PL1752556T3 - Katoda cylindryczna do napylania jonowego - Google Patents

Katoda cylindryczna do napylania jonowego

Info

Publication number
PL1752556T3
PL1752556T3 PL05016738T PL05016738T PL1752556T3 PL 1752556 T3 PL1752556 T3 PL 1752556T3 PL 05016738 T PL05016738 T PL 05016738T PL 05016738 T PL05016738 T PL 05016738T PL 1752556 T3 PL1752556 T3 PL 1752556T3
Authority
PL
Poland
Prior art keywords
target
sputtering
target carrier
tubular cathode
layer
Prior art date
Application number
PL05016738T
Other languages
English (en)
Inventor
Manfred Schuhmacher
Gerhard Joos
Original Assignee
Applied Mat Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Mat Gmbh & Co Kg filed Critical Applied Mat Gmbh & Co Kg
Publication of PL1752556T3 publication Critical patent/PL1752556T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
PL05016738T 2005-08-02 2005-08-02 Katoda cylindryczna do napylania jonowego PL1752556T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05016738A EP1752556B1 (de) 2005-08-02 2005-08-02 Rohrkathode für die Verwendung bei einem Sputterprozess

Publications (1)

Publication Number Publication Date
PL1752556T3 true PL1752556T3 (pl) 2008-03-31

Family

ID=35395741

Family Applications (1)

Application Number Title Priority Date Filing Date
PL05016738T PL1752556T3 (pl) 2005-08-02 2005-08-02 Katoda cylindryczna do napylania jonowego

Country Status (10)

Country Link
US (1) US20070029192A1 (pl)
EP (1) EP1752556B1 (pl)
JP (1) JP2007039803A (pl)
CN (1) CN1908226A (pl)
AT (1) ATE377098T1 (pl)
DE (1) DE502005001840D1 (pl)
ES (1) ES2293442T3 (pl)
PL (1) PL1752556T3 (pl)
PT (1) PT1752556E (pl)
TW (1) TWI304841B (pl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4680841B2 (ja) * 2006-06-29 2011-05-11 日本ピストンリング株式会社 Ｐｖｄ用筒状ターゲット
DE102006060512A1 (de) * 2006-12-19 2008-06-26 W.C. Heraeus Gmbh Sputtertargetanordnung
JP5482020B2 (ja) 2008-09-25 2014-04-23 東ソー株式会社 円筒形スパッタリングターゲット及びその製造方法
ES2461493T3 (es) * 2009-01-30 2014-05-20 Praxair S.T. Technology, Inc. Objetivo tubular
EP2276054A1 (en) * 2009-07-13 2011-01-19 Applied Materials, Inc. Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
US20140021038A1 (en) * 2011-03-01 2014-01-23 Sharp Kabushiki Kaisha Sputtering target, method for manufacturing the same, and method for manufacturing thin film transistor
AT12695U1 (de) 2011-04-08 2012-10-15 Plansee Se Rohrtarget mit schutzvorrichtung
DE202011104768U1 (de) 2011-08-24 2011-11-22 Fhr Anlagenbau Gmbh Befestigung für ein längs geteiltes Rohrtarget
WO2013026491A1 (en) * 2011-08-25 2013-02-28 Applied Materials, Inc. Sputtering apparatus and method
DE102013011074A1 (de) 2013-07-03 2015-01-08 Oerlikon Trading Ag An eine indirekte Kühlvorrichtung angepasstes Target mit Kühlplatte
AT14911U1 (de) 2015-05-06 2016-08-15 Plansee Se Rohrtarget
CN110312821B (zh) * 2017-01-09 2022-08-23 应用材料公司 用于在真空沉积工艺中在基板上沉积材料的方法、设备和靶材
CN110205595B (zh) * 2019-06-12 2023-10-27 北京道荣新兴能源有限公司 内腔式磁控溅射设备与方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4904362A (en) * 1987-07-24 1990-02-27 Miba Gleitlager Aktiengesellschaft Bar-shaped magnetron or sputter cathode arrangement
DE4015388C2 (de) * 1990-05-14 1997-07-17 Leybold Ag Kathodenzerstäubungsvorrichtung
DE19535894A1 (de) * 1995-09-27 1997-04-03 Leybold Materials Gmbh Target für die Sputterkathode einer Vakuumbeschichtungsanlage und Verfahren zu seiner Herstellung
US6582572B2 (en) 2000-06-01 2003-06-24 Seagate Technology Llc Target fabrication method for cylindrical cathodes
CN1281780C (zh) 2000-09-08 2006-10-25 旭硝子株式会社 圆筒状靶及其制造方法
US6409897B1 (en) 2000-09-20 2002-06-25 Poco Graphite, Inc. Rotatable sputter target
AU2003248835A1 (en) * 2002-07-02 2004-01-23 Academy Precision Materials A Division Of Academy Corporation Rotary target and method for onsite mechanical assembly of rotary target
DE10231203B4 (de) 2002-07-10 2009-09-10 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Targetträgeranordnung
DE102004031161A1 (de) 2003-06-27 2005-01-27 Zentrum für Material- und Umwelttechnik GmbH Targetanordnung
US7550066B2 (en) * 2004-07-09 2009-06-23 Applied Materials, Inc. Staggered target tiles

Also Published As

Publication number Publication date
EP1752556B1 (de) 2007-10-31
TW200706675A (en) 2007-02-16
ES2293442T3 (es) 2008-03-16
EP1752556A1 (de) 2007-02-14
CN1908226A (zh) 2007-02-07
ATE377098T1 (de) 2007-11-15
JP2007039803A (ja) 2007-02-15
DE502005001840D1 (de) 2007-12-13
US20070029192A1 (en) 2007-02-08
TWI304841B (en) 2009-01-01
PT1752556E (pt) 2008-01-22

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