PL2231518T3 - Instalacja oczyszczania materiału półprzewodzącego palnikiem plazmowym - Google Patents

Instalacja oczyszczania materiału półprzewodzącego palnikiem plazmowym

Info

Publication number
PL2231518T3
PL2231518T3 PL08867613T PL08867613T PL2231518T3 PL 2231518 T3 PL2231518 T3 PL 2231518T3 PL 08867613 T PL08867613 T PL 08867613T PL 08867613 T PL08867613 T PL 08867613T PL 2231518 T3 PL2231518 T3 PL 2231518T3
Authority
PL
Poland
Prior art keywords
semiconductor material
plasma torch
purifying
crucible
intended
Prior art date
Application number
PL08867613T
Other languages
English (en)
Inventor
Pascal Rivat
Emmanuel Flahaut
Christian Trassy
François Cocco
Etienne Grossier
Original Assignee
Efd Induction Sa
Commissariat Energie Atomique
Centre Nat Rech Scient
Ferropem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Efd Induction Sa, Commissariat Energie Atomique, Centre Nat Rech Scient, Ferropem filed Critical Efd Induction Sa
Publication of PL2231518T3 publication Critical patent/PL2231518T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
PL08867613T 2007-12-27 2008-12-24 Instalacja oczyszczania materiału półprzewodzącego palnikiem plazmowym PL2231518T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0760405A FR2925891B1 (fr) 2007-12-27 2007-12-27 Installation de purification d'un materiau semiconducteur a torche a plasma
EP08867613A EP2231518B1 (fr) 2007-12-27 2008-12-24 Installation de purification d'un materiau semiconducteur a torche a plasma
PCT/FR2008/052415 WO2009083694A1 (fr) 2007-12-27 2008-12-24 Installation de purification d'un materiau semiconducteur a torche a plasma

Publications (1)

Publication Number Publication Date
PL2231518T3 true PL2231518T3 (pl) 2011-12-30

Family

ID=39643037

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08867613T PL2231518T3 (pl) 2007-12-27 2008-12-24 Instalacja oczyszczania materiału półprzewodzącego palnikiem plazmowym

Country Status (7)

Country Link
EP (1) EP2231518B1 (pl)
CN (1) CN101970351B (pl)
AT (1) ATE518807T1 (pl)
ES (1) ES2370135T3 (pl)
FR (1) FR2925891B1 (pl)
PL (1) PL2231518T3 (pl)
WO (1) WO2009083694A1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2928641B1 (fr) 2008-03-14 2010-03-26 Centre Nat Rech Scient Procede de purification de silicium pour applications photovoltaiques
US20210246036A1 (en) 2018-06-15 2021-08-12 Solar Silicon Gmbh Method for producing elemental silicon

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3646570B2 (ja) * 1999-07-01 2005-05-11 三菱住友シリコン株式会社 シリコン連続鋳造方法
JP2007314403A (ja) * 2006-05-29 2007-12-06 Sharp Corp シリコンの精製方法および精製装置

Also Published As

Publication number Publication date
EP2231518B1 (fr) 2011-08-03
FR2925891A1 (fr) 2009-07-03
WO2009083694A1 (fr) 2009-07-09
FR2925891B1 (fr) 2010-02-26
CN101970351A (zh) 2011-02-09
ES2370135T3 (es) 2011-12-13
EP2231518A1 (fr) 2010-09-29
ATE518807T1 (de) 2011-08-15
CN101970351B (zh) 2012-12-05

Similar Documents

Publication Publication Date Title
US9776876B2 (en) Chunk polycrystalline silicon and process for cleaning polycrystalline silicon chunks
JP5950855B2 (ja) イオン注入装置およびイオン注入装置のクリーニング方法
RS51624B (en) VACUUM STERILIZATION PROCEDURE AND DEVICE
RU2007146762A (ru) Очистка материалов обработкой плазмой на основе водорода
TW200615405A (en) Systems and methods for manufacturing granular material, and for measuring and reducing dust in granular material
KR102303581B1 (ko) 다결정 실리콘 로드 및 그 제조 방법
GB2393393B (en) A pre-sterilisation ante-chamber for a processing enclosure
RU2012146727A (ru) Наклонная печь
PL1805127T3 (pl) Sposób usuwania zanieczyszczeń ze strumienia upuszczanego z utleniacza
TW200712252A (en) Methods and systems for increasing substrate temperature in plasma reactors
TW200706232A (en) Gas separating device and gas separating method
KR20070116858A (ko) 고순도 실리콘 제작 방법
TW201514091A (zh) 氙回收系統及方法
PL2231518T3 (pl) Instalacja oczyszczania materiału półprzewodzącego palnikiem plazmowym
TW200642954A (en) Method for purification of disilicon hexachloride and high purity disilicon hexachloride
TW200609031A (en) Removal of metal contaminants from ultra-high purity gases
EP1616872A3 (en) Purification method for organometallic compounds and organometallic compounds obtained therefrom
JP4430913B2 (ja) ガス供給方法及び装置
JP6328942B2 (ja) 磁石粉砕装置
JP2011026205A (ja) アセチレンの製造方法
JP2005109453A5 (pl)
US7943095B2 (en) Purifier
DE60106838D1 (de) Lösungsmittelmischung zur Anwendung bei der Entfernung hochreiner Vorläufer
JP2014117675A (ja) 排ガスの処理方法および排ガス処理装置
JPH075288B2 (ja) 分割されたけい素をプラズマの下で精製する方法