | 2016-12-19 | طريقة للحصول منتج مقولب كمرشح |
Country Status (8)
Country | Link |
---|---|
US (2) | US20170128890A1 (ar) |
EP (2) | EP3165277A4 (ar) |
JP (1) | JP6588907B2 (ar) |
CN (2) | CN109908768B (ar) |
AU (2) | AU2015285551A1 (ar) |
SA (1) | SA516380527B1 (ar) |
TW (2) | TW201609532A (ar) |
WO (1) | WO2016002509A1 (ar) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2015302719B2 (en) * | 2014-08-11 | 2019-10-31 | Kotobuki Holdings Co., Ltd. | Method for producing molded filter body |
EP3653285A4 (en) | 2017-07-14 | 2021-03-31 | Shinshu University | GRAPHENE NANOWINDOW STRUCTURE AND VERY PURE GAS PRODUCTION PROCESS |
EP3705174A4 (en) | 2017-10-30 | 2021-07-21 | Shinshu University | PROCESS FOR THE MANUFACTURE OF MOLDED FILTER BODIES |
CN108176247A (zh) * | 2018-02-28 | 2018-06-19 | 长沙理工大学 | 用于盐水分离的纳米复合过滤膜及其制备方法和应用 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002097008A (ja) * | 2000-09-20 | 2002-04-02 | Japan Science & Technology Corp | 単層カーボンナノチューブの開孔方法 |
JP3854294B2 (ja) | 2002-05-27 | 2006-12-06 | 独立行政法人科学技術振興機構 | 高密度カーボンナノホーンとその製造方法 |
US20040060867A1 (en) * | 2002-09-27 | 2004-04-01 | Bmc Industries, Inc. | Membrane support devices and methods of manufacturing |
JP5386986B2 (ja) * | 2007-01-25 | 2014-01-15 | 日本電気株式会社 | 触媒担持カーボンナノホーン複合体およびその製造方法 |
JP2009073727A (ja) * | 2007-08-29 | 2009-04-09 | Olympus Corp | カーボンナノチューブ加工方法及びそれによって加工されたカーボンナノチューブ |
US8409450B2 (en) * | 2008-03-24 | 2013-04-02 | The Regents Of The University Of California | Graphene-based structure, method of suspending graphene membrane, and method of depositing material onto graphene membrane |
US7993524B2 (en) | 2008-06-30 | 2011-08-09 | Nanoasis Technologies, Inc. | Membranes with embedded nanotubes for selective permeability |
US8821745B2 (en) * | 2008-12-23 | 2014-09-02 | The Trustees Of The University Of Pennsylvania | High yield preparation of macroscopic graphene oxide membranes |
CN102656016B (zh) * | 2009-10-16 | 2015-12-16 | 石墨烯广场株式会社 | 石墨烯卷对卷转印方法、由该方法制成的石墨烯卷及石墨烯卷对卷转印装置 |
US8268180B2 (en) * | 2010-01-26 | 2012-09-18 | Wisconsin Alumni Research Foundation | Methods of fabricating large-area, semiconducting nanoperforated graphene materials |
US8361321B2 (en) | 2010-08-25 | 2013-01-29 | Lockheed Martin Corporation | Perforated graphene deionization or desalination |
JP5926035B2 (ja) | 2011-11-21 | 2016-05-25 | Jx金属株式会社 | グラフェン製造用銅箔及びグラフェン製造用銅箔の製造方法、並びにグラフェンの製造方法 |
CN102557004B (zh) * | 2011-12-23 | 2015-01-28 | 上海交通大学 | 一种通过磁场控制碳纳米材料生长形貌的方法 |
JP2013144621A (ja) | 2012-01-16 | 2013-07-25 | Panasonic Corp | グラフェン膜、グラフェン膜の製造方法、グラフェンデバイス、およびグラフェンデバイスの製造方法 |
US8979978B2 (en) * | 2012-01-26 | 2015-03-17 | Empire Technology Development Llc | Graphene membrane with regular angstrom-scale pores |
US9567224B2 (en) * | 2012-03-21 | 2017-02-14 | Lockheed Martin Corporation | Methods for perforating graphene using an activated gas stream and perforated graphene produced therefrom |
US9463421B2 (en) * | 2012-03-29 | 2016-10-11 | Lockheed Martin Corporation | Planar filtration and selective isolation and recovery device |
CN103145115B (zh) * | 2013-02-01 | 2014-11-19 | 中科院广州化学有限公司 | 表面羧基官能化的碳纳米材料及其制备方法和应用 |
-
2015
- 2015-06-17 EP EP15814634.0A patent/EP3165277A4/en not_active Withdrawn
- 2015-06-17 CN CN201910268723.2A patent/CN109908768B/zh not_active Expired - Fee Related
- 2015-06-17 US US15/322,682 patent/US20170128890A1/en not_active Abandoned
- 2015-06-17 AU AU2015285551A patent/AU2015285551A1/en not_active Abandoned
- 2015-06-17 EP EP17184153.9A patent/EP3263210A1/en not_active Withdrawn
- 2015-06-17 WO PCT/JP2015/067400 patent/WO2016002509A1/ja active Application Filing
- 2015-06-17 JP JP2016531251A patent/JP6588907B2/ja active Active
- 2015-06-17 CN CN201580027835.9A patent/CN106457162A/zh active Pending
- 2015-06-30 TW TW104121074A patent/TW201609532A/zh unknown
- 2015-06-30 TW TW107131136A patent/TWI664143B/zh not_active IP Right Cessation
-
2016
- 2016-12-19 SA SA516380527A patent/SA516380527B1/ar unknown
-
2019
- 2019-07-11 AU AU2019204970A patent/AU2019204970B2/en not_active Ceased
- 2019-11-27 US US16/697,967 patent/US20200101424A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
TW201609532A (zh) | 2016-03-16 |
JPWO2016002509A1 (ja) | 2017-06-22 |
EP3165277A1 (en) | 2017-05-10 |
EP3263210A1 (en) | 2018-01-03 |
US20170128890A1 (en) | 2017-05-11 |
AU2015285551A1 (en) | 2017-01-12 |
EP3165277A4 (en) | 2018-03-14 |
CN109908768B (zh) | 2021-11-19 |
AU2019204970B2 (en) | 2020-09-10 |
AU2019204970A1 (en) | 2019-08-01 |
US20200101424A1 (en) | 2020-04-02 |
JP6588907B2 (ja) | 2019-10-09 |
TW201900555A (zh) | 2019-01-01 |
CN109908768A (zh) | 2019-06-21 |
WO2016002509A1 (ja) | 2016-01-07 |
CN106457162A (zh) | 2017-02-22 |
TWI664143B (zh) | 2019-07-01 |
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