PL3844142T3 - Czwartorzędowe wodorotlenki amoniowe poliamin - Google Patents
Czwartorzędowe wodorotlenki amoniowe poliaminInfo
- Publication number
- PL3844142T3 PL3844142T3 PL19856217.5T PL19856217T PL3844142T3 PL 3844142 T3 PL3844142 T3 PL 3844142T3 PL 19856217 T PL19856217 T PL 19856217T PL 3844142 T3 PL3844142 T3 PL 3844142T3
- Authority
- PL
- Poland
- Prior art keywords
- polyamines
- quaternary ammonium
- ammonium hydroxides
- hydroxides
- quaternary
- Prior art date
Links
- 235000011114 ammonium hydroxide Nutrition 0.000 title 1
- 229920000768 polyamine Polymers 0.000 title 1
- 125000001453 quaternary ammonium group Chemical group 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C213/04—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reaction of ammonia or amines with olefin oxides or halohydrins
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C215/00—Compounds containing amino and hydroxy groups bound to the same carbon skeleton
- C07C215/02—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C215/40—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton with quaternised nitrogen atoms bound to carbon atoms of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C217/00—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
- C07C217/02—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C217/04—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C217/28—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having one amino group and at least two singly-bound oxygen atoms, with at least one being part of an etherified hydroxy group, bound to the carbon skeleton, e.g. ethers of polyhydroxy amines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/084—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/088—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/125—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/13—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/16—Metals
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862724849P | 2018-08-30 | 2018-08-30 | |
| PCT/US2019/043862 WO2020046515A1 (en) | 2018-08-30 | 2019-07-29 | Quaternary ammonium hydroxides of polyamines |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3844142T3 true PL3844142T3 (pl) | 2024-12-02 |
Family
ID=69643030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL19856217.5T PL3844142T3 (pl) | 2018-08-30 | 2019-07-29 | Czwartorzędowe wodorotlenki amoniowe poliamin |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US12077730B2 (pl) |
| EP (1) | EP3844142B1 (pl) |
| JP (2) | JP2021536517A (pl) |
| KR (1) | KR102823013B1 (pl) |
| CN (1) | CN112638863B (pl) |
| CA (1) | CA3110457A1 (pl) |
| ES (1) | ES2998195T3 (pl) |
| HU (1) | HUE068743T2 (pl) |
| IL (1) | IL281049B2 (pl) |
| PL (1) | PL3844142T3 (pl) |
| WO (1) | WO2020046515A1 (pl) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102669766B1 (ko) * | 2019-08-27 | 2024-05-28 | 가부시끼가이샤 레조낙 | 조성물, 및 접착성 폴리머의 세정 방법 |
| WO2021211708A1 (en) * | 2020-04-14 | 2021-10-21 | Entegris, Inc. | Method and composition for etching molybdenum |
| KR102935525B1 (ko) * | 2020-08-13 | 2026-03-06 | 엔테그리스, 아이엔씨. | 니트라이드 에천트 조성물 및 방법 |
| CN113248964A (zh) * | 2021-06-11 | 2021-08-13 | 湖北格林斯柏体育产业(集团)有限公司 | 一种高光泽耐黄变的环保型水性面漆固化剂及制备工艺 |
| WO2023102167A1 (en) * | 2021-12-03 | 2023-06-08 | Huntsman Petrochemical Llc | Production of anhydrous quaternary ammonium hydroxides |
| US20240390839A1 (en) * | 2023-05-22 | 2024-11-28 | Halliburton Energy Services, Inc. | Chemical Additives For Direct Air Carbon Capture |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2096534A (en) * | 1937-10-19 | Quaternary ammonium compounds | ||
| US2695314A (en) * | 1951-08-25 | 1954-11-23 | Monsanto Chemicals | Hydroxyethylated-n-keryl alkylenediamines |
| US2766288A (en) * | 1952-11-12 | 1956-10-09 | Gen Mills Inc | Bis-tertiary aminoalkoxy alkanes |
| US2717909A (en) * | 1953-09-24 | 1955-09-13 | Monsanto Chemicals | Hydroxyethyl-keryl-alkylene-ammonium compounds |
| GB1028561A (en) * | 1962-09-05 | 1966-05-04 | Unilever Ltd | Alkali metal organic nitrogen base silicates |
| US3334138A (en) * | 1963-08-02 | 1967-08-01 | Crompton & Knowles Corp | Polymeric quaternary ammonium compound |
| US3281452A (en) * | 1963-12-23 | 1966-10-25 | Coastal Interchemical Company | Polycyano quaternary ammonium compounds |
| US4778813A (en) * | 1981-07-07 | 1988-10-18 | Buckman Laboratories International, Inc. | Polymeric quaternary ammonium compounds, their preparation and use |
| JPS59134752A (ja) * | 1983-01-18 | 1984-08-02 | Sanyo Chem Ind Ltd | 第４級アンモニウム水酸化物の組成物 |
| JPS609980A (ja) * | 1983-06-30 | 1985-01-19 | 花王株式会社 | 繊維の染色性向上剤 |
| KR100269013B1 (ko) * | 1995-11-15 | 2000-11-01 | 이노우에 노리유끼 | 웨이퍼 처리액 및 그 제조방법 |
| US7135445B2 (en) | 2001-12-04 | 2006-11-14 | Ekc Technology, Inc. | Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials |
| DE10001831A1 (de) | 2000-01-18 | 2001-08-16 | Keimfarben Gmbh & Co Kg | Silikatische Beschichtungsmasse mit verbesserter Stabilität |
| KR100363271B1 (ko) | 2000-06-12 | 2002-12-05 | 주식회사 동진쎄미켐 | 포토레지스트 리무버 조성물 |
| JP4184672B2 (ja) * | 2001-02-19 | 2008-11-19 | 日本乳化剤株式会社 | 第４級アンモニウム水酸化物含有組成物及びその製造法 |
| US7668200B2 (en) | 2003-06-30 | 2010-02-23 | Broadcom Corporation | Apparatus and method for latency control in a communications system |
| CA2544198C (en) | 2003-10-29 | 2011-07-26 | Mallinckrodt Baker, Inc. | Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| US7498295B2 (en) | 2004-02-12 | 2009-03-03 | Air Liquide Electronics U.S. Lp | Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide |
| JP4369284B2 (ja) * | 2004-04-19 | 2009-11-18 | 東友ファインケム株式会社 | レジスト剥離剤 |
| WO2006056298A1 (en) | 2004-11-25 | 2006-06-01 | Basf Aktiengesellschaft | Resist stripper and residue remover for cleaning copper surfaces in semiconductor processing |
| JP2011507236A (ja) | 2007-12-07 | 2011-03-03 | フォンタナ・テクノロジー | ウェーハを洗浄するための方法および組成物 |
| US7825079B2 (en) | 2008-05-12 | 2010-11-02 | Ekc Technology, Inc. | Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixture |
| US8765653B2 (en) | 2009-07-07 | 2014-07-01 | Air Products And Chemicals, Inc. | Formulations and method for post-CMP cleaning |
| TWI513815B (zh) | 2010-01-29 | 2015-12-21 | 安堤格里斯公司 | 供附有金屬佈線之半導體用清洗劑 |
| KR101762501B1 (ko) * | 2015-07-09 | 2017-07-31 | 포항공과대학교 산학협력단 | 유기구조유도물질이 골격에 결합되어 있는 새로운 유무기 혼합 분자체 및 그 제조방법 |
| CN107586589A (zh) | 2016-07-08 | 2018-01-16 | 天津市澳路浦润滑科技股份有限公司 | 一种半导体硅材料水基切削液 |
| WO2019222127A1 (en) * | 2018-05-16 | 2019-11-21 | Huntsman Petrochemical Llc | Quaternary ammonium hydroxides of polyamines |
-
2019
- 2019-07-29 PL PL19856217.5T patent/PL3844142T3/pl unknown
- 2019-07-29 WO PCT/US2019/043862 patent/WO2020046515A1/en not_active Ceased
- 2019-07-29 CA CA3110457A patent/CA3110457A1/en active Pending
- 2019-07-29 EP EP19856217.5A patent/EP3844142B1/en active Active
- 2019-07-29 HU HUE19856217A patent/HUE068743T2/hu unknown
- 2019-07-29 KR KR1020217009290A patent/KR102823013B1/ko active Active
- 2019-07-29 ES ES19856217T patent/ES2998195T3/es active Active
- 2019-07-29 US US17/270,881 patent/US12077730B2/en active Active
- 2019-07-29 CN CN201980056493.1A patent/CN112638863B/zh active Active
- 2019-07-29 JP JP2021510429A patent/JP2021536517A/ja active Pending
- 2019-07-29 IL IL281049A patent/IL281049B2/en unknown
-
2024
- 2024-01-04 JP JP2024000119A patent/JP2024038244A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020046515A1 (en) | 2020-03-05 |
| CN112638863A (zh) | 2021-04-09 |
| US20210179972A1 (en) | 2021-06-17 |
| EP3844142A4 (en) | 2022-07-06 |
| IL281049B2 (en) | 2025-01-01 |
| IL281049A (en) | 2021-04-29 |
| KR20210062641A (ko) | 2021-05-31 |
| IL281049B1 (en) | 2024-09-01 |
| KR102823013B1 (ko) | 2025-06-20 |
| CA3110457A1 (en) | 2020-03-05 |
| JP2024038244A (ja) | 2024-03-19 |
| US12077730B2 (en) | 2024-09-03 |
| ES2998195T3 (en) | 2025-02-19 |
| EP3844142B1 (en) | 2024-09-11 |
| EP3844142A1 (en) | 2021-07-07 |
| CN112638863B (zh) | 2023-11-07 |
| JP2021536517A (ja) | 2021-12-27 |
| HUE068743T2 (hu) | 2025-01-28 |
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