RU2018126505A - Способы улучшения коэффициента загрузки газообразного водорода - Google Patents
Способы улучшения коэффициента загрузки газообразного водорода Download PDFInfo
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- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/0005—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes
- C01B3/001—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof
- C01B3/0026—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof of one single metal or a rare earth metal; Treatment thereof
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- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
- B01J20/0203—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of metals not provided for in B01J20/04
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- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
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- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
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- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3234—Inorganic material layers
- B01J20/3236—Inorganic material layers containing metal, other than zeolites, e.g. oxides, hydroxides, sulphides or salts
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- B32B15/00—Layered products comprising a layer of metal
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- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/06—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
- C01B3/08—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents with metals
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
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- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/025—Epitaxial-layer growth characterised by the substrate
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- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/08—Epitaxial-layer growth by condensing ionised vapours
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Claims (26)
1. Способ улучшения коэффициента загрузки газообразного водорода в переходный металл, включающий:
осаждение пленки на поверхности переходного металла;
дезактивацию посредством осажденной пленки участков десорбции на поверхности переходного металла; где область десорбции переходного металла уменьшается вследствие дезактивированных участков десорбции;
где уменьшенная область десорбции снижает скорость десорбции газообразного водорода и улучшает коэффициент загрузки газообразного водорода.
2. Способ по п. 1, где пленка является металлической.
3. Способ по п. 1, где пленка является полуметаллической.
4. Способ по любому из пп. 1-3, где пленка имеет толщину от одного до пяти монослоев.
5. Способ по любому из пп. 1-3, где пленка содержит один или более из следующих элементов: титан, цирконий, гафний, ванадий, ниобий, тантал, хром, молибден, вольфрам, железо, алюминий, галлий, индий, кремний, германий и олово.
6. Способ по любому из пп. 1-3, где переходный металл представляет собой палладий, иридий, никель, платину, медь, серебро, золото, цинк, титан, цирконий, гафний, хром, ванадий, ниобий, тантал, молибден, вольфрам, железо, рутений, родий, алюминий, индий, олово, свинец или их смеси, предпочтительно палладий.
7. Способ по любому из пп. 1-3, где улучшенный коэффициент загрузки водорода равен 0,9 или более.
8. Способ улучшения коэффициента загрузки газообразного водорода в переходный металл, включающий:
осаждение методом распыления пленки переходного металла на подложке; и отжиг переходного металла при предварительно заданном давлении в интервале между 0,1 и 1,0 Па и предварительно заданной температуре в интервале между 200°C и 1000°C, где средний размер зерен в переходном металле увеличивается, и область десорбции переходного металла снижается; и где коэффициент загрузки газообразного водорода в переходном металле улучшается.
9. Способ по п. 8, где переходным металлом является палладий.
10. Способ по п. 8 или 9, где подложка представляет собой ориентированную серебряную подложку.
11. Способ по п. 8 или 9, где подложкой является стекло.
12. Способ по п. 8 или 9, где коэффициент загрузки водорода равен 0,9 или более.
13. Способ по п. 8 или 9, где пленка имеет толщину от одного до пяти монослоев.
14. Способ улучшения коэффициента загрузки газообразного водорода в переходный металл, включающий:
испарение переходного металла;
осаждение испаренного переходного металла для образования ориентированной металлической пленки переходного металла на ориентированной подложке, где осаждение ориентированной металлической пленки выполняют при предварительно заданной температуре в интервале между 150°С и 250°С и предварительно заданном давлении в интервале между 1×10-4 и 1×10-6 Па;
где металлическая пленка на подложке содержит ориентированные зерна, которые имеют размер в плоскости больший, чем толщина пленки.
15. Способ по п. 14, где переходным металлом является палладий.
16. Способ по п. 14 или 15, где подложка представляет собой ориентированную серебряную подложку.
17. Способ по п. 14 или 15, где коэффициент загрузки водорода равен 1,0 или более.
18. Способ по п. 14 или 15, где пленка имеет толщину от одного до пяти монослоев.
19. Способ по п. 14, дополнительно включающий отжиг переходного металла при предварительно заданном давлении в интервале между 0,1 и 1 Па и предварительно заданной температуре в интервале между 200°С и 1000°С.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662281392P | 2016-01-21 | 2016-01-21 | |
US62/281,392 | 2016-01-21 | ||
US201662344009P | 2016-06-01 | 2016-06-01 | |
US62/344,009 | 2016-06-01 | ||
PCT/US2017/014558 WO2017127800A1 (en) | 2016-01-21 | 2017-01-23 | Methods for improving loading ratio of hydrogen gas |
Publications (3)
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US4249654A (en) * | 1979-09-25 | 1981-02-10 | Helversen Frederick D | Hydrogen storage apparatus |
JPH01131002A (ja) * | 1987-11-17 | 1989-05-23 | Sanyo Electric Co Ltd | 水素吸蔵合金の製造方法 |
JPH01290501A (ja) * | 1988-05-17 | 1989-11-22 | Sanyo Electric Co Ltd | 水素貯蔵素子並びに水素ガス検知素子 |
JP3164579B2 (ja) * | 1989-09-13 | 2001-05-08 | キヤノン株式会社 | 水素貯蔵体 |
RU1805357C (ru) * | 1990-05-21 | 1993-03-30 | Институт Проблем Машиностроения Ан Усср | Устройство дл определени содержани водорода в металлах и сплавах |
EP0851515A3 (en) * | 1996-12-27 | 2004-10-27 | Canon Kabushiki Kaisha | Powdery material, electrode member, method for manufacturing same and secondary cell |
US6705152B2 (en) * | 2000-10-24 | 2004-03-16 | Nanoproducts Corporation | Nanostructured ceramic platform for micromachined devices and device arrays |
WO2004044923A2 (en) * | 2002-05-18 | 2004-05-27 | Peter Hagelstein | A device, system and method for increasing multiple occupancy of hydrogen isotopes in a host lattice |
WO2004103036A2 (en) * | 2003-04-25 | 2004-11-25 | Lattice Energy, L.L.C. | Electrode constructs including modified metal layers, and related cells and methods |
US20080112881A1 (en) * | 2006-11-14 | 2008-05-15 | Andrei Lipson | Systems and methods for hydrogen loading and generation of thermal response |
US8227020B1 (en) * | 2007-03-29 | 2012-07-24 | Npl Associates, Inc. | Dislocation site formation techniques |
WO2011026214A1 (en) * | 2009-09-01 | 2011-03-10 | The Governors Of The University Of Alberta | Kinetic stabilization of magnesium hydride |
CN103668133B (zh) * | 2013-09-09 | 2015-08-05 | 西北工业大学 | Zr基储氢合金沉积Pd膜的方法及化学镀镀液 |
DK3303215T3 (da) * | 2015-05-23 | 2022-01-10 | Univ Warszawski | Palladium-platin-system til brug som hydrogenlagringsmateriale og/eller elektrokatalysator, fortrinsvis i brændselsceller |
RU2018120536A (ru) * | 2015-12-04 | 2020-01-09 | Их Ип Холдингз Лимитед | Способы и устройство для запуска экзотермических реакций |
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WO2017127800A1 (en) | 2017-07-27 |
RU2018126505A3 (ru) | 2020-03-05 |
EP3405430A4 (en) | 2019-12-04 |
EP3405430A1 (en) | 2018-11-28 |
CN108602668A (zh) | 2018-09-28 |
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