PL429994A1 - Wzorzec rozkładu współczynnika załamania - Google Patents

Wzorzec rozkładu współczynnika załamania

Info

Publication number
PL429994A1
PL429994A1 PL429994A PL42999419A PL429994A1 PL 429994 A1 PL429994 A1 PL 429994A1 PL 429994 A PL429994 A PL 429994A PL 42999419 A PL42999419 A PL 42999419A PL 429994 A1 PL429994 A1 PL 429994A1
Authority
PL
Poland
Prior art keywords
refractive index
distribution pattern
index distribution
areas
base medium
Prior art date
Application number
PL429994A
Other languages
English (en)
Other versions
PL237684B1 (pl
Inventor
Michał ZIEMCZONOK
Arkadiusz KUŚ
Małgorzata KUJAWIŃSKA
Original Assignee
Politechnika Warszawska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Warszawska filed Critical Politechnika Warszawska
Priority to PL429994A priority Critical patent/PL237684B1/pl
Priority to EP20743755.9A priority patent/EP3973269B1/en
Priority to JP2021569066A priority patent/JP7414305B2/ja
Priority to US17/595,574 priority patent/US12326401B2/en
Priority to PCT/IB2020/054772 priority patent/WO2020234791A1/en
Publication of PL429994A1 publication Critical patent/PL429994A1/pl
Publication of PL237684B1 publication Critical patent/PL237684B1/pl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G01N21/278—Constitution of standards
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G01N2201/13—Standards, constitution

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)

Abstract

Wzorzec rozkładu współczynnika załamania przedstawiony na rysunku w formie trójwymiarowego obiektu, który w swojej objętości zawiera ośrodek bazowy i obszary o zmiennej wielkości i odległości, o innym współczynniku załamania niż współczynnik załamania dla ośrodka bazowego, charakteryzujący się tym, że różnica współczynnika załamania tych obszarów względem współczynnika załamania ośrodka bazowego nie jest większa niż 0,04, co najmniej jeden z obszarów stanowi zestaw co najmniej dwóch graniastosłupów lub walców lub współosiowych pierścieni o zmiennej wielkości i odległości, o wymiarze przynajmniej w jednym kierunku zbliżonym do zdolności rozdzielczej układu pomiarowego podlegającego ocenie oraz co najmniej jeden z obszarów ma kształt zbliżony do elipsoidy albo kuli.
PL429994A 2019-05-21 2019-05-21 Wzorzec rozkładu współczynnika załamania PL237684B1 (pl)

Priority Applications (5)

Application Number Priority Date Filing Date Title
PL429994A PL237684B1 (pl) 2019-05-21 2019-05-21 Wzorzec rozkładu współczynnika załamania
EP20743755.9A EP3973269B1 (en) 2019-05-21 2020-05-20 Refractive index distribution standard
JP2021569066A JP7414305B2 (ja) 2019-05-21 2020-05-20 屈折率分布式の標準器
US17/595,574 US12326401B2 (en) 2019-05-21 2020-05-20 Refractive index distribution standard
PCT/IB2020/054772 WO2020234791A1 (en) 2019-05-21 2020-05-20 Refractive index distribution standard

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL429994A PL237684B1 (pl) 2019-05-21 2019-05-21 Wzorzec rozkładu współczynnika załamania

Publications (2)

Publication Number Publication Date
PL429994A1 true PL429994A1 (pl) 2020-11-30
PL237684B1 PL237684B1 (pl) 2021-05-17

Family

ID=71738176

Family Applications (1)

Application Number Title Priority Date Filing Date
PL429994A PL237684B1 (pl) 2019-05-21 2019-05-21 Wzorzec rozkładu współczynnika załamania

Country Status (5)

Country Link
US (1) US12326401B2 (pl)
EP (1) EP3973269B1 (pl)
JP (1) JP7414305B2 (pl)
PL (1) PL237684B1 (pl)
WO (1) WO2020234791A1 (pl)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2326322C (en) * 1998-04-21 2011-03-01 University Of Connecticut Free-form nanofabrication using multi-photon excitation
US7790353B2 (en) * 2000-06-15 2010-09-07 3M Innovative Properties Company Multidirectional photoreactive absorption method
AU2001268465A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
US7800746B2 (en) * 2006-08-11 2010-09-21 Northwestern University Method for identifying refractive-index fluctuations of a target
US7570362B2 (en) * 2007-09-28 2009-08-04 Olympus Corporation Optical measurement apparatus utilizing total reflection
US8791985B2 (en) * 2007-10-30 2014-07-29 New York University Tracking and characterizing particles with holographic video microscopy
GB0721564D0 (en) * 2007-11-02 2007-12-12 Ge Healthcare Uk Ltd Microscopy imaging phantoms
JP2010054623A (ja) * 2008-08-26 2010-03-11 Ricoh Co Ltd 二光子吸収材料とその用途
EP2389606B1 (en) * 2009-01-24 2019-08-28 Ecole Polytechnique Federale De Lausanne (EPFL) EPFL-TTO High-resolution microscopy and photolithography devices using focusing micromirrors
WO2013126554A1 (en) * 2012-02-24 2013-08-29 New York University Holographic microrefractometer
US8823927B2 (en) * 2012-05-10 2014-09-02 National Applied Research Laboratories System and method for nondestructive measuring refractive index and thickness of lens
US9562846B2 (en) * 2013-07-10 2017-02-07 Kla-Tencor Corporation Particle suspensions used as low-contrast standards for inspection of liquids
US11085864B2 (en) * 2014-11-12 2021-08-10 New York University Colloidal fingerprints for soft materials using total holographic characterization
JP2016195641A (ja) * 2015-04-02 2016-11-24 キヤノン株式会社 ファントム
US10413920B2 (en) * 2015-06-29 2019-09-17 Arizona Board Of Regents On Behalf Of Arizona State University Nozzle apparatus and two-photon laser lithography for fabrication of XFEL sample injectors
KR101716125B1 (ko) * 2015-07-20 2017-03-15 주식회사 토모큐브 파면 제어기를 활용한 초고속 고정밀 3차원 굴절률 측정 방법 및 장치
JP6789173B2 (ja) * 2017-04-26 2020-11-25 株式会社日立製作所 超音波測定用ファントムおよび超音波ｃｔ装置

Also Published As

Publication number Publication date
JP2022533712A (ja) 2022-07-25
PL237684B1 (pl) 2021-05-17
US20220228979A1 (en) 2022-07-21
WO2020234791A1 (en) 2020-11-26
EP3973269A1 (en) 2022-03-30
JP7414305B2 (ja) 2024-01-16
EP3973269B1 (en) 2024-08-07
EP3973269C0 (en) 2024-08-07
US12326401B2 (en) 2025-06-10

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