PL2565292T3 - Urządzenie i sposób osadzania warstwy na podłożu zgodnie z metodą EB/PVD - Google Patents

Urządzenie i sposób osadzania warstwy na podłożu zgodnie z metodą EB/PVD

Info

Publication number
PL2565292T3
PL2565292T3 PL12007846T PL12007846T PL2565292T3 PL 2565292 T3 PL2565292 T3 PL 2565292T3 PL 12007846 T PL12007846 T PL 12007846T PL 12007846 T PL12007846 T PL 12007846T PL 2565292 T3 PL2565292 T3 PL 2565292T3
Authority
PL
Poland
Prior art keywords
pvd process
coating substrates
substrates
coating
pvd
Prior art date
Application number
PL12007846T
Other languages
English (en)
Inventor
Gerhard Schuhmann
Jürgen Hotz
Pavel Seserko
Johannes Schwagmann
Jürgen Lemke
Jörg Wittich
Original Assignee
Ald Vacuum Techn Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ald Vacuum Techn Gmbh filed Critical Ald Vacuum Techn Gmbh
Publication of PL2565292T3 publication Critical patent/PL2565292T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/487—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using electron radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
PL12007846T 2010-04-21 2011-04-20 Urządzenie i sposób osadzania warstwy na podłożu zgodnie z metodą EB/PVD PL2565292T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102010017896A DE102010017896A1 (de) 2010-04-21 2010-04-21 Vorrichtung und Verfahren zum Beschichten von Substraten nach dem EB/PVD-Verfahren
EP12007846.4A EP2565292B1 (de) 2010-04-21 2011-04-20 Vorrichtung und verfahren zum beschichten von substraten nach dem eb/pvd-verfahren
EP11743417.5A EP2561114B1 (de) 2010-04-21 2011-04-20 Vorrichtung zum beschichten von substraten nach dem eb/pvd-verfahren

Publications (1)

Publication Number Publication Date
PL2565292T3 true PL2565292T3 (pl) 2015-01-30

Family

ID=44630188

Family Applications (2)

Application Number Title Priority Date Filing Date
PL12007846T PL2565292T3 (pl) 2010-04-21 2011-04-20 Urządzenie i sposób osadzania warstwy na podłożu zgodnie z metodą EB/PVD
PL11743417T PL2561114T3 (pl) 2010-04-21 2011-04-20 Urządzenie do powlekania substratów z zastosowaniem procesu EB/PVD

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL11743417T PL2561114T3 (pl) 2010-04-21 2011-04-20 Urządzenie do powlekania substratów z zastosowaniem procesu EB/PVD

Country Status (5)

Country Link
US (1) US20130209706A1 (pl)
EP (2) EP2565292B1 (pl)
DE (2) DE102010017896A1 (pl)
PL (2) PL2565292T3 (pl)
WO (1) WO2011131172A2 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10385444B2 (en) 2013-03-15 2019-08-20 United Technologies Corporation Deposition apparatus and methods
DE102018131905B4 (de) * 2018-12-12 2024-04-25 VON ARDENNE Asset GmbH & Co. KG Verdampfungsanordnung und Verfahren

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL291466A (pl) * 1962-04-13
US3313474A (en) * 1964-08-04 1967-04-11 Cons Vacuum Corp Vaporized material source
US3554512A (en) * 1969-03-24 1971-01-12 George H Elliott Crucible for holding molten semiconductor materials
CH542772A (de) * 1971-09-21 1973-10-15 Balzers Patent Beteilig Ag Einrichtung zum Transportieren von zu beschichtenden Substraten durch eine Vakuumanlage
DE3707672A1 (de) * 1987-03-10 1988-09-22 Sitesa Sa Epitaxieanlage
DE58905888D1 (de) * 1988-07-15 1993-11-18 Balzers Hochvakuum Haltevorrichtung für eine Scheibe sowie Anwendung derselben.
DE4019965A1 (de) * 1990-06-21 1992-01-09 Deutsche Forsch Luft Raumfahrt Verfahren und vorrichtung zum beschichten von substratmaterial
US5418348A (en) * 1992-10-29 1995-05-23 Mdc Vacuum Products, Inc. Electron beam source assembly
EP0785291A1 (en) * 1996-01-19 1997-07-23 The Boc Group, Inc. Electron beam evaporation system
EP0821394A1 (en) * 1996-07-25 1998-01-28 The Boc Group, Inc. Electron beam evaporator
JP3624113B2 (ja) * 1998-03-13 2005-03-02 キヤノン株式会社 プラズマ処理方法
UA71572C2 (uk) * 1999-08-04 2004-12-15 Дженерал Електрік Компані Електронно-променевий пристрій для нанесення покриття на вироби конденсацією із парової фази
US6174571B1 (en) * 1999-08-31 2001-01-16 General Electric Company Method of using a substrate offset to obtain a specific alloy chemistry from a metal alloy EB-PVD coating process
ATE450631T1 (de) * 2001-09-10 2009-12-15 Univ Virginia Verfahren zum aufbringen von metalllegierungsüberzügen und überzogene komponente
US6902647B2 (en) * 2002-08-29 2005-06-07 Asm International N.V. Method of processing substrates with integrated weighing steps
DE102004006849B4 (de) * 2004-02-12 2011-06-01 Ald Vacuum Technologies Ag Vorrichtung zum Beschichten von Substraten
KR100671673B1 (ko) * 2005-03-09 2007-01-19 삼성에스디아이 주식회사 다중 진공증착장치 및 제어방법
EP1806425A1 (de) * 2006-01-09 2007-07-11 Siemens Aktiengesellschaft Verfahren und Vorrichtung zum Beschichten eines Bauteils
UA81169C2 (en) * 2006-01-13 2007-12-10 Process for preparation of coal-containing material by method of electron-beam evaporation of carbon in vacuum with subsequent condensation on substrate and a unit for realizing the same and at least one additional component
US20080210168A1 (en) * 2007-01-18 2008-09-04 May Su Single chamber, multiple tube high efficiency vertical furnace system

Also Published As

Publication number Publication date
WO2011131172A2 (de) 2011-10-27
EP2561114A2 (de) 2013-02-27
PL2561114T3 (pl) 2015-05-29
DE112011101427A5 (de) 2013-02-28
EP2565292A1 (de) 2013-03-06
EP2565292B1 (de) 2014-08-13
WO2011131172A3 (de) 2012-03-01
DE102010017896A1 (de) 2011-10-27
US20130209706A1 (en) 2013-08-15
EP2561114B1 (de) 2014-11-05

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