CN112638863B - 多胺的季铵碱 - Google Patents
多胺的季铵碱 Download PDFInfo
- Publication number
- CN112638863B CN112638863B CN201980056493.1A CN201980056493A CN112638863B CN 112638863 B CN112638863 B CN 112638863B CN 201980056493 A CN201980056493 A CN 201980056493A CN 112638863 B CN112638863 B CN 112638863B
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- CN
- China
- Prior art keywords
- quaternary ammonium
- acid
- hydroxide
- composition
- ammonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000001453 quaternary ammonium group Chemical group 0.000 title claims abstract description 54
- 229920000768 polyamine Polymers 0.000 title claims abstract description 26
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 21
- 239000002184 metal Substances 0.000 claims abstract description 21
- 239000000908 ammonium hydroxide Substances 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims abstract description 11
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 64
- 229910052757 nitrogen Inorganic materials 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- 150000001412 amines Chemical class 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 3
- 239000002585 base Substances 0.000 description 37
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 25
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 24
- 239000000243 solution Substances 0.000 description 16
- -1 low toxicity Chemical compound 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 13
- HMBHAQMOBKLWRX-UHFFFAOYSA-N 2,3-dihydro-1,4-benzodioxine-3-carboxylic acid Chemical compound C1=CC=C2OC(C(=O)O)COC2=C1 HMBHAQMOBKLWRX-UHFFFAOYSA-N 0.000 description 12
- 229940075419 choline hydroxide Drugs 0.000 description 12
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 11
- KBKZYWOOZPIUJT-UHFFFAOYSA-N azane;hypochlorous acid Chemical compound N.ClO KBKZYWOOZPIUJT-UHFFFAOYSA-N 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 10
- UKODFQOELJFMII-UHFFFAOYSA-N pentamethyldiethylenetriamine Chemical compound CN(C)CCN(C)CCN(C)C UKODFQOELJFMII-UHFFFAOYSA-N 0.000 description 9
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 8
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 239000007800 oxidant agent Substances 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 239000002738 chelating agent Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000004448 titration Methods 0.000 description 5
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000012964 benzotriazole Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000002210 silicon-based material Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 150000003512 tertiary amines Chemical group 0.000 description 4
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 4
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- GTEXIOINCJRBIO-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]-n,n-dimethylethanamine Chemical compound CN(C)CCOCCN(C)C GTEXIOINCJRBIO-UHFFFAOYSA-N 0.000 description 3
- BYACHAOCSIPLCM-UHFFFAOYSA-N 2-[2-[bis(2-hydroxyethyl)amino]ethyl-(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(CCO)CCN(CCO)CCO BYACHAOCSIPLCM-UHFFFAOYSA-N 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 229960001927 cetylpyridinium chloride Drugs 0.000 description 3
- YMKDRGPMQRFJGP-UHFFFAOYSA-M cetylpyridinium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 YMKDRGPMQRFJGP-UHFFFAOYSA-M 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 3
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- BAERPNBPLZWCES-UHFFFAOYSA-N (2-hydroxy-1-phosphonoethyl)phosphonic acid Chemical compound OCC(P(O)(O)=O)P(O)(O)=O BAERPNBPLZWCES-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 2
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- WZUUZPAYWFIBDF-UHFFFAOYSA-N 5-amino-1,2-dihydro-1,2,4-triazole-3-thione Chemical compound NC1=NNC(S)=N1 WZUUZPAYWFIBDF-UHFFFAOYSA-N 0.000 description 2
- GDGIVSREGUOIJZ-UHFFFAOYSA-N 5-amino-3h-1,3,4-thiadiazole-2-thione Chemical compound NC1=NN=C(S)S1 GDGIVSREGUOIJZ-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- XZGLNCKSNVGDNX-UHFFFAOYSA-N 5-methyl-2h-tetrazole Chemical compound CC=1N=NNN=1 XZGLNCKSNVGDNX-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- CXRFDZFCGOPDTD-UHFFFAOYSA-M Cetrimide Chemical compound [Br-].CCCCCCCCCCCCCC[N+](C)(C)C CXRFDZFCGOPDTD-UHFFFAOYSA-M 0.000 description 2
- 229910020366 ClO 4 Inorganic materials 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- CWRVKFFCRWGWCS-UHFFFAOYSA-N Pentrazole Chemical compound C1CCCCC2=NN=NN21 CWRVKFFCRWGWCS-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- OIRDTQYFTABQOQ-KQYNXXCUSA-N adenosine Chemical compound C1=NC=2C(N)=NC=NC=2N1[C@@H]1O[C@H](CO)[C@@H](O)[C@H]1O OIRDTQYFTABQOQ-KQYNXXCUSA-N 0.000 description 2
- QQQCWVDPMPFUGF-ZDUSSCGKSA-N alpinetin Chemical compound C1([C@H]2OC=3C=C(O)C=C(C=3C(=O)C2)OC)=CC=CC=C1 QQQCWVDPMPFUGF-ZDUSSCGKSA-N 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229960000686 benzalkonium chloride Drugs 0.000 description 2
- JBIROUFYLSSYDX-UHFFFAOYSA-M benzododecinium chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 JBIROUFYLSSYDX-UHFFFAOYSA-M 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- CADWTSSKOVRVJC-UHFFFAOYSA-N benzyl(dimethyl)azanium;chloride Chemical compound [Cl-].C[NH+](C)CC1=CC=CC=C1 CADWTSSKOVRVJC-UHFFFAOYSA-N 0.000 description 2
- FKPSBYZGRQJIMO-UHFFFAOYSA-M benzyl(triethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC1=CC=CC=C1 FKPSBYZGRQJIMO-UHFFFAOYSA-M 0.000 description 2
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- HXWGXXDEYMNGCT-UHFFFAOYSA-M decyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)C HXWGXXDEYMNGCT-UHFFFAOYSA-M 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- SVMUEEINWGBIPD-UHFFFAOYSA-N dodecylphosphonic acid Chemical compound CCCCCCCCCCCCP(O)(O)=O SVMUEEINWGBIPD-UHFFFAOYSA-N 0.000 description 2
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- VEAZEPMQWHPHAG-UHFFFAOYSA-N n,n,n',n'-tetramethylbutane-1,4-diamine Chemical compound CN(C)CCCCN(C)C VEAZEPMQWHPHAG-UHFFFAOYSA-N 0.000 description 2
- DMQSHEKGGUOYJS-UHFFFAOYSA-N n,n,n',n'-tetramethylpropane-1,3-diamine Chemical compound CN(C)CCCN(C)C DMQSHEKGGUOYJS-UHFFFAOYSA-N 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- LXPCOISGJFXEJE-UHFFFAOYSA-N oxifentorex Chemical compound C=1C=CC=CC=1C[N+](C)([O-])C(C)CC1=CC=CC=C1 LXPCOISGJFXEJE-UHFFFAOYSA-N 0.000 description 2
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- DQKGOGJIOHUEGK-UHFFFAOYSA-M hydron;2-hydroxyethyl(trimethyl)azanium;carbonate Chemical compound OC([O-])=O.C[N+](C)(C)CCO DQKGOGJIOHUEGK-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 description 1
- 235000005772 leucine Nutrition 0.000 description 1
- 125000002463 lignoceryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 235000018977 lysine Nutrition 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- LFETXMWECUPHJA-UHFFFAOYSA-N methanamine;hydrate Chemical compound O.NC LFETXMWECUPHJA-UHFFFAOYSA-N 0.000 description 1
- MOVBJUGHBJJKOW-UHFFFAOYSA-N methyl 2-amino-5-methoxybenzoate Chemical compound COC(=O)C1=CC(OC)=CC=C1N MOVBJUGHBJJKOW-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DWFKOMDBEKIATP-UHFFFAOYSA-N n'-[2-[2-(dimethylamino)ethyl-methylamino]ethyl]-n,n,n'-trimethylethane-1,2-diamine Chemical compound CN(C)CCN(C)CCN(C)CCN(C)C DWFKOMDBEKIATP-UHFFFAOYSA-N 0.000 description 1
- DIHKMUNUGQVFES-UHFFFAOYSA-N n,n,n',n'-tetraethylethane-1,2-diamine Chemical compound CCN(CC)CCN(CC)CC DIHKMUNUGQVFES-UHFFFAOYSA-N 0.000 description 1
- TXXWBTOATXBWDR-UHFFFAOYSA-N n,n,n',n'-tetramethylhexane-1,6-diamine Chemical compound CN(C)CCCCCCN(C)C TXXWBTOATXBWDR-UHFFFAOYSA-N 0.000 description 1
- JPJMSWSYYHNPLD-UHFFFAOYSA-N n-[2-(dimethylamino)ethyl]-n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCNCCN(C)C JPJMSWSYYHNPLD-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 210000000653 nervous system Anatomy 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009965 odorless effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AENSXLNDMRQIEX-UHFFFAOYSA-L oxido sulfate;tetrabutylazanium Chemical compound [O-]OS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC AENSXLNDMRQIEX-UHFFFAOYSA-L 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960005152 pentetrazol Drugs 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000003007 phosphonic acid derivatives Chemical class 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 235000010482 polyoxyethylene sorbitan monooleate Nutrition 0.000 description 1
- 150000007519 polyprotic acids Chemical class 0.000 description 1
- 229920000053 polysorbate 80 Polymers 0.000 description 1
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 235000013930 proline Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 235000004400 serine Nutrition 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 229960001922 sodium perborate Drugs 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- YKLJGMBLPUQQOI-UHFFFAOYSA-M sodium;oxidooxy(oxo)borane Chemical compound [Na+].[O-]OB=O YKLJGMBLPUQQOI-UHFFFAOYSA-M 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 1
- YQIVQBMEBZGFBY-UHFFFAOYSA-M tetraheptylazanium;bromide Chemical compound [Br-].CCCCCCC[N+](CCCCCCC)(CCCCCCC)CCCCCCC YQIVQBMEBZGFBY-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- AHNISXOXSNAHBZ-UHFFFAOYSA-M tetrakis-decylazanium;bromide Chemical compound [Br-].CCCCCCCCCC[N+](CCCCCCCCCC)(CCCCCCCCCC)CCCCCCCCCC AHNISXOXSNAHBZ-UHFFFAOYSA-M 0.000 description 1
- LUVHDTDFZLTVFM-UHFFFAOYSA-M tetramethylazanium;chlorate Chemical compound [O-]Cl(=O)=O.C[N+](C)(C)C LUVHDTDFZLTVFM-UHFFFAOYSA-M 0.000 description 1
- FDXKBUSUNHRUIZ-UHFFFAOYSA-M tetramethylazanium;chlorite Chemical compound [O-]Cl=O.C[N+](C)(C)C FDXKBUSUNHRUIZ-UHFFFAOYSA-M 0.000 description 1
- ZCWKIFAQRXNZCH-UHFFFAOYSA-M tetramethylazanium;perchlorate Chemical compound C[N+](C)(C)C.[O-]Cl(=O)(=O)=O ZCWKIFAQRXNZCH-UHFFFAOYSA-M 0.000 description 1
- RQNADZJRELIICT-UHFFFAOYSA-N tolonium Chemical compound C1=C(C)C(N)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RQNADZJRELIICT-UHFFFAOYSA-N 0.000 description 1
- 229950003937 tolonium Drugs 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- AYPICULWYYWILG-UHFFFAOYSA-N triazanium 1,3,5-triazine-2,4,6-trithiolate Chemical compound [NH4+].[NH4+].[NH4+].[S-]C1=NC([S-])=NC([S-])=N1 AYPICULWYYWILG-UHFFFAOYSA-N 0.000 description 1
- XDUVTZGINNGNAG-UHFFFAOYSA-M tridodecyl(methyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(CCCCCCCCCCCC)CCCCCCCCCCCC XDUVTZGINNGNAG-UHFFFAOYSA-M 0.000 description 1
- GPQCSCQDQNXQSV-UHFFFAOYSA-N tridodecylazanium;chloride Chemical compound Cl.CCCCCCCCCCCCN(CCCCCCCCCCCC)CCCCCCCCCCCC GPQCSCQDQNXQSV-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- GRNRCQKEBXQLAA-UHFFFAOYSA-M triethyl(2-hydroxyethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CCO GRNRCQKEBXQLAA-UHFFFAOYSA-M 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- SZEMGTQCPRNXEG-UHFFFAOYSA-M trimethyl(octadecyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C SZEMGTQCPRNXEG-UHFFFAOYSA-M 0.000 description 1
- UYPYRKYUKCHHIB-UHFFFAOYSA-N trimethylamine N-oxide Chemical compound C[N+](C)(C)[O-] UYPYRKYUKCHHIB-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- NYVOYAFUSJONHU-UHFFFAOYSA-K trisodium;1,3,5-triazine-2,4,6-trithiolate Chemical compound [Na+].[Na+].[Na+].[S-]C1=NC([S-])=NC([S-])=N1 NYVOYAFUSJONHU-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- AQLJVWUFPCUVLO-UHFFFAOYSA-N urea hydrogen peroxide Chemical compound OO.NC(N)=O AQLJVWUFPCUVLO-UHFFFAOYSA-N 0.000 description 1
- 229940116269 uric acid Drugs 0.000 description 1
- 235000014393 valine Nutrition 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C213/04—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reaction of ammonia or amines with olefin oxides or halohydrins
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C215/00—Compounds containing amino and hydroxy groups bound to the same carbon skeleton
- C07C215/02—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C215/40—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton with quaternised nitrogen atoms bound to carbon atoms of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C217/00—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
- C07C217/02—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C217/04—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C217/28—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having one amino group and at least two singly-bound oxygen atoms, with at least one being part of an etherified hydroxy group, bound to the carbon skeleton, e.g. ethers of polyhydroxy amines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/084—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/088—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/125—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/13—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
-
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Abstract
本发明提供一种季铵碱溶液,其包含多胺与有机环氧烷的反应产物。该季铵碱溶液可以用于多种应用,例如用于从金属或电介质表面除去化学残留物。
Description
交叉参考的相关申请
本申请要求2018年8月30日提交的美国临时专利申请序列号62/724,849的优先权,其全部内容通过参考明确地引入本文。
关于联邦发起的研究或研发的声明
不适用。
技术领域
本发明总体上涉及一种季铵碱溶液,其包含多胺与有机环氧烷的反应产物。该季铵碱溶液可以用于多种应用,包括但不限于金属和电介质表面的蚀刻、清洁、抛光和图案形成。
背景技术
集成电路和其他电子装置如光伏电池的制作引入多种加工步骤,其可能包括许多有毒的、易燃的、爆炸性的和/或环境不友好的化学品。这些化学品中的许多也广泛用于多种其他应用包括飞机外部清洁、金属零件加工和发动机维护中的金属或非金属表面。
铝的氢氧化物例如四甲基氢氧化铵传统上已经用于蚀刻、清洁、抛光和图案形成,如以下中所述:
美国专利7,825,079,其公开了一种包含四甲基氢氧化铵和螯合剂的组合物,用于除去光致抗蚀剂或蚀刻后残留物;
美国专利7,671,001,其公开了一种包含四甲基氢氧化铵和金属腐蚀抑制剂的组合物,用于清洁半导体晶片基底:
美国专利7,498,295,其公开了一种包含四甲基氢氧化铵、螯合剂和腐蚀抑制剂的组合物,用于在半导体基底的化学机械平坦化(planarization)之后使用;和
WO2006/056298,其公开了一种包含四甲基氢氧化铵、二甲基亚砜、乙二醇和水的组合物,用于清洁微电子基底。
虽然已知四甲基氢氧化铵非常有效,但是已经发现其对于神经系统毒性很高。因此,一直在寻求对于这种化学品更安全的替代。最近使用的一种这样的替代是氢氧化胆碱,如以下中所述:
美国专利8,765,653,其公开了一种包含丙烯酰胺基-甲基-丙烷磺酸酯的共聚物、丙烯酸-2-丙烯酰胺基-2-甲基丙烷磺酸共聚物及其混合物、非亚乙酰基表面活性剂和氢氧化胆碱的组合物,用于除去半导体制造过程中的残留物;和
美国专利7,135,445,其公开了一种包含双-氢氧化胆碱或三-氢氧化胆碱、溶剂和腐蚀抑制剂的组合物,其用于清洁来自于微电路的焊剂和抗蚀材料。
虽然氢氧化胆碱具有相比于四甲基氢氧化铵的若干优点,如低毒性,相对低的成本,易于制造和可生物降解,但是它在使用过程中存在严重的气味问题,并且会分解而产生有色溶液和沉淀物。因此,期望开发新的组合物,其与现有技术的含有四甲基氢氧化铵或氢氧化胆碱的组合物同样有效,但是不表现出上述的毒性、气味或颜色问题。
发明内容
本发明涉及一种季铵碱溶液,其包含(i)多胺与(ii)有机环氧烷的反应产物。
本发明的季铵碱可以用于多种应用中,例如用于用来从金属表面或电介质表面除去化学残留物的组合物中。
具体实施方式
如果在本文中出现,则术语“包括/包含”及其派生词并不意在排除任何另外的组分、步骤或程序的存在,无论其是否在本文中公开。为了避免任何疑义,本文通过使用术语“包括/包含”所要求保护的全部组合物可以包含任何另外的添加剂、助剂或化合物,除非有相反指示。相反,如果在本文中出现,则术语“基本上由……组成”从任何随后陈述的范围中排除任何其他组分、步骤或程序,除了对于操作性来说并非本质的那些之外,以及如果使用,则术语“由……组成”排除没有明确描述或列举的任何组分、步骤或程序。除非另有规定,否则术语“或/或者”指的是列举的单个以及任意组合的成员。
冠词“一个”和“一种”在本文中用于表示一种或大多于一种(即至少一种)的该冠词的语法宾语。举例来说,“一种多胺”表示一种多胺或多于一种多胺。表述“在一个实施方案中”、“根据一个实施方案”等总体上表示该表述之后具体的特征、结构或特性包括在本发明的至少一个实施方案中,并且可以包括在本发明的多于一个实施方案中。重要的是,这样的表述不必然指同一实施方案。如果说明书称组分或特征“可以”、“能够”、“能”或“可能”被包含或者具有一定特性,则该特定的组分或特征不是必须被包含或者具有该特性。
如本文所使用,术语“约”可以允许在数值或范围内的可变程度,例如可以处于所述值或所述范围限度的10%以内,5%以内,或1%以内。
以范围形式表达的值应当以灵活方式解释,不仅包括明确作为所述范围的限度表达的数值,而且还包括该范围内囊括的全部的单个数值或子范围,如同每个数值和子范围被明确陈述一样。例如,1-6的范围应当被认为已经明确公开了子范围如1-3,或2-4,或3-6等,以及该范围内的单个数,如1,2,3,4,5和6。不管该范围的宽度如何,这都是适用的。
在本文所述的方法和工艺中,步骤可以以任何顺序进行,除了当明确陈述了时间或操作次序之外。此外,规定的步骤可以同时进行,除非明确的权利要求语言限定了它们是单独进行的。
术语“基本上不含”涉及组合物或混合物,其中特定的化合物的存在量不会实质性影响该组合物或混合物。例如,“基本上不含氢氧化胆碱”表示氢氧化胆碱可能以不实质性影响该组合物或混合物的气味或颜色的量被包含在该组合物或混合物中。确定化合物的量是否对组合物有实质性影响,处于受益于本发明的本领域技术人员的能力范围内。在一些实施方案中,基本上不含可以基于组合物的总重量计小于2wt%,或小于1wt%,或小于0.5wt%,或小于0.1wt%,或小于0.05wt%,或甚至小于0.01wt%。在一些实施方案中,基本上不含表示特定的化合物在相应的组合物中不以任何量存在(即0.0wt%)。
如本文所使用,术语“烷基”指的是具有1-30个碳原子的支化的或未支化的饱和烃基团,如甲基(“Me”)、乙基(“Et”)、正丙基、异丙基、正丁基、异丁基、叔丁基、辛基、癸基、十四烷基、十六烷基、二十烷基、二十四烷基等。在一些方面中,本文中的烷基可以包含1-12个碳原子。术语“低级烷基”指的是具有1-7个碳原子,或者在一些方面中具有1-4个碳原子的烷基。术语“高级烷基”指的是具有多于7个碳原子的烷基。
术语“有机环氧烷”指的是具有下式的化合物:
其中每个R相同或不同,并且是氢、具有1-6个碳原子的烷基、不饱和烷基、芳基或芳烷基,或者一个或多个R基团形成含有3-12个碳原子的环结构,在一些实施方案中R基团可以包含一个或多个氧原子。可以使用的环氧烷(有机环氧烷的子类)的例子包括但不限于甲醛、环氧乙烷、环氧丙烷、环氧丁烷、环氧戊烷和环氧己烷。
术语“烷氧基烷基”指的是-O-烷基取代的烷基。
术语“芳基”指的是C6-C14单环或多环芳族环体系,包括但不限于苯基、萘基、菲基、蒽基、茚基、薁基、联苯基、亚联苯基和芴基。
术语“芳烷基”指的是芳基取代的烷基。
术语“环烷基”指的是具有3-12个碳原子的饱和环烷基,如环丙基、环己基和环辛基,其在环上可以具有合适的取代基。
术语“任选的”或“任选地”表示随后描述的事件或情形可以发生或者可以不发生,并且该描述包括发生所述事件或情形的情况和不发生的情况。例如,表述“任选取代的烷基”表示该烷基可以是取代的或者可以不是取代的,并且该描述包括未取代的烷基和具有取代的烷基二者。
术语“多胺”指的是每分子中具有两个或更多个胺基的化合物,其中至少一个胺基是叔胺基团或者原位转化成这样的胺基。例如,N,N,N’,N’-四(2-羟乙基)乙二胺可以通过乙二胺与环氧乙烷反应来原位制备,然后可以进一步经乙氧基化(即与有机环氧烷反应)来形成季铵碱。
如上所述,在电子和金属加工工业中,氢氧化铵通常用于例如金属和电介质表面的蚀刻、清洁、抛光和图案形成的方法。虽然这些铵化合物的效果被认为归因于存在的氢氧化物离子作用于金属或电介质表面处,但是有机铵离子的设计会显著影响这些氢氧化物的性能。申请人已经惊讶地发现,许多季铵碱在金属或电介质表面上表现出高反应性。另外,本发明的季铵碱相对无毒的和基本上无气味,并且当在湿加工步骤过程中需要具体的反应速率或者当遇到金属或电介质表面的特定类型或混合时,可以容易地经设计来提供多样的反应性供选择。本发明的季铵碱也可以用于有机光致抗蚀剂显影、蚀刻或除去不想要的有机或其他残留物。
因此,在第一实施方案中,提供一种季铵碱溶液,其包含多胺与有机环氧烷的反应产物。
可以使用各种多胺,只要它们具有能够形成季铵基团的至少一个叔胺基团(或者可以原位形成叔胺)。在一个实施方案中,季铵碱可以衍生自非羟基化多胺、羟基化多胺或其混合物。
在一个实施方案中,非羟基化多胺可以是具有下式的化合物:
其中每个R1相同或不同,并且是氢、烷基、环烷基、芳基、烷氧基烷基、羟基化烷基或羟基化烷氧基烷基,在这样的组合中形成至少一个叔氮;x是0或至少1的整数,例如1-10,或1-3;和每个R’相同或不同,并且是具有至少2个如2-10个碳原子或2-5个碳原子的烷基、芳基、烷芳基、不饱和烃基,或者可以包含与C和H组合的O或N并且进一步可以形成环结构。在一些实施方案中,R1基团中的两个可以结合来形成环胺,例如吗啉和哌啶和烷基衍生物,如N-烷基吗啉和N-烷基哌啶和咪唑啉。在一些实施方案中,R’基团可以形成环或杂环或芳族环,如吗啉、哌嗪、哌啶、咪唑啉或亚苯基。
在另一实施方案中,羟基化多胺可以是具有下式的化合物:
或者具有下式的化合物:
其中每个R1相同或不同,并且是氢、烷基、环烷基、芳基、烷氧基烷基、羟基化烷基或羟基化烷氧基烷基,在这样的组合中形成至少一个叔氮;x是0或至少1的整数,例如1-10,或1-3;和n是至少2的整数,例如2-10,或2-5。在一些实施方案中,R1基团中的两个可以结合来形成环胺,例如吗啉和哌啶和烷基衍生物,如N-烷基吗啉和N-烷基哌啶和咪唑啉。
上述多胺的例子可以包括但不限于N,N,N’,N’-四甲基乙二胺、N,N,N’,N’-四乙基乙二胺、N,N,N’,N”,N”-五甲基二亚乙基三胺、N,N,N’,N’-四甲基丙烷-1,3-二胺、N,N,N’,N”,N”-五甲基二亚丙基三胺、N,N,N’,N’-四甲基丙烷-1,3-二胺、N,N,N’,N’-四甲基丁烷-1,4-二胺、N,N,N’,N’-四甲基己烷-1,6-二胺、N,N,N’,N’-四(2-羟乙基)乙二胺、1,1,4,7,10,10-六甲基三亚乙基四胺、N,N,N’,N’-四(2-羟丙基)乙二胺、双(N,N-二甲基氨基乙基)醚和双(2-二甲基氨基乙基)醚、双(3-二甲基氨基丙基)醚、双(2-吗啉基乙基)醚、三亚乙基二胺、甲基三亚乙基二胺、乙基三亚乙基二胺、二甲基三亚乙基二胺、N,N,N-三(3-二甲基氨基丙基)胺、双(2-二甲基氨基乙基)胺、N,N’-双(2-氨基乙基)哌嗪、N,N’-双(3-氨基丙基)哌嗪及其混合物。
在一个实施方案中,有机环氧烷是具有下式的化合物:
其中R2和R3相同或不同,并且是氢、具有1-12个碳原子的烷基、不饱和烃基、具有6-18个碳原子的芳基、具有6-18个碳原子的芳烷基,或者R2和R3基团可以形成含有3-12个碳原子的环结构。在一些实施方案中,R2和R3基团可以进一步含有一个或多个氧原子。有机环氧烷的例子可以包括但不限于环氧乙烷、环氧丙烷、1,2-环氧丁烷、1,2-环氧戊烷、氧化苯乙烯、二烯的二氧化物例如环氧丁二烯及其混合物。其他有机环氧烷化合物的例子是氧化环己烯、缩水甘油、烯丙基缩水甘油基醚、苯基缩水甘油基醚、烷基缩水甘油基醚、氧化苯乙烯、双环[2.2.1]环氧庚烷和双环[2.2.2]环氧辛烷。
有机环氧烷(例如环氧烷基)与碱性氮原子反应来形成季铵结构部分是本领域技术人员公知的,无须赘述。因此,在一个实施方案中,多胺与有机环氧烷在水的存在下反应。多胺可以与水混合,并且然后可以对体系加压。然后可以以与多胺至少约1:1的摩尔比添加有机环氧烷。在一些实施方案中,有机环氧烷可以与胺在至少化学计量量的水的存在下反应来形成季铵碱,和在有机溶剂存在下反应。在一些实施方案中,摩尔比可以是约1:1-约3N:1的有机环氧烷比多胺,或约1:1-约1.5N:1的有机环氧烷比多胺,其中N是起始化合物中的胺基的数目。例如,对于三胺如五甲基二亚乙基三胺(PMDETA)来说,3摩尔的每分子具有一个环氧烷的有机环氧烷相对于PMDETA将是N摩尔的有机环氧烷。在一些实施方案中,用于将任何伯胺或仲胺转化成叔胺的有机环氧烷的量和另外量的环氧烷与多胺的摩尔比是1:1-约3N:1的有机环氧烷比多胺,或约1:1-约1.5N:1的有机环氧烷比多胺,其中N是起始化合物中的胺基的数目。反应可以在小于约70℃例如约40℃-约50℃的温度和连续搅拌下进行,并且它的完成可以通过压力下降到约大气压来标记,或者季铵含量可以通过使用强酸如HCl进行电位滴定来测定。
季铵碱溶液可以包含任何合适浓度的季铵化的胺氮。因此,在一个实施方案中,季铵碱溶液中季铵化的胺的浓度可以是基于该季铵碱溶液的总量计约1重量%-约80重量%。在其他实施方案中,季铵碱溶液中季铵化的胺氮的浓度可以是基于该季铵碱溶液的总量计约10重量%-约70重量%,或约35重量%-约65重量%,或约40重量%-约60重量%,或约45重量%-约55重量%。
在另一实施方案中,本发明的产物(即季铵碱溶液)可以包含具有至少约1%总量的含有多于一个季铵碱基团的季分子(quat molecule)的季铵碱。在其他实施方案中,本发明的产物可以包含这样的季铵碱,其具有至少约2.5%总量的含有多于一个季铵碱基团的季分子,或具有至少约5%总量的含有多于一个季铵碱基团的季分子,或具有至少约10%总量的含有多于一个季铵碱基团的季分子,或具有至少约15%总量的含有多于一个季铵碱基团的季分子,或具有至少约20%总量的含有多于一个季铵碱基团的季分子,或具有至少约25%总量的含有多于一个季铵碱基团的季分子,或具有至少约30%总量的含有多于一个季铵碱基团的季分子,或具有至少约35%总量的含有多于一个季铵碱基团的季分子,或具有至少约40%总量的含有多于一个季铵碱基团的季分子。
本发明的季铵碱溶液可以用于多种应用。因此,在第二方面中,提供一种用于从金属或电介质表面除去化学残留物的组合物,其包含本发明的季铵碱溶液。在一些实施方案中,该组合物可以包含至少约0.1重量%,或至少约0.5重量%,或至少约1重量%,或至少约2重量%,或至少约5重量%,或至少约7重量%,或至少约10重量%的本发明的季铵碱溶液,其中重量%基于组合物的总重量计。在其他实施方案中,该组合物可以包含小于约20重量%,或小于约15重量%,或小于约10重量%的本发明的季铵碱溶液,其中重量%基于组合物的总重量计。
在一些具体实施方案中,该组合物可以基本上不含氢氧化胆碱、四甲基氢氧化铵或二者。在其他实施方案中,该组合物可以基本上不含下述蚀刻剂的至少一种或全部。
除了本发明的季铵碱溶液之外,该组合物可以进一步包含溶剂、螯合剂、氧化剂、金属腐蚀抑制剂、蚀刻剂、低介电常数钝化剂、含硅化合物、表面活性剂及其组合。
溶剂可以包括但不限于水、至少一种水可混溶性有机溶剂或其组合。例如,溶剂可以包括选自以下的至少一种物质:水、甲醇、乙醇、异丙醇、丁醇、戊醇、己醇、2-乙基-1-己醇、庚醇、辛醇、乙二醇、丙二醇、丁二醇、己二醇、碳酸亚丁酯、碳酸亚乙酯、碳酸亚丙酯、丁内酯、丁内酰胺、碳酸氢胆碱、二丙二醇、二甲基亚砜、环丁砜、四氢呋喃、四氢糠基醇(THFA)、1,2-丁二醇、1,4-丁二醇、四甲基脲、N,N’-二甲基咪唑啉酮(二甲基亚乙基脲)、二甘醇单甲醚、三甘醇单甲醚、二甘醇单乙醚、三甘醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、二甘醇单丁醚、三甘醇单丁醚、乙二醇单己基醚、二甘醇单己基醚、乙二醇苯醚、丙二醇甲醚、二丙二醇甲醚(DPGME)、三丙二醇甲醚(TPGME)、二丙二醇二甲醚、二丙二醇乙醚、丙二醇正丙醚、二丙二醇正丙醚(DPGPE)、三丙二醇正丙醚、丙二醇正丁醚、二丙二醇正丁醚、三丙二醇正丁醚、丙二醇苯醚、乙二醇二甲醚、二甘醇二甲醚、2,3-二氢十氟戊烷、乙基全氟丁醚、甲基全氟丁醚、碳酸烷基酯、4-甲基-2-戊醇、N-甲基吡咯烷酮(NMP)、六甲基磷酰胺、N,N’-二甲基乙酰胺(DMAC)、N,N-二甲基甲酰胺(DMF)及其组合。在一些实施方案中,溶剂包括水,在其他实施方案中是去离子水。溶剂的存在量可以是约20重量%-约99.9重量%,或约30重量%-约98重量%,或甚至约50重量%-约95重量%,其中重量%基于组合物的总重量计。
螯合剂可以包括但不限于β-二酮酸盐化合物如乙酰基丙酮酸盐、1,1,1-三氟-2,4-戊二酮和1,1,1,5,5,5-六氟-2,4-戊二酮;胺和氨基酸如甘氨酸、丝氨酸、脯氨酸、亮氨酸、丙氨酸、天冬酰胺、天冬氨酸、谷氨酰胺、缬氨酸和赖氨酸;选自以下的多质子酸:亚氨基二乙酸(IDA)、丙二酸、草酸、琥珀酸、硼酸、次氮基三乙酸、苹果酸、柠檬酸、乙酸、马来酸、乙二胺四乙酸(EDTA)、EDTA-2NH3(乙二胺四乙酸二铵盐)、(1,2-环亚己基二次氮基)四乙酸(CDTA)、二亚乙基三胺五乙酸(DTPA)、2-膦酰基丁烷-1,2,4-三羧酸(PBTCA)、乙二胺二琥珀酸和丙二胺四乙酸;膦酸;膦酸衍生物如羟亚乙基二膦酸(HEDP)、1-羟基乙烷-1,1-二膦酸、次氮基-三(亚甲基膦酸)(NTMP)、氨基三(亚甲基膦酸)、二亚乙基三胺五(亚甲基膦酸)、乙二胺四(亚甲基膦酸)(EDTMPA);乙二胺;2,4-戊二酮;苯扎氯胺;1-咪唑;四甘醇二甲醚;五甲基二亚乙基三胺(PMDETA);1,3,5-三嗪-2,4,6-三硫醇三钠盐溶液;1,3,5-三嗪-2,4,6-三硫醇三铵盐溶液;二乙基二硫代氨基甲酸钠;二取代的二硫代氨基甲酸盐,及其组合。螯合剂的存在量可以是约0.01重量%-约1重量%,其中重量%基于组合物的总重量计。
氧化剂可以包括但不限于过氧化氢(H2O2)、FeCl3、FeF3、Fe(NO3)3、Sr(NO3)2、CoF3、MnF3、过硫酸氢钾制剂(2KHSO5·KHSO4·K2SO4)、过碘酸、碘酸、氧化钒(V)、氧化钒(IV,V)、钒酸铵、多原子铵盐(例如过氧化单硫酸铵、亚氯酸铵(NH4ClO2)、氯酸铵(NH4ClO3)、碘酸铵(NH4IO3)、硝酸铵(NH4NO3)、过硼酸铵(NH4BO3)、过氯酸铵(NH4ClO4)、过碘酸铵(NH4IO4)、过硫酸铵((NH4)2S2O8)、次氯酸铵(NH4ClO))、次溴酸铵、钨酸铵((NH4)10H2(W2O7))、多原子钠盐(例如过硫酸钠(Na2S2O8)、次氯酸钠(NaClO)、过硼酸钠、次溴酸钠(NaBrO))、多原子钾盐(例如碘酸钾(KIO3)、高锰酸钾(KMnO4)、过硫酸钾、硝酸(HNO3)、过硫酸钾(K2S2O8)、次氯酸钾(KClO))、四甲基铵多原子盐(例如四甲基亚氯酸铵((N(CH3)4)ClO2)、四甲基氯酸铵((N(CH3)4)ClO3)、四甲基碘酸铵((N(CH3)4)IO3)、四甲基过硼酸铵((N(CH3)4)BO3)、四甲基过氯酸铵((N(CH3)4)ClO4)、四甲基过碘酸铵((N(CH3)4)IO4)、四甲基过硫酸铵((N(CH3)4)S2O8))、四丁基铵多原子盐(例如四丁基过氧化单硫酸铵)、过氧化单硫酸、硝酸铁(Fe(NO3)3)、氢过氧化脲((CO(NH2)2)H2O2)、过乙酸(CH3(CO)OOH)、1,4-苯醌、甲苯醌、二甲基-1,4-苯醌、氯醌、四氧嘧啶、N-甲基吗啉N-氧化物、三甲基胺N-氧化物,及其组合。当氧化剂是盐时,它可以是水合的或无水的。氧化剂的存在量可以是约10重量%-约40重量%,其中重量%基于组合物的总重量计。
本文考虑的金属腐蚀抑制剂包括但不限于5-氨基-1,3,4-噻重氮-2-硫醇(ATDT)、2-氨基-5-乙基-1,3,4-噻重氮、苯并三唑(BTA)、1,2,4-三唑(TAZ)、甲苯基三唑、5-甲基-苯并三唑(mBTA)、5-苯基-苯并三唑、5-硝基-苯并三唑、苯并三唑羧酸、3-氨基-5-巯基-1,2,4-三唑、1-氨基-1,2,4-三唑、羟基苯并三唑、2-(5-氨基-戊基)-苯并三唑、1-氨基-1,2,3-三唑、1-氨基-5-甲基-1,2,3-三唑、3-氨基-1,2,4-三唑(3-ATA)、3-巯基-1,2,4-三唑、3-异丙基-1,2,4-三唑、5-苯基硫醇-苯并三唑、卤代-苯并三唑(卤代=F、Cl、Br或I)、萘并三唑、2-巯基苯并咪唑(MBI)、2-巯基苯并噻唑、4-甲基-2-苯基咪唑、2-巯基噻唑啉、5-氨基-1,2,4-三唑(5-ATA)、十二烷基硫酸钠(SDS)、3-氨基-5-巯基-1,2,4-三唑、3,5-二氨基-1,2,4-三唑、亚戊基四唑、5-苯基-1H-四唑、5-苄基-1H-四唑、5-甲基四唑、5-巯基-1-甲基-四唑、1-苯基-1H-四唑-5-硫醇、2-苄基吡啶、琥珀酰亚胺、2,4-二氨基-6-甲基-1,3,5-三嗪、噻唑、三嗪、甲基四唑、1,3-二甲基-2-咪唑啉酮、1,5-五亚甲基四唑、1-苯基-5-巯基四唑、二氨基甲基三嗪、咪唑啉硫酮、4-甲基-4H-1,2,4-三唑-3-硫醇、4-氨基-4H-1,2,4-三唑、3-氨基-5-甲基硫-1H-1,2,4-三唑、苯并噻唑、咪唑、苯并咪唑、2-氨基苯并咪唑、1-甲基咪唑、苯并异二唑(indiazole)、腺嘌呤、琥珀酰亚胺、腺苷、咔唑、邻磺酰苯甲酰亚胺、尿酸和苯偶姻肟。另外的腐蚀抑制剂包括阳离子季盐例如苯扎氯铵、苄基二甲基十二烷基氯化铵、十四烷基三甲基溴化铵、十二烷基三甲基溴化铵、十六烷基氯化吡啶鎓、苄基二甲基苯基氯化铵、十六烷基三甲基对甲苯磺酸铵、十六烷基三甲基氢氧化铵、1-甲基-1’-十四烷基-4,4’-二氯化二吡啶姆(bipyridium)、烷基三甲基溴化铵、盐酸安普罗铵、苄索氢氧化铵、苄索氯铵、苄基二甲基十六烷基氯化铵、苄基二甲基十四烷基氯化铵、苄基十二烷基二甲基溴化铵、苄基十二烷基二甲基氯化铵、十六烷基氯化吡啶鎓、胆碱对甲苯磺酸盐、二甲基二(十八烷基)溴化铵、十二烷基乙基二甲基溴化铵、十二烷基三甲基氯化铵、癸基三甲基氯化铵(DTAC)、乙基十六烷基二甲基溴化铵、吉拉尔特试剂(Girard’s reagent)、十六烷基(2-羟乙基)二甲基磷酸二氢铵、十六烷基溴化吡啶鎓、十六烷基三甲基溴化铵、十六烷基三甲基氯化铵、甲基苄索氯化铵、N,N’,N’-聚氧乙烯(10)-N-牛脂-1,3-二氨基丙烷液体、奥芬溴铵、四庚基溴化铵、四(癸基)溴化铵、通佐溴氨、三(十二烷基)氯化铵、三甲基十八烷基溴化铵、1-甲基-3-正辛基四氟硼酸咪唑鎓、1-癸基-3-甲基四氟硼酸咪唑鎓、1-癸基-3-甲基氯化咪唑鎓、三(十二烷基)甲基溴化铵、二甲基二硬脂基氯化铵、十六烷基三甲基溴化铵、十四烷基三甲基溴化铵和氯化六甲双铵。其他腐蚀抑制剂包括非离子表面活性剂如聚乙二醇、聚丙二醇,环氧乙烷/环氧丙烷嵌段共聚物如聚氧乙烯(20)山梨聚糖单油酸酯、聚氧乙烯(20)山梨聚糖单棕榈酸酯、聚氧乙烯(20)山梨聚糖单月桂酸酯、聚氧丙烯/聚氧乙烯嵌段共聚物,阴离子表面活性剂如十二烷基苯磺酸、十二烷基苯磺酸钠、十二烷基膦酸(DDPA)、双(2-乙基己基)磷酸酯、苄基膦酸、二苯基次膦酸、1,2-亚乙基二膦酸、苯基膦酸、肉桂酸,及其组合。金属腐蚀抑制剂的存在量可以是约0.01重量%-约2重量%,其中重量%基于组合物的总重量计。
蚀刻剂可以包括但不限于HF、氟化铵、四氟硼酸、六氟硅酸、其他含有B-F或Si-F键的化合物、四丁基四氟硼酸铵(TBA-BF4)、四烷基氟化铵(NRaRbRcRdF)、强碱如四烷基氢氧化铵(NRaRbRcRdOH),其中Ra、Rb、Rc和Rd可以彼此相同或不同,并且可以选自氢、直链或支化的C1-C6烷基(如甲基、乙基、丙基、丁基、戊基、己基)、C1-C6烷氧基(如羟乙基、羟丙基)、取代的或未取代的芳基(例如苄基)、弱碱,及其组合。在一些实施方案中,氟化物源包括四氟硼酸、六氟硅酸、H2ZrF6、H2TiF6、HPF6、氟化铵、四甲基氟化铵、四甲基氢氧化铵、六氟硅酸铵、六氟钛酸铵或氟化铵和四甲基氟化铵的组合。对于氟化物源替代地或另外地,蚀刻剂可以包括强碱如四甲基氢氧化铵(TMAH)、四乙基氢氧化铵(TEAH)、四丙基氢氧化铵(TPAH)、四丁基氢氧化铵(TBAH)、苄基三甲基氢氧化铵(BTMAH)、氢氧化钾、氢氧化铵、苄基三乙基氢氧化铵(BTEAH)、四丁基氢氧化鏻(TBPH)、(2-羟乙基)三甲基氢氧化铵(氢氧化胆碱)、(2-羟乙基)三乙基氢氧化铵、(2-羟乙基)三丙基氢氧化铵、(1-羟丙基)三甲基氢氧化铵、乙基三甲基氢氧化铵、二乙基二甲基氢氧化铵(DEDMAH)、三(2-羟乙基)甲基氢氧化铵(THEMAH)、1,1,3,3-四甲基胍(TMG)、氢氧化钾、碳酸胍、精氨酸,及其组合。如果使用氢氧化胆碱,则本领域技术人员已知的是,商购产品经常包含少量稳定剂来使氢氧化胆碱降解为不期望的副产物最小化。氢氧化胆碱稳定剂是本领域已知的,包括但不限于甲醛、羟胺、亚硫酸盐和氢化物。考虑的弱碱包括但不限于氢氧化铵、单乙醇胺(MEA)、二乙醇胺(DEA)、三乙醇胺(TEA)、乙二胺、半胱氨酸,及其组合。另外的蚀刻剂的存在量可以是约0.01重量%-约15重量%,其中重量%基于组合物的总重量计。
低介电常数钝化剂可以包括但不限于硼酸、硼酸盐如五硼酸铵、四硼酸钠、3-羟基-2-萘甲酸、丙二酸、亚氨基二乙酸,及其组合。低介电常数钝化剂的存在量可以是约0.01重量%-约2重量%,其中重量%基于组合物的总重量计。
含硅化合物包括但不限于甲基三甲氧基硅烷、二甲基二甲氧基硅烷、苯基三甲氧基硅烷、四乙氧基硅烷(TEOS)、N-丙基三甲氧基硅烷、N-丙基三乙氧基硅烷、己基三甲氧基硅烷、己基三乙氧基硅烷,及其组合。可以用来对于上述烷氧基硅烷替代或另外使用的其他含硅化合物包括六氟硅酸铵、硅酸钠、硅酸钾、四甲基硅酸铵(TMAS),及其组合。含硅化合物的存在量可以是约0.001重量%-约2重量%,其中重量%基于组合物的总重量计。
可以添加到含水组合物中的表面活性剂可以是抗氧化性的氟化阴离子表面活性剂。考虑的阴离子表面活性剂包括但不限于氟表面活性剂如UR和/>FS-62(DuPont Canada Inc.),和氟烷基磺酸铵如NovecTM4300(3M Company)。
将理解的是,通常的实践是制造浓缩形式的组合物,在使用之前进行稀释。例如,该组合物可以以更浓缩的形式制造,其后在使用之前和/或使用之中用至少一种溶剂稀释。稀释比可以是约0.1份稀释剂:1份组合物浓缩物至约100份稀释剂:1份组合物浓缩物。应当进一步理解,浓缩形式可以基本上不含氧化剂,并且氧化剂可以在使用之前和/或使用之中引入到浓缩物或稀释的组合物中。
上述组合物可以通过简单地添加各组分并混合到均匀条件来容易地配制。此外,该组合物可以容易地配制成单包装配制物或者在使用之时或之前混合的多部分配制物。多部分配制物的各个部分可以在工具处或在混合区域/范围中如线内混合器或在该工具上游的储槽中进行混合。将考虑多部分配制物的不同部分可以含有成分/组分的任意组合,其当混合在一起时形成所需组合物。各成分的浓度可以在具体的多种组合物中广泛变化,即更稀释或更浓缩,并且将理解的是,组合物可以变化和可选地包含根据本发明的成分的任意组合,由其组成,或者基本上由其组成。
根据第三方面,本发明涉及通过使金属或电介质表面与第二方面的组合物接触,来从该金属或电介质表面除去化学残留物的方法。该组合物可以以任何合适的方式施用到该金属或电介质表面,例如通过将该组合物喷至该表面上,通过浸渍(在静态或动态体积的组合物中)该表面,通过使该表面与上面已经吸收了该组合物的另一材料例如垫或纤维吸收剂施涂器元件接触,通过使该表面与循环组合物接触,或者通过任何其他合适的手段、方式或技术,由此使该组合物与该表面进行除去性接触。该组合物可以在约20℃-约100℃,或约30℃-约70℃的温度与该表面接触约0.3分钟-约60分钟,或约0.5分钟-约30分钟的充足时间。这样的接触时间和温度是示例性的,可以使用能够从该表面有效地至少部分除去化学残留物的任何其他合适的时间和温度条件。
实施例
实施例1:季铵碱合成程序
在压力釜中,装入3.50磅的N,N,N’,N’-四甲基乙二胺,随后添加8.07磅的去离子水。在用氮气吹扫内容物之后,以一定速率添加2.72磅的环氧乙烷,以使反应温度保持为低于40℃。使反应持续1小时,然后用氮气吹扫以除去未反应的环氧乙烷。滴定指示约55%的胺氮被季铵化。
实施例2:季铵碱合成程序
以类似于实施例1的方式,使5.00磅的五甲基二亚乙基三胺(“PMDETA”)与3.89磅的环氧乙烷在11.52磅的去离子水的存在下在45℃最大温度进行反应。滴定指示约61%的胺氮,或1.9个氮原子/分子被季铵化。NMR光谱指示在同一分子中在带两个甲基的氮上,而非在PMDETA的中心氮上形成了季氮。过量两摩尔/PMDETA的环氧乙烷在二季铵化端部(diquat terminus)上的羟乙基上成链到有限的程度。
实施例3A和3B:季铵碱合成程序
3A:以类似于实施例1的方式,使9.50磅的N,N,N’,N’-四(2-羟乙基)乙二胺与3.61磅的环氧乙烷在10.81磅的去离子水的存在下在39℃最大温度进行反应。滴定指示约50%的胺氮被季铵化。
3B:以类似于实施例1的方式,使9.03磅的N,N,N’,N’-四(2-羟乙基)乙二胺与8.42磅的环氧乙烷在5.42磅的去离子水的存在下在47℃最大温度反应。滴定显示约52%的胺氮被季铵化。
实施例4:季铵碱合成程序
以类似于实施例1的方式,使2.40磅的双(2-二甲基氨基乙基)醚与1.35磅的环氧乙烷在5.00磅的去离子水的存在下在40℃最大温度反应。滴定显示约85%的胺氮被季铵化。
将铜和铝基底暴露于实施例1,2,3A和3B上3天,将它们的反应性的指标与现有技术的季铵碱进行比较,如下所示。
a三(2-羟乙基)甲基氢氧化铵,b氢氧化胆碱
虽然上述涉及本发明的实施方案,但是可以设想本发明的其他和另外的实施方案,而不脱离其基本范围,并且其范围取决于所附权利要求书。
Claims (6)
1.季铵碱溶液,其包含(i)多胺与(ii)有机环氧烷的反应产物,
(i)多胺具有下式:
其中每个R1独立地是具有1-4个碳原子的烷基或羟基化烷基;x是0或1;R’是具有2-10个碳原子的烷基,和其中该季铵碱溶液中季铵化的胺的浓度为基于该季铵碱溶液的总量计1重量%-80重量%;
(ii)有机环氧烷具有下式:
其中每个R独立地是氢或具有1-6个碳原子的烷基。
2.根据权利要求1所述的季铵碱溶液,其中所述多胺是N,N,N’,N”,N”-五甲基二亚乙基三胺。
3.根据权利要求1的季铵碱溶液,其进一步包含水。
4.根据权利要求1的季铵碱溶液,其进一步包含可混溶的有机溶剂。
5.用于从金属表面或电介质表面除去化学残留物的组合物,其包含根据权利要求1所述的季铵碱溶液。
6.用于从金属表面或电介质表面除去化学残留物的方法,其包括使所述金属表面或电介质表面与根据权利要求1所述的季铵碱溶液接触。
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