PL1926839T3 - Target napylający z warstwą wiążącą o zmiennej grubości pod materiałem targetu - Google Patents
Target napylający z warstwą wiążącą o zmiennej grubości pod materiałem targetuInfo
- Publication number
- PL1926839T3 PL1926839T3 PL06802694T PL06802694T PL1926839T3 PL 1926839 T3 PL1926839 T3 PL 1926839T3 PL 06802694 T PL06802694 T PL 06802694T PL 06802694 T PL06802694 T PL 06802694T PL 1926839 T3 PL1926839 T3 PL 1926839T3
- Authority
- PL
- Poland
- Prior art keywords
- bonding layer
- varying thickness
- thickness under
- target material
- sputtering target
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/229,840 US8123919B2 (en) | 2005-09-20 | 2005-09-20 | Sputtering target with bonding layer of varying thickness under target material |
PCT/US2006/034008 WO2007035227A2 (en) | 2005-09-20 | 2006-08-31 | Sputtering target with bonding layer of varying thickness under target material |
EP06802694.7A EP1926839B1 (en) | 2005-09-20 | 2006-08-31 | Sputtering target with bonding layer of varying thickness under target material |
Publications (1)
Publication Number | Publication Date |
---|---|
PL1926839T3 true PL1926839T3 (pl) | 2014-10-31 |
Family
ID=37882958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL06802694T PL1926839T3 (pl) | 2005-09-20 | 2006-08-31 | Target napylający z warstwą wiążącą o zmiennej grubości pod materiałem targetu |
Country Status (6)
Country | Link |
---|---|
US (1) | US8123919B2 (pl) |
EP (1) | EP1926839B1 (pl) |
CA (1) | CA2620721C (pl) |
ES (1) | ES2488410T3 (pl) |
PL (1) | PL1926839T3 (pl) |
WO (1) | WO2007035227A2 (pl) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070074970A1 (en) * | 2005-09-20 | 2007-04-05 | Cp Technologies, Inc. | Device and method of manufacturing sputtering targets |
US20070062803A1 (en) * | 2005-09-20 | 2007-03-22 | Cp Technologies, Inc. | Device and method of manufacturing sputtering targets |
US20070062804A1 (en) * | 2005-09-20 | 2007-03-22 | Cp Technologies, Inc. | Device and method of manufacturing sputtering targets |
US20080105542A1 (en) * | 2006-11-08 | 2008-05-08 | Purdy Clifford C | System and method of manufacturing sputtering targets |
US20100025229A1 (en) * | 2008-07-30 | 2010-02-04 | Guardian Industries Corp. | Apparatus and method for sputtering target debris reduction |
US20100044222A1 (en) * | 2008-08-21 | 2010-02-25 | Guardian Industries Corp., | Sputtering target including magnetic field uniformity enhancing sputtering target backing tube |
US8134069B2 (en) | 2009-04-13 | 2012-03-13 | Miasole | Method and apparatus for controllable sodium delivery for thin film photovoltaic materials |
US7785921B1 (en) | 2009-04-13 | 2010-08-31 | Miasole | Barrier for doped molybdenum targets |
US20110067998A1 (en) * | 2009-09-20 | 2011-03-24 | Miasole | Method of making an electrically conductive cadmium sulfide sputtering target for photovoltaic manufacturing |
JP5730888B2 (ja) | 2009-10-26 | 2015-06-10 | ジェネラル・プラズマ・インコーポレーテッド | ロータリーマグネトロンマグネットバー、およびこれを含む高いターゲット利用のための装置 |
CN102959120B9 (zh) * | 2010-06-30 | 2018-08-21 | 第一太阳能有限公司 | 锡酸镉溅射靶 |
US10043921B1 (en) | 2011-12-21 | 2018-08-07 | Beijing Apollo Ding Rong Solar Technology Co., Ltd. | Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof |
CN110484886B (zh) * | 2019-09-12 | 2021-09-17 | 南京达迈科技实业有限公司 | 一种含微量稀土元素的镍铼合金旋转管状靶材及制备方法 |
CN113151791A (zh) * | 2021-03-15 | 2021-07-23 | 宁波赉晟新材料科技有限责任公司 | 一种电触头材料表面快速沉积银镀膜方法 |
CN115491646A (zh) * | 2022-09-20 | 2022-12-20 | 中核四0四有限公司 | 一种管材内壁镀膜的溅射靶及其溅射结构、镀膜方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0045822B1 (en) * | 1980-08-08 | 1985-05-29 | Battelle Development Corporation | Cylindrical magnetron sputtering cathode |
US5354446A (en) * | 1988-03-03 | 1994-10-11 | Asahi Glass Company Ltd. | Ceramic rotatable magnetron sputtering cathode target and process for its production |
US5427665A (en) * | 1990-07-11 | 1995-06-27 | Leybold Aktiengesellschaft | Process and apparatus for reactive coating of a substrate |
CA2089149C (en) * | 1990-08-10 | 2002-11-26 | Eric R. Dickey | Shielding for arc suppression in rotating magnetron sputtering systems |
BE1007067A3 (nl) | 1992-07-15 | 1995-03-07 | Emiel Vanderstraeten Besloten | Sputterkathode en werkwijze voor het vervaardigen van deze kathode. |
JPH07173622A (ja) | 1993-12-17 | 1995-07-11 | Kobe Steel Ltd | Pvd法用円筒状ターゲット |
US5593082A (en) * | 1994-11-15 | 1997-01-14 | Tosoh Smd, Inc. | Methods of bonding targets to backing plate members using solder pastes and target/backing plate assemblies bonded thereby |
US6193856B1 (en) * | 1995-08-23 | 2001-02-27 | Asahi Glass Company Ltd. | Target and process for its production, and method for forming a film having a highly refractive index |
US6774339B1 (en) * | 1999-11-09 | 2004-08-10 | Tosoh Smd, Inc. | Hermetic sealing of target/backing plate assemblies using electron beam melted indium or tin |
US6787003B2 (en) * | 1999-12-03 | 2004-09-07 | N.V. Bekaert S.A. | Sputtering target and methods of making and using same |
TW555874B (en) * | 2000-09-08 | 2003-10-01 | Asahi Glass Co Ltd | Cylindrical target and its production method |
EP1341948A1 (de) * | 2000-11-27 | 2003-09-10 | Unaxis Trading AG | Target mit dickenprofilierung für rf magnetron |
US20040115362A1 (en) * | 2002-01-14 | 2004-06-17 | Klause Hartig | Photocatalytic sputtering targets and methods for the production and use thereof |
US7014741B2 (en) * | 2003-02-21 | 2006-03-21 | Von Ardenne Anlagentechnik Gmbh | Cylindrical magnetron with self cleaning target |
-
2005
- 2005-09-20 US US11/229,840 patent/US8123919B2/en not_active Expired - Fee Related
-
2006
- 2006-08-31 CA CA2620721A patent/CA2620721C/en not_active Expired - Fee Related
- 2006-08-31 EP EP06802694.7A patent/EP1926839B1/en not_active Not-in-force
- 2006-08-31 ES ES06802694.7T patent/ES2488410T3/es active Active
- 2006-08-31 PL PL06802694T patent/PL1926839T3/pl unknown
- 2006-08-31 WO PCT/US2006/034008 patent/WO2007035227A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US20070062805A1 (en) | 2007-03-22 |
ES2488410T3 (es) | 2014-08-27 |
EP1926839B1 (en) | 2014-05-14 |
WO2007035227A3 (en) | 2009-05-07 |
EP1926839A4 (en) | 2010-11-03 |
CA2620721C (en) | 2011-04-05 |
EP1926839A2 (en) | 2008-06-04 |
CA2620721A1 (en) | 2007-03-29 |
WO2007035227A2 (en) | 2007-03-29 |
US8123919B2 (en) | 2012-02-28 |
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