PL421072A1 - Sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym, powierzchnia otrzymana tym sposobem i jej zastosowanie - Google Patents

Sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym, powierzchnia otrzymana tym sposobem i jej zastosowanie

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Publication number
PL421072A1
PL421072A1 PL421072A PL42107217A PL421072A1 PL 421072 A1 PL421072 A1 PL 421072A1 PL 421072 A PL421072 A PL 421072A PL 42107217 A PL42107217 A PL 42107217A PL 421072 A1 PL421072 A1 PL 421072A1
Authority
PL
Poland
Prior art keywords
working electrode
application
metal nanoparticles
depositing metal
eloctrochemical
Prior art date
Application number
PL421072A
Other languages
English (en)
Other versions
PL238322B1 (pl
Inventor
Monika Księżopolska-Gocalska
Paweł Albrycht
Ewa Różniecka
Joanna Niedziółka-Jönsson
Marta Podrażka
Robert HOŁYST
Original Assignee
Instytut Chemii Fizycznej Polskiej Akademii Nauk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Instytut Chemii Fizycznej Polskiej Akademii Nauk filed Critical Instytut Chemii Fizycznej Polskiej Akademii Nauk
Priority to PL421072A priority Critical patent/PL238322B1/pl
Priority to EP18165322.1A priority patent/EP3382063A3/en
Publication of PL421072A1 publication Critical patent/PL421072A1/pl
Publication of PL238322B1 publication Critical patent/PL238322B1/pl

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/02—Heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G01N21/553—Attenuated total reflection and using surface plasmons
    • G01N21/554—Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/46—Electroplating: Baths therefor from solutions of silver
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/48—Electroplating: Baths therefor from solutions of gold

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Nanotechnology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

Przedmiotem zgłoszenia jest sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym przy użyciu elektrody pracującej, odniesienia i pomocniczej, w którym powierzchnia stanowi elektrodę pracującą i jest przynajmniej częściowo zanurzona w roztworze wodnym zawierającym jony metalu, tworzącym roztwór elektrolitu, nanocząstki osadza się na powierzchni elektrody pracującej pod wpływem przyłożonego do niej zmiennego w czasie potencjału elektrycznego, zaś przed rozpoczęciem procesu elektrochemicznego roztwór elektrolitu ogrzewany jest do temperatury w zakresie od 5°C do 80°C, charakteryzujący się tym, że elektroda pracująca ustawiona jest pod kątem od 45° do 110° w stosunku do elektrody pomocniczej, przyłożony potencjał elektryczny jest zmienny w czasie w sposób skokowy oraz że powierzchnia aktywna na elektrodzie pracującej jest ograniczona. Zgłoszenie obejmuje również powierzchnię uzyskaną tym sposobem oraz jej zastosowanie.
PL421072A 2017-03-31 2017-03-31 Sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym, powierzchnia otrzymana tym sposobem i jej zastosowanie PL238322B1 (pl)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PL421072A PL238322B1 (pl) 2017-03-31 2017-03-31 Sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym, powierzchnia otrzymana tym sposobem i jej zastosowanie
EP18165322.1A EP3382063A3 (en) 2017-03-31 2018-03-30 A method of depositing metal nanoparticles on a surface in an electrochemical process, the surface obtained by this method and its application

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL421072A PL238322B1 (pl) 2017-03-31 2017-03-31 Sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym, powierzchnia otrzymana tym sposobem i jej zastosowanie

Publications (2)

Publication Number Publication Date
PL421072A1 true PL421072A1 (pl) 2018-10-08
PL238322B1 PL238322B1 (pl) 2021-08-09

Family

ID=62217716

Family Applications (1)

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PL421072A PL238322B1 (pl) 2017-03-31 2017-03-31 Sposób osadzania nanocząstek metalu na powierzchni w procesie elektrochemicznym, powierzchnia otrzymana tym sposobem i jej zastosowanie

Country Status (2)

Country Link
EP (1) EP3382063A3 (pl)
PL (1) PL238322B1 (pl)

Cited By (1)

* Cited by examiner, † Cited by third party
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CN114216876A (zh) * 2021-08-23 2022-03-22 南开大学 一种表面增强红外基底制备及纳米柱阵列偏离角检测方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
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CN110106537A (zh) * 2019-06-26 2019-08-09 浙江金卓首饰有限公司 一种用于制备3d硬金的电铸液和3d硬金的制备方法
US11299814B2 (en) * 2019-10-30 2022-04-12 City University Of Hong Kong Method for treating a surface of a metallic structure
CN111518874A (zh) * 2020-06-10 2020-08-11 青岛科技大学 一种拉曼增强基底及其制备方法和检测miRNA的方法
CN114082971A (zh) * 2020-08-05 2022-02-25 上海交通大学 手性金属纳米螺旋纤维阵列的制备方法及应用
WO2023073728A1 (en) * 2021-10-29 2023-05-04 Council Of Scientific And Industrial Research A raman signal enhancing substrate (sensor) for trace level detection and a method of fabrication thereof
CN115090872B (zh) * 2022-06-17 2024-02-20 安徽大学 一种银微纳结构及其制备方法和用途

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL220942B3 (pl) * 2010-09-14 2016-01-29 Inst Chemii Fizycznej Polskiej Akademii Nauk Sposób osadzania nanocząstek metalu na powierzchni

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114216876A (zh) * 2021-08-23 2022-03-22 南开大学 一种表面增强红外基底制备及纳米柱阵列偏离角检测方法
CN114216876B (zh) * 2021-08-23 2023-08-11 南开大学 一种表面增强红外基底制备及纳米柱阵列偏离角检测方法

Also Published As

Publication number Publication date
EP3382063A3 (en) 2018-10-17
EP3382063A2 (en) 2018-10-03
PL238322B1 (pl) 2021-08-09

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