RU2013127328A - METHOD FOR PRODUCING AMPLITUDE DIFFRACTION OPTICAL ELEMENTS AND MASK FOR PRODUCING PHASE STRUCTURES - Google Patents
METHOD FOR PRODUCING AMPLITUDE DIFFRACTION OPTICAL ELEMENTS AND MASK FOR PRODUCING PHASE STRUCTURES Download PDFInfo
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- RU2013127328A RU2013127328A RU2013127328/28A RU2013127328A RU2013127328A RU 2013127328 A RU2013127328 A RU 2013127328A RU 2013127328/28 A RU2013127328/28 A RU 2013127328/28A RU 2013127328 A RU2013127328 A RU 2013127328A RU 2013127328 A RU2013127328 A RU 2013127328A
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- producing
- optical elements
- phase structures
- film
- mask
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Способ изготовления амплитудных дифракционных оптических элементов и масок для изготовления фазовых структур, включающий нанесение металлической пленки на поверхность диэлектрической подложки с последующим воздействием сфокусированного лазерного излучения на пленку, отличающийся тем, что пленку молибдена наносят толщиной 35-45 нм, а воздействие сфокусированного лазерного излучения осуществляют мощностью (0,8-1,2)·10Вт/см, обеспечивая полное удаление (абляцию) металлической пленки в зоне воздействия.A method of manufacturing amplitude diffractive optical elements and masks for the manufacture of phase structures, comprising applying a metal film to the surface of a dielectric substrate, followed by the action of focused laser radiation on a film, characterized in that the molybdenum film is applied with a thickness of 35-45 nm, and the effect of focused laser radiation is performed by power (0.8-1.2) · 10W / cm, providing complete removal (ablation) of the metal film in the affected area.
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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RU2013127328/28A RU2556313C2 (en) | 2013-06-14 | 2013-06-14 | Fabrication of amplitude diffraction optical elements and masks for production of phase structures |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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RU2013127328/28A RU2556313C2 (en) | 2013-06-14 | 2013-06-14 | Fabrication of amplitude diffraction optical elements and masks for production of phase structures |
Publications (2)
Publication Number | Publication Date |
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RU2013127328A true RU2013127328A (en) | 2014-12-20 |
RU2556313C2 RU2556313C2 (en) | 2015-07-10 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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RU2013127328/28A RU2556313C2 (en) | 2013-06-14 | 2013-06-14 | Fabrication of amplitude diffraction optical elements and masks for production of phase structures |
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RU (1) | RU2556313C2 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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SU1280560A1 (en) * | 1985-10-22 | 1986-12-30 | Институт автоматики и электрометрии СО АН СССР | Method of manufacturing diffraction optical elements |
DE19544295A1 (en) * | 1995-11-28 | 1997-06-05 | Zeiss Carl Jena Gmbh | Production of structures within a submicron range e.g. grating |
US6268113B1 (en) * | 1998-04-30 | 2001-07-31 | Eastman Kodak Company | Antireflection direct write lithographic printing plates |
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RU2556313C2 (en) | 2015-07-10 |
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Date | Code | Title | Description |
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MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20190615 |