PL2396447T3 - Sposób obróbki wiązką jonów warstwy metalicznej nałożonej na substracie i otrzymany substrat - Google Patents

Sposób obróbki wiązką jonów warstwy metalicznej nałożonej na substracie i otrzymany substrat

Info

Publication number
PL2396447T3
PL2396447T3 PL10708319T PL10708319T PL2396447T3 PL 2396447 T3 PL2396447 T3 PL 2396447T3 PL 10708319 T PL10708319 T PL 10708319T PL 10708319 T PL10708319 T PL 10708319T PL 2396447 T3 PL2396447 T3 PL 2396447T3
Authority
PL
Poland
Prior art keywords
substrate
metal layer
ion beam
layer deposited
attained
Prior art date
Application number
PL10708319T
Other languages
English (en)
Inventor
Denis Busardo
Frédéric GUERNALEC
Original Assignee
Quertech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quertech filed Critical Quertech
Publication of PL2396447T3 publication Critical patent/PL2396447T3/pl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/42—Platinum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/48—Silver or gold
    • B01J23/52—Gold
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/72—Copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74—Iron group metals
    • B01J23/745—Iron
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74—Iron group metals
    • B01J23/755—Nickel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/20—Catalysts, in general, characterised by their form or physical properties characterised by their non-solid state
    • B01J35/23—Catalysts, in general, characterised by their form or physical properties characterised by their non-solid state in a colloidal state
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/349—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of flames, plasmas or lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/10—Noble metals or compounds thereof
    • B01D2255/102—Platinum group metals
    • B01D2255/1021—Platinum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/20—Metals or compounds thereof
    • B01D2255/207—Transition metals
    • B01D2255/20738—Iron
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/20—Metals or compounds thereof
    • B01D2255/207—Transition metals
    • B01D2255/20753—Nickel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/20—Metals or compounds thereof
    • B01D2255/207—Transition metals
    • B01D2255/20761—Copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/90—Physical characteristics of catalysts
    • B01D2255/92—Dimensions
    • B01D2255/9202—Linear dimensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/01—Engine exhaust gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Catalysts (AREA)
PL10708319T 2009-02-10 2010-02-10 Sposób obróbki wiązką jonów warstwy metalicznej nałożonej na substracie i otrzymany substrat PL2396447T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0950824A FR2941878B1 (fr) 2009-02-10 2009-02-10 Procede de traitement par un faisceau d'ions d'une couche metallique deposee sur un substrat
PCT/FR2010/050219 WO2010092297A1 (fr) 2009-02-10 2010-02-10 Procede de traitement par un faisceau d'ions d'une couche metallique deposee sur un substrat
EP10708319.8A EP2396447B1 (fr) 2009-02-10 2010-02-10 Procede de traitement par un faisceau d'ions d'une couche metallique deposee sur un substrat et substrat obtenu

Publications (1)

Publication Number Publication Date
PL2396447T3 true PL2396447T3 (pl) 2019-04-30

Family

ID=41130378

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10708319T PL2396447T3 (pl) 2009-02-10 2010-02-10 Sposób obróbki wiązką jonów warstwy metalicznej nałożonej na substracie i otrzymany substrat

Country Status (9)

Country Link
EP (1) EP2396447B1 (pl)
CN (1) CN102362006B (pl)
DK (1) DK2396447T3 (pl)
ES (1) ES2706673T3 (pl)
FR (1) FR2941878B1 (pl)
PL (1) PL2396447T3 (pl)
SI (1) SI2396447T1 (pl)
WO (1) WO2010092297A1 (pl)
ZA (1) ZA201105812B (pl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012177900A1 (en) 2011-06-22 2012-12-27 Research Triangle Institute, International Bipolar microelectronic device
GB201113168D0 (en) 2011-08-01 2011-09-14 Univ Birmingham Method for producing particulate clusters
FR3009217B1 (fr) * 2013-08-01 2016-10-28 Quertech Procede de traitement de poudre a base d'oxyde de cerium
EP2876649B1 (en) * 2013-11-21 2017-10-11 Airbus DS GmbH Method for manufacturing a charge dissipative surface layer
US10612129B2 (en) 2016-06-28 2020-04-07 Corning Incorporated Thin glass based article with high resistance to contact damage
EP3807444A1 (en) * 2018-06-12 2021-04-21 AGC Glass Europe Method for preparing catalytic nanoparticles, catalyst surfaces, and/or catalysts
CN113020612A (zh) * 2021-02-22 2021-06-25 上海理工大学 一种大小连续可调的铜纳米球粒制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4364969A (en) * 1979-12-13 1982-12-21 United Kingdom Atomic Energy Authority Method of coating titanium and its alloys
EP0902728A1 (en) * 1996-05-14 1999-03-24 E.I. Du Pont De Nemours And Company Catalyst compositions of nanoparticulate metal on a refractory support
KR20040005977A (ko) * 2001-05-22 2004-01-16 인피네온 테크놀로지스 아게 미리 규정된 층 두께 프로파일을 가진 층의 제조 방법
US8178165B2 (en) * 2005-01-21 2012-05-15 The Regents Of The University Of California Method for fabricating a long-range ordered periodic array of nano-features, and articles comprising same
EP1862562A1 (en) * 2006-05-31 2007-12-05 Mec Company Ltd. Method for manufacturing substrate, and vapor deposition apparatus used for the same

Also Published As

Publication number Publication date
FR2941878A1 (fr) 2010-08-13
WO2010092297A1 (fr) 2010-08-19
FR2941878B1 (fr) 2011-05-06
SI2396447T1 (sl) 2019-03-29
ES2706673T3 (es) 2019-03-29
ZA201105812B (en) 2012-11-28
EP2396447A1 (fr) 2011-12-21
DK2396447T3 (en) 2019-02-25
CN102362006B (zh) 2014-01-01
EP2396447B1 (fr) 2018-10-31
CN102362006A (zh) 2012-02-22

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