RU98123600A - QUARTZ GLASS DETAIL FOR USE IN THE PRODUCTION OF SEMICONDUCTORS - Google Patents
QUARTZ GLASS DETAIL FOR USE IN THE PRODUCTION OF SEMICONDUCTORSInfo
- Publication number
- RU98123600A RU98123600A RU98123600/28A RU98123600A RU98123600A RU 98123600 A RU98123600 A RU 98123600A RU 98123600/28 A RU98123600/28 A RU 98123600/28A RU 98123600 A RU98123600 A RU 98123600A RU 98123600 A RU98123600 A RU 98123600A
- Authority
- RU
- Russia
- Prior art keywords
- quartz glass
- structural elements
- plane
- detail
- average
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 239000004065 semiconductor Substances 0.000 title claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 7
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
- 230000001788 irregular Effects 0.000 claims 1
- 230000000630 rising Effects 0.000 claims 1
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19713014A DE19713014C2 (en) | 1997-03-27 | 1997-03-27 | Quartz glass component for use in semiconductor manufacture |
DE19713014.3 | 1997-03-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
RU98123600A true RU98123600A (en) | 2000-09-27 |
RU2195045C2 RU2195045C2 (en) | 2002-12-20 |
Family
ID=7824874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU98123600/28A RU2195045C2 (en) | 1997-03-27 | 1998-03-24 | Quartz glass part for semiconductor manufacture |
Country Status (11)
Country | Link |
---|---|
US (1) | US6150006A (en) |
EP (1) | EP0914676B1 (en) |
JP (1) | JP3786240B2 (en) |
KR (1) | KR100507604B1 (en) |
CN (1) | CN1150346C (en) |
AT (1) | ATE326065T1 (en) |
DE (2) | DE19713014C2 (en) |
RU (1) | RU2195045C2 (en) |
SG (1) | SG63833A1 (en) |
TW (1) | TW506950B (en) |
WO (1) | WO1998044538A2 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3985243B2 (en) | 1998-12-01 | 2007-10-03 | 信越石英株式会社 | Quartz glass jig having large irregularities on the surface and manufacturing method thereof |
DE19917288C2 (en) * | 1999-04-16 | 2001-06-28 | Heraeus Quarzglas | Quartz glass crucible |
US6368410B1 (en) * | 1999-06-28 | 2002-04-09 | General Electric Company | Semiconductor processing article |
TW570987B (en) | 1999-12-28 | 2004-01-11 | Toshiba Corp | Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus |
JP2002047034A (en) | 2000-07-31 | 2002-02-12 | Shinetsu Quartz Prod Co Ltd | Quarts glass jig for process device utilizing plasma |
DE60128302T2 (en) * | 2000-08-29 | 2008-01-24 | Heraeus Quarzglas Gmbh & Co. Kg | Plasma remains quartz glass holder |
JP4539794B2 (en) * | 2000-09-28 | 2010-09-08 | 信越石英株式会社 | Silica glass jig for semiconductor industry and manufacturing method thereof |
KR100547743B1 (en) * | 2000-09-28 | 2006-01-31 | 신에쯔 세끼에이 가부시키가이샤 | Silica Glass Jig for Semiconductor Industry and Manufacturing Method Thereof |
US6897002B2 (en) * | 2002-03-25 | 2005-05-24 | Ricoh Company, Ltd. | Liquid developer, image-fixing apparatus using the same, and image-forming apparatus using the same |
DE60324625D1 (en) * | 2002-04-04 | 2008-12-24 | Tosoh Corp | Thermally sprayed quartz glass parts and manufacturing processes |
US20040055709A1 (en) * | 2002-09-19 | 2004-03-25 | Applied Materials, Inc. | Electrostatic chuck having a low level of particle generation and method of fabricating same |
US6879777B2 (en) | 2002-10-03 | 2005-04-12 | Asm America, Inc. | Localized heating of substrates using optics |
KR100847082B1 (en) * | 2002-10-31 | 2008-07-18 | 토소가부시키가이샤 | Parts to which island-form projection is attached, manufacturing method thereof and apparatus comprising the parts |
US6720531B1 (en) | 2002-12-11 | 2004-04-13 | Asm America, Inc. | Light scattering process chamber walls |
JP4330363B2 (en) * | 2003-03-28 | 2009-09-16 | ジャパンスーパークォーツ株式会社 | Quartz glass crucible |
US7250114B2 (en) * | 2003-05-30 | 2007-07-31 | Lam Research Corporation | Methods of finishing quartz glass surfaces and components made by the methods |
US7045072B2 (en) * | 2003-07-24 | 2006-05-16 | Tan Samantha S H | Cleaning process and apparatus for silicate materials |
JP4994576B2 (en) * | 2004-03-23 | 2012-08-08 | コバレントマテリアル株式会社 | Silica glass crucible |
DE102005005196B4 (en) * | 2005-02-03 | 2009-04-23 | Heraeus Quarzglas Gmbh & Co. Kg | Method for producing a component made of quartz glass for use in semiconductor production and component obtained by the method |
JP5234526B2 (en) * | 2008-02-29 | 2013-07-10 | 株式会社Sumco | Quartz crucible for pulling silicon single crystal and manufacturing method thereof |
BE1020793A3 (en) * | 2012-07-18 | 2014-05-06 | Agc Glass Europe | GLASS SHEET DEPOLIE. |
US10727094B2 (en) | 2016-01-29 | 2020-07-28 | Taiwan Semiconductor Manufacturing Co., Ltd | Thermal reflector device for semiconductor fabrication tool |
KR102019817B1 (en) * | 2017-09-07 | 2019-09-09 | 주식회사 원익큐엔씨 | Quarts surface treatment method |
DE102020131324A1 (en) | 2020-11-26 | 2022-06-02 | Heraeus Noblelight Gmbh | Infrared radiator and infrared radiation emitting component |
DE102022111985A1 (en) | 2022-05-12 | 2023-11-16 | Heraeus Noblelight Gmbh | Infrared emitter with an emissive layer applied to a metal reflector layer and use of the emissive layer |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55127021A (en) * | 1979-03-24 | 1980-10-01 | Mitsubishi Electric Corp | Deposition apparatus for gaseous phase reaction |
JPS58202535A (en) * | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Film forming device |
LU86722A1 (en) * | 1986-12-23 | 1988-07-14 | Glaverbel | SHEET OF GLASS MATERIAL CARRYING A SERIOUS DRAWING AND METHOD FOR ENGRAVING A DRAWING ON A SUBSTRATE OF GLASS MATERIAL |
US5091053A (en) * | 1990-02-28 | 1992-02-25 | At&T Bell Laboratories | Matte finishes on optical fibers and other glass articles |
JPH0415215A (en) * | 1990-05-08 | 1992-01-20 | Sumitomo Bakelite Co Ltd | Thermosetting resin composition for laminate |
JPH04152515A (en) * | 1990-10-16 | 1992-05-26 | Seiko Epson Corp | Manufacture of semiconductor device |
JP3262674B2 (en) * | 1994-03-31 | 2002-03-04 | 信越石英株式会社 | Quartz glass surface treatment liquid and method of using the same |
JP3117611B2 (en) * | 1994-03-31 | 2000-12-18 | 信越石英株式会社 | Quartz glass surface processing method |
DE4429825C1 (en) * | 1994-08-23 | 1995-11-09 | Heraeus Quarzglas | Coated component made of quartz glass |
US5614071A (en) * | 1995-06-28 | 1997-03-25 | Hmt Technology Corporation | Sputtering shield |
EP0763504B1 (en) * | 1995-09-14 | 1999-06-02 | Heraeus Quarzglas GmbH | Silica glass member and method for producing the same |
JP4195916B2 (en) * | 1996-12-04 | 2008-12-17 | 信越石英株式会社 | Silica glass container for dry etching, method for producing the same, and dry etching apparatus provided with the silica glass container |
-
1997
- 1997-03-27 DE DE19713014A patent/DE19713014C2/en not_active Expired - Fee Related
-
1998
- 1998-03-17 TW TW087103933A patent/TW506950B/en not_active IP Right Cessation
- 1998-03-24 CN CNB988003899A patent/CN1150346C/en not_active Expired - Lifetime
- 1998-03-24 AT AT98924075T patent/ATE326065T1/en active
- 1998-03-24 US US09/194,307 patent/US6150006A/en not_active Expired - Lifetime
- 1998-03-24 RU RU98123600/28A patent/RU2195045C2/en not_active IP Right Cessation
- 1998-03-24 DE DE59813532T patent/DE59813532D1/en not_active Expired - Lifetime
- 1998-03-24 EP EP98924075A patent/EP0914676B1/en not_active Expired - Lifetime
- 1998-03-24 WO PCT/EP1998/001715 patent/WO1998044538A2/en active IP Right Grant
- 1998-03-26 KR KR10-1998-0010587A patent/KR100507604B1/en not_active IP Right Cessation
- 1998-03-26 SG SG1998000639A patent/SG63833A1/en unknown
- 1998-03-27 JP JP08102998A patent/JP3786240B2/en not_active Expired - Lifetime
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