RU93032063A - WAY OF SPRAYING FILMS - Google Patents

WAY OF SPRAYING FILMS

Info

Publication number
RU93032063A
RU93032063A RU93032063/10A RU93032063A RU93032063A RU 93032063 A RU93032063 A RU 93032063A RU 93032063/10 A RU93032063/10 A RU 93032063/10A RU 93032063 A RU93032063 A RU 93032063A RU 93032063 A RU93032063 A RU 93032063A
Authority
RU
Russia
Prior art keywords
discharge
way
films
plasma
speed
Prior art date
Application number
RU93032063/10A
Other languages
Russian (ru)
Other versions
RU2058429C1 (en
Inventor
Г.В. Ходаченко
Д.В. Мозгрин
И.К. Фетисов
Original Assignee
Г.В. Ходаченко
Д.В. Мозгрин
И.К. Фетисов
Filing date
Publication date
Application filed by Г.В. Ходаченко, Д.В. Мозгрин, И.К. Фетисов filed Critical Г.В. Ходаченко
Priority to RU93032063A priority Critical patent/RU2058429C1/en
Priority claimed from RU93032063A external-priority patent/RU2058429C1/en
Publication of RU93032063A publication Critical patent/RU93032063A/en
Application granted granted Critical
Publication of RU2058429C1 publication Critical patent/RU2058429C1/en

Links

Claims (1)

Предлагаемый способ может быть использован в технологии производства полупроводниковых приборов, поверхностного легирования материалов, нанесения защитных покрытий, получения различных пленочных структур. Способ обеспечивает повышение качества пленок и скорости их нанесения за счет уменьшения времени воздействия плазмы разряда на обрабатываемый материал при одновременном увеличении скорости нанесения покрытия. В заявляемом способе в газоразрядном промежутке последовательно создают магнитное поле и предварительную плазму, в которой формируют сильноточный высоковольтный диффузионный разряд с напряжением горения свыше 75 В путем пропускания через нее импульсов тока плотностью 0,3 - 100 А/см2, длительностью 10- 6 - 1 с с частотой следования от одного до 103 Гц.The proposed method can be used in the production technology of semiconductor devices, surface doping of materials, the application of protective coatings, the production of various film structures. The method improves the quality of the films and the speed of their deposition by reducing the time of exposure of the discharge plasma to the material being processed while simultaneously increasing the coating speed. In the inventive method, in a gas-discharge gap, a magnetic field and a preliminary plasma are successively created in which a high-current high-voltage diffusion discharge with a burning voltage of more than 75 V is formed by passing current pulses of 0.3-100 A / cm 2 , duration 10 - 6 - 1 with a repetition rate from one to 10 3 Hz.
RU93032063A 1993-06-17 1993-06-17 Method for film spraying RU2058429C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU93032063A RU2058429C1 (en) 1993-06-17 1993-06-17 Method for film spraying

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU93032063A RU2058429C1 (en) 1993-06-17 1993-06-17 Method for film spraying

Publications (2)

Publication Number Publication Date
RU93032063A true RU93032063A (en) 1995-10-27
RU2058429C1 RU2058429C1 (en) 1996-04-20

Family

ID=20143572

Family Applications (1)

Application Number Title Priority Date Filing Date
RU93032063A RU2058429C1 (en) 1993-06-17 1993-06-17 Method for film spraying

Country Status (1)

Country Link
RU (1) RU2058429C1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6896773B2 (en) 2002-11-14 2005-05-24 Zond, Inc. High deposition rate sputtering
US9771648B2 (en) 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US7095179B2 (en) 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
RU2339735C1 (en) * 2007-02-12 2008-11-27 Закрытое акционерное общество "Нано-Плазменные Технологии" (ЗАО "НАНПЛАТЕК") Method for film coating
SE532505C2 (en) 2007-12-12 2010-02-09 Plasmatrix Materials Ab Method for plasma activated chemical vapor deposition and plasma decomposition unit
RU2467878C2 (en) * 2011-01-24 2012-11-27 Федеральное государственное бюджетное учреждение науки Институт физики прочности и материаловедения Сибирского отделения Российской академии наук (ИФПМ СО РАН) Method of applying heat-resistant coating
RU2602577C2 (en) * 2011-06-30 2016-11-20 Эрликон Серфиз Солюшнз Аг, Пфеффикон Nano-layered coating for high-quality tools
RU2566232C1 (en) * 2014-09-15 2015-10-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский ядерный университет "МИФИ" (НИЯУ МИФИ) Method of combined ion-plasma treatment of products out of aluminium alloys

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