PL197962A1 - Sposob usuwania obszarow materialow z podloza,zwlaszcza przy wytwarzaniu masek fotolitograficznych - Google Patents

Sposob usuwania obszarow materialow z podloza,zwlaszcza przy wytwarzaniu masek fotolitograficznych

Info

Publication number
PL197962A1
PL197962A1 PL19796277A PL19796277A PL197962A1 PL 197962 A1 PL197962 A1 PL 197962A1 PL 19796277 A PL19796277 A PL 19796277A PL 19796277 A PL19796277 A PL 19796277A PL 197962 A1 PL197962 A1 PL 197962A1
Authority
PL
Poland
Prior art keywords
photolitographic
masks
substrate
materials
production
Prior art date
Application number
PL19796277A
Other languages
English (en)
Other versions
PL112654B1 (en
Inventor
Robert A Geshner
Joseph Mitchell
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of PL197962A1 publication Critical patent/PL197962A1/pl
Publication of PL112654B1 publication Critical patent/PL112654B1/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
PL1977197962A 1976-05-10 1977-05-07 Method of removal of isolated areas of materials from the substrate,especially during manufacture of photolitographic masks PL112654B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68496576A 1976-05-10 1976-05-10

Publications (2)

Publication Number Publication Date
PL197962A1 true PL197962A1 (pl) 1978-01-02
PL112654B1 PL112654B1 (en) 1980-10-31

Family

ID=24750240

Family Applications (1)

Application Number Title Priority Date Filing Date
PL1977197962A PL112654B1 (en) 1976-05-10 1977-05-07 Method of removal of isolated areas of materials from the substrate,especially during manufacture of photolitographic masks

Country Status (6)

Country Link
US (1) US4105468A (pl)
JP (1) JPS5310975A (pl)
DE (1) DE2719902A1 (pl)
GB (1) GB1530978A (pl)
PL (1) PL112654B1 (pl)
SE (1) SE7705053L (pl)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4350564A (en) * 1980-10-27 1982-09-21 General Electric Company Method of etching metallic materials including a major percentage of chromium
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
CH660533A5 (de) * 1982-08-23 1987-04-30 Gravure Res Inst Verfahren und vorrichtung zum bilden von rasterpunkten in einem tiefdruckzylinder.
GB2132789A (en) * 1982-11-24 1984-07-11 Western Electric Co Method of pattern generation
US4569695A (en) * 1983-04-21 1986-02-11 Nec Corporation Method of cleaning a photo-mask
US4911761A (en) * 1984-05-21 1990-03-27 Cfm Technologies Research Associates Process and apparatus for drying surfaces
US4778532A (en) * 1985-06-24 1988-10-18 Cfm Technologies Limited Partnership Process and apparatus for treating wafers with process fluids
US4984597B1 (en) * 1984-05-21 1999-10-26 Cfmt Inc Apparatus for rinsing and drying surfaces
US4713518A (en) * 1984-06-08 1987-12-15 Semiconductor Energy Laboratory Co., Ltd. Electronic device manufacturing methods
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
ATE258084T1 (de) * 1991-10-04 2004-02-15 Cfmt Inc Superreinigung von komplizierten mikroteilchen
US6039059A (en) 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
US6165649A (en) * 1997-01-21 2000-12-26 International Business Machines Corporation Methods for repair of photomasks
US6843929B1 (en) * 2000-02-28 2005-01-18 International Business Machines Corporation Accelerated etching of chromium

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3539408A (en) * 1967-08-11 1970-11-10 Western Electric Co Methods of etching chromium patterns and photolithographic masks so produced
US3673018A (en) * 1969-05-08 1972-06-27 Rca Corp Method of fabrication of photomasks
US3947801A (en) * 1975-01-23 1976-03-30 Rca Corporation Laser-trimmed resistor

Also Published As

Publication number Publication date
JPS5337707B2 (pl) 1978-10-11
JPS5310975A (en) 1978-01-31
PL112654B1 (en) 1980-10-31
SE7705053L (sv) 1977-11-11
US4105468A (en) 1978-08-08
DE2719902A1 (de) 1977-11-24
GB1530978A (en) 1978-11-01

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Legal Events

Date Code Title Description
RECP Rectifications of patent specification