PT2338088E - Composição, processo de preparação e método de aplicação e de exposição para um papel de formação de imagens através de luz - Google Patents

Composição, processo de preparação e método de aplicação e de exposição para um papel de formação de imagens através de luz

Info

Publication number
PT2338088E
PT2338088E PT97445175T PT09744517T PT2338088E PT 2338088 E PT2338088 E PT 2338088E PT 97445175 T PT97445175 T PT 97445175T PT 09744517 T PT09744517 T PT 09744517T PT 2338088 E PT2338088 E PT 2338088E
Authority
PT
Portugal
Prior art keywords
dual energy
energy imaging
composition
exposure
preparation
Prior art date
Application number
PT97445175T
Other languages
English (en)
Inventor
Richard C Williams
Richard D Faber
Oleg Grinevich
John Malpert
Alexandre Mejiritski
Douglas C Neckers
Original Assignee
Int Paper Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Paper Co filed Critical Int Paper Co
Publication of PT2338088E publication Critical patent/PT2338088E/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/775—Photosensitive materials characterised by the base or auxiliary layers the base being of paper
    • G03C1/79—Macromolecular coatings or impregnations therefor, e.g. varnishes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Paper (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
PT97445175T 2008-10-15 2009-10-12 Composição, processo de preparação e método de aplicação e de exposição para um papel de formação de imagens através de luz PT2338088E (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19612708P 2008-10-15 2008-10-15

Publications (1)

Publication Number Publication Date
PT2338088E true PT2338088E (pt) 2013-01-08

Family

ID=41445601

Family Applications (2)

Application Number Title Priority Date Filing Date
PT120065628T PT2541322E (pt) 2008-10-15 2009-10-12 Composição, processo de preparação e método de aplicação e de exposição para um papel de fomação
PT97445175T PT2338088E (pt) 2008-10-15 2009-10-12 Composição, processo de preparação e método de aplicação e de exposição para um papel de formação de imagens através de luz

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PT120065628T PT2541322E (pt) 2008-10-15 2009-10-12 Composição, processo de preparação e método de aplicação e de exposição para um papel de fomação

Country Status (8)

Country Link
US (2) US8586280B2 (pt)
EP (2) EP2541322B1 (pt)
CN (1) CN102224458B (pt)
CA (1) CA2740695C (pt)
ES (2) ES2396050T3 (pt)
PL (2) PL2338088T3 (pt)
PT (2) PT2541322E (pt)
WO (1) WO2010045140A1 (pt)

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WO2010045137A1 (en) 2008-10-15 2010-04-22 International Paper Company Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light
WO2013100350A1 (en) 2011-12-28 2013-07-04 Samsung Electronics Co., Ltd. Image processing apparatus, upgrade apparatus, display system including the same, and control method thereof
US9540769B2 (en) 2013-03-11 2017-01-10 International Paper Company Method and apparatus for measuring and removing rotational variability from a nip pressure profile of a covered roll of a nip press
US10378980B2 (en) 2014-05-02 2019-08-13 International Paper Company Method and system associated with a sensing roll and a mating roll for collecting roll data
US9804044B2 (en) 2014-05-02 2017-10-31 International Paper Company Method and system associated with a sensing roll and a mating roll for collecting data including first and second sensor arrays
US9797788B2 (en) 2014-05-02 2017-10-24 International Paper Company Method and system associated with a sensing roll including pluralities of sensors and a mating roll for collecting roll data
TWI511871B (zh) * 2014-05-23 2015-12-11 Benq Materials Corp 製備彩色隱形眼鏡之方法
US9677225B2 (en) 2015-06-10 2017-06-13 International Paper Company Monitoring applicator rods
US9534970B1 (en) 2015-06-10 2017-01-03 International Paper Company Monitoring oscillating components
US9816232B2 (en) 2015-06-10 2017-11-14 International Paper Company Monitoring upstream machine wires and felts
US10370795B2 (en) 2015-06-10 2019-08-06 International Paper Company Monitoring applicator rods and applicator rod nips
US9696226B2 (en) 2015-06-10 2017-07-04 International Paper Company Count-based monitoring machine wires and felts
US9863827B2 (en) 2015-06-10 2018-01-09 International Paper Company Monitoring machine wires and felts

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US3390994A (en) 1966-02-17 1968-07-02 Du Pont Photodeactivatable light-sensitive color-forming composition
BE756378A (fr) 1969-09-18 1971-03-01 Eastman Kodak Co Composition et produit photosensibles contenant des photo-oxydants
US3658543A (en) 1970-12-18 1972-04-25 Du Pont Dual response photosensitive composition containing acyl ester of triethanolamine
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Also Published As

Publication number Publication date
EP2338088A1 (en) 2011-06-29
WO2010045140A1 (en) 2010-04-22
US20140080057A1 (en) 2014-03-20
PL2338088T3 (pl) 2013-02-28
CN102224458B (zh) 2013-04-24
US20110250545A1 (en) 2011-10-13
US8586280B2 (en) 2013-11-19
EP2338088B1 (en) 2012-09-19
EP2541322A1 (en) 2013-01-02
PT2541322E (pt) 2015-11-26
CA2740695C (en) 2013-06-18
PL2541322T3 (pl) 2016-02-29
ES2396050T3 (es) 2013-02-18
ES2552855T3 (es) 2015-12-02
CN102224458A (zh) 2011-10-19
EP2541322B1 (en) 2015-08-12
CA2740695A1 (en) 2010-04-22

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