RU2013127328A - METHOD FOR PRODUCING AMPLITUDE DIFFRACTION OPTICAL ELEMENTS AND MASK FOR PRODUCING PHASE STRUCTURES - Google Patents

METHOD FOR PRODUCING AMPLITUDE DIFFRACTION OPTICAL ELEMENTS AND MASK FOR PRODUCING PHASE STRUCTURES Download PDF

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Publication number
RU2013127328A
RU2013127328A RU2013127328/28A RU2013127328A RU2013127328A RU 2013127328 A RU2013127328 A RU 2013127328A RU 2013127328/28 A RU2013127328/28 A RU 2013127328/28A RU 2013127328 A RU2013127328 A RU 2013127328A RU 2013127328 A RU2013127328 A RU 2013127328A
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RU
Russia
Prior art keywords
producing
optical elements
phase structures
film
mask
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RU2013127328/28A
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Russian (ru)
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RU2556313C2 (en
Inventor
Алексей Васильевич Волков
Николай Львович Казанский
Олег Юрьевич Моисеев
Сергей Дмитриевич Полетаев
Original Assignee
Российская академия наук Федеральное государственное бюджетное учреждение науки Институт систем обработки изображений Российской академии наук (ИСОИ РАН)
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Priority to RU2013127328/28A priority Critical patent/RU2556313C2/en
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Способ изготовления амплитудных дифракционных оптических элементов и масок для изготовления фазовых структур, включающий нанесение металлической пленки на поверхность диэлектрической подложки с последующим воздействием сфокусированного лазерного излучения на пленку, отличающийся тем, что пленку молибдена наносят толщиной 35-45 нм, а воздействие сфокусированного лазерного излучения осуществляют мощностью (0,8-1,2)·10Вт/см, обеспечивая полное удаление (абляцию) металлической пленки в зоне воздействия.A method of manufacturing amplitude diffractive optical elements and masks for the manufacture of phase structures, comprising applying a metal film to the surface of a dielectric substrate, followed by the action of focused laser radiation on a film, characterized in that the molybdenum film is applied with a thickness of 35-45 nm, and the effect of focused laser radiation is performed by power (0.8-1.2) · 10W / cm, providing complete removal (ablation) of the metal film in the affected area.

Claims (1)

Способ изготовления амплитудных дифракционных оптических элементов и масок для изготовления фазовых структур, включающий нанесение металлической пленки на поверхность диэлектрической подложки с последующим воздействием сфокусированного лазерного излучения на пленку, отличающийся тем, что пленку молибдена наносят толщиной 35-45 нм, а воздействие сфокусированного лазерного излучения осуществляют мощностью (0,8-1,2)·107 Вт/см2, обеспечивая полное удаление (абляцию) металлической пленки в зоне воздействия. A method of manufacturing amplitude diffractive optical elements and masks for the manufacture of phase structures, comprising applying a metal film to the surface of a dielectric substrate, followed by the action of focused laser radiation on a film, characterized in that the molybdenum film is applied with a thickness of 35-45 nm, and the effect of focused laser radiation is performed by power (0.8-1.2) · 10 7 W / cm 2 , providing complete removal (ablation) of the metal film in the affected area.
RU2013127328/28A 2013-06-14 2013-06-14 Fabrication of amplitude diffraction optical elements and masks for production of phase structures RU2556313C2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU2013127328/28A RU2556313C2 (en) 2013-06-14 2013-06-14 Fabrication of amplitude diffraction optical elements and masks for production of phase structures

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Application Number Priority Date Filing Date Title
RU2013127328/28A RU2556313C2 (en) 2013-06-14 2013-06-14 Fabrication of amplitude diffraction optical elements and masks for production of phase structures

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RU2013127328A true RU2013127328A (en) 2014-12-20
RU2556313C2 RU2556313C2 (en) 2015-07-10

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Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1280560A1 (en) * 1985-10-22 1986-12-30 Институт автоматики и электрометрии СО АН СССР Method of manufacturing diffraction optical elements
DE19544295A1 (en) * 1995-11-28 1997-06-05 Zeiss Carl Jena Gmbh Production of structures within a submicron range e.g. grating
US6268113B1 (en) * 1998-04-30 2001-07-31 Eastman Kodak Company Antireflection direct write lithographic printing plates

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Effective date: 20190615