SG10201912769PA - Method and system for optical three-dimensional topography measurement - Google Patents
Method and system for optical three-dimensional topography measurementInfo
- Publication number
- SG10201912769PA SG10201912769PA SG10201912769PA SG10201912769PA SG10201912769PA SG 10201912769P A SG10201912769P A SG 10201912769PA SG 10201912769P A SG10201912769P A SG 10201912769PA SG 10201912769P A SG10201912769P A SG 10201912769PA SG 10201912769P A SG10201912769P A SG 10201912769PA
- Authority
- SG
- Singapore
- Prior art keywords
- optical
- dimensional topography
- topography measurement
- measurement
- dimensional
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2518—Projection by scanning of the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2513—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object with several lines being projected in more than one direction, e.g. grids, patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2518—Projection by scanning of the object
- G01B11/2522—Projection by scanning of the object the position of the object changing and being recorded
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/50—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images the image being built up from image elements distributed over a 3D volume, e.g. voxels
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/395—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers using a topographic target
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662289889P | 2016-02-01 | 2016-02-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201912769PA true SG10201912769PA (en) | 2020-02-27 |
Family
ID=59500792
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201912769PA SG10201912769PA (en) | 2016-02-01 | 2016-11-04 | Method and system for optical three-dimensional topography measurement |
| SG11201805467TA SG11201805467TA (en) | 2016-02-01 | 2016-11-04 | Method and system for optical three-dimensional topography measurement |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201805467TA SG11201805467TA (en) | 2016-02-01 | 2016-11-04 | Method and system for optical three-dimensional topography measurement |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US10634487B2 (en) |
| EP (2) | EP3998477A1 (en) |
| JP (2) | JP6846441B2 (en) |
| KR (1) | KR102668017B1 (en) |
| CN (2) | CN113607088A (en) |
| ES (1) | ES2908695T3 (en) |
| MY (1) | MY196634A (en) |
| PH (1) | PH12018501598A1 (en) |
| PT (1) | PT3411695T (en) |
| SG (2) | SG10201912769PA (en) |
| TW (2) | TWI775331B (en) |
| WO (1) | WO2017136011A2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6189984B2 (en) * | 2016-02-12 | 2017-08-30 | Ckd株式会社 | 3D measuring device |
| NL2020619B1 (en) * | 2018-01-16 | 2019-07-25 | Illumina Inc | Dual optical grating slide structured illumination imaging |
| KR102066129B1 (en) * | 2018-09-21 | 2020-01-14 | 한양대학교 산학협력단 | Apparatus and method for 3d information using dot array |
| KR102008890B1 (en) | 2019-01-25 | 2019-08-08 | 단국대학교 산학협력단 | Method of measuring 3d profile |
| KR102260563B1 (en) * | 2019-07-02 | 2021-06-07 | 한국과학기술연구원 | Structure illumination microscope-based on checkerboard pattern |
| US10921721B1 (en) * | 2019-09-13 | 2021-02-16 | Applied Materials, Inc. | Measurement system and grating pattern array |
| US11060138B1 (en) | 2020-01-17 | 2021-07-13 | Element Biosciences, Inc. | Nucleic acid sequencing systems |
| CN111721231B (en) * | 2020-06-03 | 2021-11-19 | 华东师范大学 | Plant ecological monitoring system based on optical frequency comb |
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| US5248876A (en) * | 1992-04-21 | 1993-09-28 | International Business Machines Corporation | Tandem linear scanning confocal imaging system with focal volumes at different heights |
| US5471303A (en) * | 1994-04-29 | 1995-11-28 | Wyko Corporation | Combination of white-light scanning and phase-shifting interferometry for surface profile measurements |
| JPH11211439A (en) * | 1998-01-22 | 1999-08-06 | Takaoka Electric Mfg Co Ltd | Surface form measuring device |
| AU3991799A (en) | 1998-05-14 | 1999-11-29 | Metacreations Corporation | Structured-light, triangulation-based three-dimensional digitizer |
| GB9901365D0 (en) * | 1999-01-22 | 1999-03-10 | Isis Innovations Ltd | Confocal microscopy apparatus and method |
| US6268923B1 (en) | 1999-10-07 | 2001-07-31 | Integral Vision, Inc. | Optical method and system for measuring three-dimensional surface topography of an object having a surface contour |
| FI20001568A (en) * | 2000-06-30 | 2001-12-31 | Thermo Radiometrie Oy | Determination of the shapes of a surface |
| US6724489B2 (en) * | 2000-09-22 | 2004-04-20 | Daniel Freifeld | Three dimensional scanning camera |
| US20020145734A1 (en) | 2001-02-09 | 2002-10-10 | Cory Watkins | Confocal 3D inspection system and process |
| US6870609B2 (en) | 2001-02-09 | 2005-03-22 | August Technology Corp. | Confocal 3D inspection system and process |
| US6893800B2 (en) | 2002-09-24 | 2005-05-17 | Agere Systems, Inc. | Substrate topography compensation at mask design: 3D OPC topography anchored |
| US7126699B1 (en) | 2002-10-18 | 2006-10-24 | Kla-Tencor Technologies Corp. | Systems and methods for multi-dimensional metrology and/or inspection of a specimen |
| US7286246B2 (en) * | 2003-03-31 | 2007-10-23 | Mitutoyo Corporation | Method and apparatus for non-contact three-dimensional surface measurement |
| DE10321888A1 (en) * | 2003-05-07 | 2004-12-02 | Universität Stuttgart | 3D optical metrology method in which a structured pattern is generated on an object surface and resultant virtual pixels measured with a white-light interferogram |
| US7680013B2 (en) * | 2005-11-29 | 2010-03-16 | Canon Kabushiki Kaisha | Optical information recording and reproducing apparatus |
| ATE528698T1 (en) * | 2006-11-01 | 2011-10-15 | Inphase Tech Inc | MONOCULAR HOLOGRAPHIC DATA STORAGE DEVICE, SYSTEM AND METHOD |
| ATE557367T1 (en) * | 2008-06-05 | 2012-05-15 | Univ Boston | SYSTEM AND METHOD FOR GENERATING AN OPTICALLY DIVIDED IMAGE USING BOTH STRUCTURED AND UNIFORM ILLUMINATION |
| US8855265B2 (en) * | 2009-06-16 | 2014-10-07 | Koninklijke Philips N.V. | Correction method for differential phase contrast imaging |
| CN102802520B (en) * | 2009-06-17 | 2015-04-01 | 3形状股份有限公司 | Focus Scanning Apparatus |
| JP5441840B2 (en) * | 2009-07-03 | 2014-03-12 | コー・ヤング・テクノロジー・インコーポレーテッド | 3D shape measuring device |
| KR101121982B1 (en) * | 2009-07-03 | 2012-03-09 | 주식회사 고영테크놀러지 | Three dimensional shape measuring apparatus |
| EP2327956B1 (en) * | 2009-11-20 | 2014-01-22 | Mitutoyo Corporation | Method and apparatus for determining the height of a number of spatial positions on a sample |
| WO2011138874A1 (en) * | 2010-05-07 | 2011-11-10 | 株式会社ニコン | Height measuring method and height measuring device |
| EP2437027A3 (en) * | 2010-10-03 | 2012-05-30 | Confovis GmbH | Device and method for three dimensional optical mapping of a sample |
| US8649024B2 (en) | 2010-12-03 | 2014-02-11 | Zygo Corporation | Non-contact surface characterization using modulated illumination |
| US10048480B2 (en) * | 2011-01-07 | 2018-08-14 | Zeta Instruments, Inc. | 3D microscope including insertable components to provide multiple imaging and measurement capabilities |
| US8610902B2 (en) * | 2011-06-02 | 2013-12-17 | Asm Technology Singapore Pte Ltd | Apparatus and method for inspecting an object with increased depth of field |
| DE102012017922B4 (en) * | 2012-09-11 | 2024-03-14 | Carl Zeiss Microscopy Gmbh | Optical arrangement and light microscope |
| US9255791B2 (en) * | 2012-09-28 | 2016-02-09 | The Board Of Trustees Of The University Of Illinois | Optically monitoring and controlling nanoscale topography |
| CN104180773B (en) | 2013-05-20 | 2017-07-21 | 沈阳同联集团高新技术有限公司 | A kind of apparatus for measuring three-dimensional profile |
| CN103292740B (en) * | 2013-05-24 | 2016-04-13 | 贵阳嘉瑜光电科技咨询中心 | A kind of 3-D scanning instrument measurement method and device thereof |
| EP2840353B1 (en) * | 2013-06-21 | 2019-08-07 | 3Shape A/S | Scanning apparatus with patterned probe light |
| CN103424795B (en) * | 2013-09-03 | 2015-10-28 | 苏州大学 | A kind of reflective spectro-grating and interference lithography system |
| TWI489101B (en) * | 2013-12-02 | 2015-06-21 | Ind Tech Res Inst | Apparatus and method for combining 3d and 2d measurement |
| SG11201605108VA (en) | 2014-01-09 | 2016-07-28 | Zygo Corp | Measuring topography of aspheric and other non-flat surfaces |
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| JP6682310B2 (en) * | 2016-03-18 | 2020-04-15 | キヤノン株式会社 | Focus detection apparatus and method, and imaging apparatus |
-
2016
- 2016-11-04 CN CN202110901243.2A patent/CN113607088A/en active Pending
- 2016-11-04 KR KR1020187025110A patent/KR102668017B1/en active IP Right Grant
- 2016-11-04 SG SG10201912769PA patent/SG10201912769PA/en unknown
- 2016-11-04 ES ES16889639T patent/ES2908695T3/en active Active
- 2016-11-04 JP JP2018559667A patent/JP6846441B2/en active Active
- 2016-11-04 CN CN201680080685.2A patent/CN108603848B/en active Active
- 2016-11-04 PT PT168896397T patent/PT3411695T/en unknown
- 2016-11-04 WO PCT/US2016/060599 patent/WO2017136011A2/en active Application Filing
- 2016-11-04 EP EP21216084.0A patent/EP3998477A1/en active Pending
- 2016-11-04 US US15/329,778 patent/US10634487B2/en active Active
- 2016-11-04 SG SG11201805467TA patent/SG11201805467TA/en unknown
- 2016-11-04 MY MYPI2018001022A patent/MY196634A/en unknown
- 2016-11-04 EP EP16889639.7A patent/EP3411695B1/en active Active
-
2017
- 2017-02-02 TW TW110107224A patent/TWI775331B/en active
- 2017-02-02 TW TW106103528A patent/TWI723129B/en active
-
2018
- 2018-07-26 PH PH12018501598A patent/PH12018501598A1/en unknown
-
2020
- 2020-03-02 US US16/806,076 patent/US11287248B2/en active Active
-
2021
- 2021-03-01 JP JP2021031926A patent/JP7166375B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019503499A (en) | 2019-02-07 |
| US10634487B2 (en) | 2020-04-28 |
| EP3998477A1 (en) | 2022-05-18 |
| US20180209784A1 (en) | 2018-07-26 |
| PT3411695T (en) | 2022-03-03 |
| WO2017136011A3 (en) | 2018-02-22 |
| CN113607088A (en) | 2021-11-05 |
| SG11201805467TA (en) | 2018-08-30 |
| JP2021081446A (en) | 2021-05-27 |
| TWI775331B (en) | 2022-08-21 |
| US20200217651A1 (en) | 2020-07-09 |
| EP3411695A2 (en) | 2018-12-12 |
| MY196634A (en) | 2023-04-25 |
| ES2908695T3 (en) | 2022-05-03 |
| EP3411695B1 (en) | 2022-01-26 |
| CN108603848B (en) | 2021-08-10 |
| PH12018501598A1 (en) | 2019-04-08 |
| JP7166375B2 (en) | 2022-11-07 |
| JP6846441B2 (en) | 2021-03-24 |
| TW201732263A (en) | 2017-09-16 |
| TW202127008A (en) | 2021-07-16 |
| US11287248B2 (en) | 2022-03-29 |
| WO2017136011A2 (en) | 2017-08-10 |
| EP3411695A4 (en) | 2019-10-02 |
| CN108603848A (en) | 2018-09-28 |
| KR20180101612A (en) | 2018-09-12 |
| TWI723129B (en) | 2021-04-01 |
| KR102668017B1 (en) | 2024-05-21 |
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