PT3411695T - Método e sistema para medição topográfica tridimensional ótica - Google Patents
Método e sistema para medição topográfica tridimensional óticaInfo
- Publication number
- PT3411695T PT3411695T PT168896397T PT16889639T PT3411695T PT 3411695 T PT3411695 T PT 3411695T PT 168896397 T PT168896397 T PT 168896397T PT 16889639 T PT16889639 T PT 16889639T PT 3411695 T PT3411695 T PT 3411695T
- Authority
- PT
- Portugal
- Prior art keywords
- optical
- dimensional topography
- topography measurement
- measurement
- dimensional
- Prior art date
Links
- 238000005259 measurement Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
- 238000012876 topography Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2513—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object with several lines being projected in more than one direction, e.g. grids, patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2518—Projection by scanning of the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2518—Projection by scanning of the object
- G01B11/2522—Projection by scanning of the object the position of the object changing and being recorded
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/50—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images the image being built up from image elements distributed over a 3D volume, e.g. voxels
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/395—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers using a topographic target
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662289889P | 2016-02-01 | 2016-02-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
PT3411695T true PT3411695T (pt) | 2022-03-03 |
Family
ID=59500792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT168896397T PT3411695T (pt) | 2016-02-01 | 2016-11-04 | Método e sistema para medição topográfica tridimensional ótica |
Country Status (12)
Country | Link |
---|---|
US (2) | US10634487B2 (pt) |
EP (2) | EP3998477A1 (pt) |
JP (2) | JP6846441B2 (pt) |
KR (1) | KR102668017B1 (pt) |
CN (2) | CN113607088A (pt) |
ES (1) | ES2908695T3 (pt) |
MY (1) | MY196634A (pt) |
PH (1) | PH12018501598A1 (pt) |
PT (1) | PT3411695T (pt) |
SG (2) | SG11201805467TA (pt) |
TW (2) | TWI723129B (pt) |
WO (1) | WO2017136011A2 (pt) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6189984B2 (ja) * | 2016-02-12 | 2017-08-30 | Ckd株式会社 | 三次元計測装置 |
NL2020619B1 (en) * | 2018-01-16 | 2019-07-25 | Illumina Inc | Dual optical grating slide structured illumination imaging |
KR102066129B1 (ko) * | 2018-09-21 | 2020-01-14 | 한양대학교 산학협력단 | 도트 어레이를 이용하는 3차원 정보 생성 장치 및 방법 |
KR102008890B1 (ko) * | 2019-01-25 | 2019-08-08 | 단국대학교 산학협력단 | 3차원 프로파일 측정 방법 |
KR102260563B1 (ko) * | 2019-07-02 | 2021-06-07 | 한국과학기술연구원 | 체커보드 패턴 기반 구조 조명 현미경 시스템 |
US10921721B1 (en) * | 2019-09-13 | 2021-02-16 | Applied Materials, Inc. | Measurement system and grating pattern array |
US11053540B1 (en) | 2020-01-17 | 2021-07-06 | Element Biosciences, Inc. | High performance fluorescence imaging module for genomic testing assay |
CN111721231B (zh) * | 2020-06-03 | 2021-11-19 | 华东师范大学 | 一种基于光频梳的植物生态监测系统 |
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US6249335B1 (en) * | 1992-01-17 | 2001-06-19 | Nikon Corporation | Photo-mask and method of exposing and projection-exposing apparatus |
US5248876A (en) * | 1992-04-21 | 1993-09-28 | International Business Machines Corporation | Tandem linear scanning confocal imaging system with focal volumes at different heights |
US5471303A (en) * | 1994-04-29 | 1995-11-28 | Wyko Corporation | Combination of white-light scanning and phase-shifting interferometry for surface profile measurements |
JPH11211439A (ja) * | 1998-01-22 | 1999-08-06 | Takaoka Electric Mfg Co Ltd | 表面形状計測装置 |
US6549288B1 (en) * | 1998-05-14 | 2003-04-15 | Viewpoint Corp. | Structured-light, triangulation-based three-dimensional digitizer |
GB9901365D0 (en) * | 1999-01-22 | 1999-03-10 | Isis Innovations Ltd | Confocal microscopy apparatus and method |
US6268923B1 (en) | 1999-10-07 | 2001-07-31 | Integral Vision, Inc. | Optical method and system for measuring three-dimensional surface topography of an object having a surface contour |
FI20001568A (fi) * | 2000-06-30 | 2001-12-31 | Thermo Radiometrie Oy | Pinnan muotojen määrittäminen |
US6724489B2 (en) * | 2000-09-22 | 2004-04-20 | Daniel Freifeld | Three dimensional scanning camera |
US20020145734A1 (en) | 2001-02-09 | 2002-10-10 | Cory Watkins | Confocal 3D inspection system and process |
US6870609B2 (en) | 2001-02-09 | 2005-03-22 | August Technology Corp. | Confocal 3D inspection system and process |
US6893800B2 (en) | 2002-09-24 | 2005-05-17 | Agere Systems, Inc. | Substrate topography compensation at mask design: 3D OPC topography anchored |
US7126699B1 (en) | 2002-10-18 | 2006-10-24 | Kla-Tencor Technologies Corp. | Systems and methods for multi-dimensional metrology and/or inspection of a specimen |
US7286246B2 (en) * | 2003-03-31 | 2007-10-23 | Mitutoyo Corporation | Method and apparatus for non-contact three-dimensional surface measurement |
DE10321888A1 (de) | 2003-05-07 | 2004-12-02 | Universität Stuttgart | Messverfahren und Sensor, insbesondere zur optischen Abtastung bewegter Objekte |
US7680013B2 (en) * | 2005-11-29 | 2010-03-16 | Canon Kabushiki Kaisha | Optical information recording and reproducing apparatus |
JP2008003520A (ja) * | 2006-06-26 | 2008-01-10 | Toshiba Corp | フォトマスク及び半導体装置の製造方法 |
EP2084581B1 (en) * | 2006-11-01 | 2011-10-12 | InPhase Technologies, Inc. | Monocular holographic data storage device,system and method |
BRPI0914878A2 (pt) | 2008-06-05 | 2015-11-24 | Univ Boston | sistema e método para produzir uma imagem oticamente seccionada usando tanto iluminação estruturada quanto uniforme |
EP2442722B1 (en) * | 2009-06-16 | 2017-03-29 | Koninklijke Philips N.V. | Correction method for differential phase contrast imaging |
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EP2327956B1 (en) * | 2009-11-20 | 2014-01-22 | Mitutoyo Corporation | Method and apparatus for determining the height of a number of spatial positions on a sample |
CN102884395B (zh) * | 2010-05-07 | 2016-01-27 | 株式会社尼康 | 高度测量方法和高度测量装置 |
EP2437027A3 (de) * | 2010-10-03 | 2012-05-30 | Confovis GmbH | Vorrichtung und Verfahren zur dreidimensionalen optischen Abtastung einer Probe |
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-
2016
- 2016-11-04 PT PT168896397T patent/PT3411695T/pt unknown
- 2016-11-04 SG SG11201805467TA patent/SG11201805467TA/en unknown
- 2016-11-04 KR KR1020187025110A patent/KR102668017B1/ko active IP Right Grant
- 2016-11-04 CN CN202110901243.2A patent/CN113607088A/zh active Pending
- 2016-11-04 US US15/329,778 patent/US10634487B2/en active Active
- 2016-11-04 ES ES16889639T patent/ES2908695T3/es active Active
- 2016-11-04 MY MYPI2018001022A patent/MY196634A/en unknown
- 2016-11-04 EP EP21216084.0A patent/EP3998477A1/en active Pending
- 2016-11-04 CN CN201680080685.2A patent/CN108603848B/zh active Active
- 2016-11-04 SG SG10201912769PA patent/SG10201912769PA/en unknown
- 2016-11-04 EP EP16889639.7A patent/EP3411695B1/en active Active
- 2016-11-04 WO PCT/US2016/060599 patent/WO2017136011A2/en active Application Filing
- 2016-11-04 JP JP2018559667A patent/JP6846441B2/ja active Active
-
2017
- 2017-02-02 TW TW106103528A patent/TWI723129B/zh active
- 2017-02-02 TW TW110107224A patent/TWI775331B/zh active
-
2018
- 2018-07-26 PH PH12018501598A patent/PH12018501598A1/en unknown
-
2020
- 2020-03-02 US US16/806,076 patent/US11287248B2/en active Active
-
2021
- 2021-03-01 JP JP2021031926A patent/JP7166375B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR102668017B1 (ko) | 2024-05-21 |
US11287248B2 (en) | 2022-03-29 |
MY196634A (en) | 2023-04-25 |
ES2908695T3 (es) | 2022-05-03 |
US20180209784A1 (en) | 2018-07-26 |
EP3411695A4 (en) | 2019-10-02 |
JP2021081446A (ja) | 2021-05-27 |
EP3998477A1 (en) | 2022-05-18 |
WO2017136011A2 (en) | 2017-08-10 |
TWI775331B (zh) | 2022-08-21 |
JP6846441B2 (ja) | 2021-03-24 |
SG11201805467TA (en) | 2018-08-30 |
SG10201912769PA (en) | 2020-02-27 |
CN108603848A (zh) | 2018-09-28 |
JP7166375B2 (ja) | 2022-11-07 |
KR20180101612A (ko) | 2018-09-12 |
JP2019503499A (ja) | 2019-02-07 |
TW201732263A (zh) | 2017-09-16 |
TWI723129B (zh) | 2021-04-01 |
US20200217651A1 (en) | 2020-07-09 |
TW202127008A (zh) | 2021-07-16 |
EP3411695A2 (en) | 2018-12-12 |
CN108603848B (zh) | 2021-08-10 |
WO2017136011A3 (en) | 2018-02-22 |
US10634487B2 (en) | 2020-04-28 |
EP3411695B1 (en) | 2022-01-26 |
CN113607088A (zh) | 2021-11-05 |
PH12018501598A1 (en) | 2019-04-08 |
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