PL4212962T3 - Sposób i urządzenie do określania stanu nagrzania elementu optycznego w układzie optycznym do mikrolitografii - Google Patents

Sposób i urządzenie do określania stanu nagrzania elementu optycznego w układzie optycznym do mikrolitografii

Info

Publication number
PL4212962T3
PL4212962T3 PL23156248.9T PL23156248T PL4212962T3 PL 4212962 T3 PL4212962 T3 PL 4212962T3 PL 23156248 T PL23156248 T PL 23156248T PL 4212962 T3 PL4212962 T3 PL 4212962T3
Authority
PL
Poland
Prior art keywords
microlithography
determining
heating state
optical system
optical element
Prior art date
Application number
PL23156248.9T
Other languages
English (en)
Inventor
Toralf Gruner
Joachim Hartjes
Markus Hauf
Gerhard Beurer
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Publication of PL4212962T3 publication Critical patent/PL4212962T3/pl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/04—Casings
    • G01J5/047—Mobile mounting; Scanning arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/07—Arrangements for adjusting the solid angle of collected radiation, e.g. adjusting or orienting field of view, tracking position or encoding angular position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0806—Focusing or collimating elements, e.g. lenses or concave mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0831—Masks; Aperture plates; Spatial light modulators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/084—Adjustable or slidable
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/001—Axicons, waxicons, reflaxicons
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
PL23156248.9T 2018-07-25 2019-05-16 Sposób i urządzenie do określania stanu nagrzania elementu optycznego w układzie optycznym do mikrolitografii PL4212962T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102018212400.0A DE102018212400A1 (de) 2018-07-25 2018-07-25 Verfahren und Vorrichtung zum Bestimmen des Erwärmungszustandes eines optischen Elements in einem optischen System für die Mikrolithographie

Publications (1)

Publication Number Publication Date
PL4212962T3 true PL4212962T3 (pl) 2024-07-22

Family

ID=66685583

Family Applications (1)

Application Number Title Priority Date Filing Date
PL23156248.9T PL4212962T3 (pl) 2018-07-25 2019-05-16 Sposób i urządzenie do określania stanu nagrzania elementu optycznego w układzie optycznym do mikrolitografii

Country Status (8)

Country Link
US (1) US11320314B2 (pl)
EP (2) EP3827312B9 (pl)
KR (1) KR20210035181A (pl)
CN (1) CN112513739A (pl)
DE (1) DE102018212400A1 (pl)
ES (1) ES2961032T3 (pl)
PL (1) PL4212962T3 (pl)
WO (1) WO2020020506A1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020203753A1 (de) * 2020-03-24 2021-09-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
EP4086702A1 (en) * 2021-05-03 2022-11-09 ASML Netherlands B.V. Temperature measurement of optical elements in an optical apparatus

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2508494A1 (de) 1975-02-27 1976-09-02 Hansrichard Dipl Phys D Schulz Anordnung zum fokussieren von elektromagnetischen oder mechanischen wellen
DE3605737A1 (de) 1986-02-22 1987-08-27 Battelle Institut E V Verfahren und vorrichtung zur beruehrungslosen temperaturmessung
JPH02181416A (ja) * 1989-01-06 1990-07-16 Hitachi Ltd 縮小投影露光装置
US5388909A (en) * 1993-09-16 1995-02-14 Johnson; Shane R. Optical apparatus and method for measuring temperature of a substrate material with a temperature dependent band gap
EP1109067B1 (en) * 1999-12-13 2006-05-24 ASML Netherlands B.V. Illuminator
KR101159867B1 (ko) * 2003-09-12 2012-06-26 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노출 장치용 조명 시스템
WO2006021419A2 (en) * 2004-08-23 2006-03-02 Carl Zeiss Smt Ag Illumination system of a microlithographic exposure apparatus
DE102005004460A1 (de) * 2005-02-01 2006-08-10 Carl Zeiss Smt Ag Verfahren und Messmittel zur indirekten Bestimmung der örtlichen Bestrahlungsstärke in einem optischen System
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
KR101670518B1 (ko) 2007-10-09 2016-10-28 칼 짜이스 에스엠테 게엠베하 광학 소자의 온도 제어 장치
DE102011081259A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Anordnung zur Spiegeltemperaturmessung und/oder zur thermischen Aktuierung eines Spiegels in einer mikrolithographischen Projektionsbelichtungsanlage
DE102011085132A1 (de) * 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Optische Baugruppe für die Projektionslithografie
DE102013215197A1 (de) * 2013-08-02 2014-06-12 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit temperierbaren optischen Elementen und Verfahren zum Betrieb einer derartigen Anlage
DE102015200328A1 (de) 2015-01-13 2016-07-14 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines optischen Elements für ein optisches System, insbesondere für einemikrolithographische Projektionsbelichtungsanlage
JP7030538B2 (ja) * 2018-01-22 2022-03-07 キヤノン株式会社 撮像装置及びその制御方法及びレンズユニット
DE102018207126A1 (de) * 2018-05-08 2018-06-21 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Bestimmung der Temperaturverteilung über die optische Fläche eines optischen Elementes
DE102018216628A1 (de) 2018-09-27 2020-04-02 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Bestimmen des Erwärmungszustandes eines optischen Elements in einem optischen System für die Mikrolithographie

Also Published As

Publication number Publication date
ES2961032T3 (es) 2024-03-07
EP3827312B1 (de) 2023-07-05
EP3827312C0 (de) 2023-07-05
EP3827312B9 (de) 2023-10-11
US20210148762A1 (en) 2021-05-20
CN112513739A (zh) 2021-03-16
EP4212962A1 (de) 2023-07-19
EP4212962B1 (de) 2024-02-28
WO2020020506A1 (de) 2020-01-30
US11320314B2 (en) 2022-05-03
DE102018212400A1 (de) 2020-01-30
KR20210035181A (ko) 2021-03-31
EP4212962C0 (de) 2024-02-28
EP3827312A1 (de) 2021-06-02

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