PL3039485T3 - Macierz mikrozwierciadeł - Google Patents

Macierz mikrozwierciadeł

Info

Publication number
PL3039485T3
PL3039485T3 PL14755388.7T PL14755388T PL3039485T3 PL 3039485 T3 PL3039485 T3 PL 3039485T3 PL 14755388 T PL14755388 T PL 14755388T PL 3039485 T3 PL3039485 T3 PL 3039485T3
Authority
PL
Poland
Prior art keywords
micromirror array
micromirror
array
Prior art date
Application number
PL14755388.7T
Other languages
English (en)
Inventor
Martin Endres
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Publication of PL3039485T3 publication Critical patent/PL3039485T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
PL14755388.7T 2013-08-29 2014-08-26 Macierz mikrozwierciadeł PL3039485T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE201310217269 DE102013217269A1 (de) 2013-08-29 2013-08-29 Mikrospiegel-Array
PCT/EP2014/068041 WO2015028451A1 (de) 2013-08-29 2014-08-26 Mikrospiegel-array

Publications (1)

Publication Number Publication Date
PL3039485T3 true PL3039485T3 (pl) 2024-03-18

Family

ID=51398631

Family Applications (1)

Application Number Title Priority Date Filing Date
PL14755388.7T PL3039485T3 (pl) 2013-08-29 2014-08-26 Macierz mikrozwierciadeł

Country Status (7)

Country Link
US (1) US9897923B2 (pl)
EP (1) EP3039485B1 (pl)
JP (1) JP6499658B2 (pl)
DE (1) DE102013217269A1 (pl)
ES (1) ES2966091T3 (pl)
PL (1) PL3039485T3 (pl)
WO (1) WO2015028451A1 (pl)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11333597B2 (en) 2016-04-26 2022-05-17 Cytek Biosciences, Inc. Compact multi-color flow cytometer having compact detection module
CN114636472A (zh) * 2016-07-25 2022-06-17 厦泰生物科技公司 紧凑波长检测模块
KR20190095269A (ko) * 2016-12-20 2019-08-14 에베 그룹 에. 탈너 게엠베하 광-민감성 층을 노광하기 위한 디바이스 및 방법
DE102020212351A1 (de) 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Mikrospiegel-Array für eine beleuchtungsoptische Komponente einer Projektionsbelichtungsanlage

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6859515B2 (en) 1998-05-05 2005-02-22 Carl-Zeiss-Stiftung Trading Illumination system, particularly for EUV lithography
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6962419B2 (en) * 1998-09-24 2005-11-08 Reflectivity, Inc Micromirror elements, package for the micromirror elements, and projection system therefor
US6523961B2 (en) * 2000-08-30 2003-02-25 Reflectivity, Inc. Projection system and mirror elements for improved contrast ratio in spatial light modulators
DE20122617U1 (de) * 2000-08-03 2006-09-14 Reflectivity Inc., Sunnyvale Mikrospiegelelemente, Gehäuse für Mikrospiegelelemente und zugehöriges Projektionssystem
US6867897B2 (en) * 2003-01-29 2005-03-15 Reflectivity, Inc Micromirrors and off-diagonal hinge structures for micromirror arrays in projection displays
JP2003255242A (ja) * 2002-03-04 2003-09-10 Seiko Epson Corp 光スイッチングデバイス
US7405809B2 (en) * 2005-03-21 2008-07-29 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7362494B2 (en) * 2006-04-13 2008-04-22 Texas Instruments Incorporated Micromirror devices and methods of making the same
NL1036313A1 (nl) * 2007-12-27 2009-06-30 Asml Netherlands Bv Device manufacturing method and lithographic apparatus.
JP5487118B2 (ja) * 2008-02-15 2014-05-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
CN102422225B (zh) * 2009-03-06 2014-07-09 卡尔蔡司Smt有限责任公司 用于微光刻的照明光学系统与光学系统
JP2011129576A (ja) * 2009-12-15 2011-06-30 Nikon Corp 反射光学部材、反射光学装置、照明光学系、露光装置及びデバイス製造方法。
JP5644416B2 (ja) * 2010-11-24 2014-12-24 株式会社ニコン 光学ユニット、光学系、露光装置、及びデバイスの製造方法
DE102012207866A1 (de) 2012-05-11 2013-11-14 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie

Also Published As

Publication number Publication date
JP6499658B2 (ja) 2019-04-10
DE102013217269A1 (de) 2015-03-05
EP3039485B1 (de) 2023-10-18
ES2966091T3 (es) 2024-04-18
WO2015028451A1 (de) 2015-03-05
EP3039485A1 (de) 2016-07-06
US20160154318A1 (en) 2016-06-02
JP2016529557A (ja) 2016-09-23
EP3039485C0 (de) 2023-10-18
US9897923B2 (en) 2018-02-20

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