NO852101L - Transversal hoeyfrekvent gassutladningslaser med ekstern elektrode - Google Patents
Transversal hoeyfrekvent gassutladningslaser med ekstern elektrodeInfo
- Publication number
- NO852101L NO852101L NO852101A NO852101A NO852101L NO 852101 L NO852101 L NO 852101L NO 852101 A NO852101 A NO 852101A NO 852101 A NO852101 A NO 852101A NO 852101 L NO852101 L NO 852101L
- Authority
- NO
- Norway
- Prior art keywords
- laser
- mirror
- chamber
- electrodes
- flange
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 230000005684 electric field Effects 0.000 claims abstract description 18
- 230000005284 excitation Effects 0.000 claims abstract description 12
- 238000001816 cooling Methods 0.000 claims abstract description 7
- 230000006835 compression Effects 0.000 claims description 13
- 238000007906 compression Methods 0.000 claims description 13
- 239000003989 dielectric material Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 3
- 238000005219 brazing Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 claims 1
- 230000008878 coupling Effects 0.000 abstract description 8
- 238000010168 coupling process Methods 0.000 abstract description 8
- 238000005859 coupling reaction Methods 0.000 abstract description 8
- 239000007788 liquid Substances 0.000 abstract 1
- 239000003566 sealing material Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 41
- 238000010276 construction Methods 0.000 description 21
- 239000012809 cooling fluid Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 9
- 230000001939 inductive effect Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 5
- 238000005553 drilling Methods 0.000 description 5
- 230000014509 gene expression Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 230000015556 catabolic process Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000013585 weight reducing agent Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
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- 230000005281 excited state Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000001976 improved effect Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 229940065287 selenium compound Drugs 0.000 description 1
- 150000003343 selenium compounds Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Pyridine Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/539,993 US4596018A (en) | 1983-10-07 | 1983-10-07 | External electrode transverse high frequency gas discharge laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO852101L true NO852101L (no) | 1985-05-24 |
Family
ID=24153521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO852101A NO852101L (no) | 1983-10-07 | 1985-05-24 | Transversal hoeyfrekvent gassutladningslaser med ekstern elektrode |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4596018A (fr) |
| EP (1) | EP0146509A3 (fr) |
| JP (1) | JPS61500141A (fr) |
| CA (1) | CA1249649A (fr) |
| DK (1) | DK251185A (fr) |
| ES (1) | ES536482A0 (fr) |
| FI (1) | FI852290L (fr) |
| IL (1) | IL73160A (fr) |
| NO (1) | NO852101L (fr) |
| WO (1) | WO1985001838A1 (fr) |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0183023B1 (fr) * | 1984-11-24 | 1991-02-20 | Trumpf GmbH & Co | Laser à gaz avec accouplement transversal d'énergie à haute fréquence |
| US4633478A (en) * | 1985-06-17 | 1986-12-30 | Hughes Aircraft Company | High efficiency RF excited gas laser with transverse discharge excitation |
| US4677635A (en) * | 1985-10-10 | 1987-06-30 | Hughes Aircraft Company | RF-excited CO2 waveguide laser with extended tuning range |
| DE3541744A1 (de) * | 1985-11-26 | 1987-05-27 | Heraeus Gmbh W C | Gaslaser |
| GB2185846B (en) * | 1986-01-24 | 1989-12-20 | Ferranti Plc | Ring laser |
| DE8619083U1 (de) * | 1986-07-16 | 1987-11-12 | Rofin-Sinar Laser Gmbh, 22113 Hamburg | Gaslaser mit Hochfrequenzanregung |
| JPS6327078A (ja) * | 1986-07-18 | 1988-02-04 | Fanuc Ltd | ガスレ−ザ装置 |
| JPH0787255B2 (ja) * | 1986-12-23 | 1995-09-20 | フアナツク株式会社 | 高周波放電励起レ−ザ装置 |
| US4833686A (en) * | 1987-06-29 | 1989-05-23 | Hughes Aircraft Company | Electrodes for transversely excited gas lasers |
| US5196905A (en) * | 1988-06-22 | 1993-03-23 | Litton Systems, Inc. | Radio frequency excited ring laser gyroscope |
| US5442441A (en) * | 1987-10-28 | 1995-08-15 | Litton Systems, Inc. | Radio frequency excited ring laser gyro |
| US4892497A (en) * | 1987-11-05 | 1990-01-09 | American Laser Corporation | Method for assembly of laser mirrors |
| GB8728829D0 (en) * | 1987-12-10 | 1988-01-27 | British Aerospace | Ring laser gyroscopes |
| DE3843564A1 (de) * | 1988-12-23 | 1990-06-28 | Standard Elektrik Lorenz Ag | Verfahren zur ueberpruefung von verbindungs- und/oder schalteinrichtungen und/oder -leitungen |
| US5260961A (en) * | 1990-11-01 | 1993-11-09 | Florod Corporation | Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses |
| US5528613A (en) * | 1993-04-12 | 1996-06-18 | Macken; John A. | Laser apparatus utilizing a magnetically enhanced electrical discharge with transverse AC stabilization |
| US5592504A (en) * | 1995-10-10 | 1997-01-07 | Cameron; Harold A. | Transversely excited non waveguide RF gas laser configuration |
| US5661746A (en) * | 1995-10-17 | 1997-08-26 | Universal Laser Syatems, Inc. | Free-space gas slab laser |
| US5867517A (en) * | 1997-04-30 | 1999-02-02 | Universal Laser Systems, Inc. | Integrated gas laser RF feed and fill apparatus and method |
| US5881087A (en) * | 1997-04-30 | 1999-03-09 | Universal Laser Systems, Inc. | Gas laser tube design |
| US5901167A (en) * | 1997-04-30 | 1999-05-04 | Universal Laser Systems, Inc. | Air cooled gas laser |
| US6466601B1 (en) * | 2001-04-13 | 2002-10-15 | Cymer, Inc. | Beam seal for line narrowed production laser |
| AU2002237668A1 (en) * | 2000-11-21 | 2002-06-03 | Michael R. Adams | Portable low-power gas discharge laser |
| US6498832B2 (en) | 2001-03-13 | 2002-12-24 | Euv Llc | Electrode configuration for extreme-UV electrical discharge source |
| US6792011B2 (en) * | 2001-04-19 | 2004-09-14 | Hrl Laboratories, Llc | Frequency modulated laser with high modulation bandwidth |
| US9771648B2 (en) | 2004-08-13 | 2017-09-26 | Zond, Inc. | Method of ionized physical vapor deposition sputter coating high aspect-ratio structures |
| US9123508B2 (en) | 2004-02-22 | 2015-09-01 | Zond, Llc | Apparatus and method for sputtering hard coatings |
| US8295319B2 (en) | 2010-11-23 | 2012-10-23 | Iradion Laser, Inc. | Ceramic gas laser having an integrated beam shaping waveguide |
| US8422528B2 (en) * | 2011-02-24 | 2013-04-16 | Iradion Laser, Inc. | Ceramic slab, free-space and waveguide lasers |
| US8611391B2 (en) | 2011-05-03 | 2013-12-17 | Coherent, Inc. | Waveguide CO2 laser with mutiply folded resonator |
| DK2565994T3 (en) | 2011-09-05 | 2014-03-10 | Alltec Angewandte Laserlicht Technologie Gmbh | Laser device and method for marking an object |
| DK2565996T3 (da) | 2011-09-05 | 2014-01-13 | Alltec Angewandte Laserlicht Technologie Gmbh | Laserindretning med en laserenhed og en fluidbeholder til en køleindretning af laserenheden |
| EP2564973B1 (fr) * | 2011-09-05 | 2014-12-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Appareil de marquage avec une pluralité de lasers et un déflecteur mélangeur |
| EP2564972B1 (fr) * | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Appareil de marquage avec plusieurs lasers et des moyens de déflection et de focalisation pour chaque faisceau lser |
| ES2544269T3 (es) * | 2011-09-05 | 2015-08-28 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Aparato de marcado con una pluralidad de láseres de gas con tubos de resonancia y medios de deflexión ajustables individualmente |
| ES2544034T3 (es) | 2011-09-05 | 2015-08-27 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Aparato de marcado con al menos un láser de gas y un termodisipador |
| ES2438751T3 (es) | 2011-09-05 | 2014-01-20 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Dispositivo y procedimiento para marcar un objeto por medio de un rayo láser |
| ES2530070T3 (es) * | 2011-09-05 | 2015-02-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación |
| JP6411120B2 (ja) * | 2014-08-04 | 2018-10-24 | 株式会社アマダミヤチ | レーザ装置 |
| US10404030B2 (en) | 2015-02-09 | 2019-09-03 | Iradion Laser, Inc. | Flat-folded ceramic slab lasers |
| US10333268B2 (en) | 2016-05-05 | 2019-06-25 | Access Laser | Dielectric electrode assembly and method of manufacture thereof |
| US10593776B2 (en) | 2016-05-05 | 2020-03-17 | Auroma Technologies, Co., Llc. | Dielectric electrode assembly and method of manufacture thereof |
| EP3516745A4 (fr) | 2016-09-20 | 2020-05-13 | Iradion Laser, Inc. | Lasers à ouverture en retrait |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL128040C (fr) * | 1960-10-07 | |||
| NL272340A (fr) * | 1960-12-28 | |||
| NL284259A (fr) * | 1962-10-11 | |||
| NL137421C (fr) * | 1963-03-06 | |||
| US3302127A (en) * | 1963-04-30 | 1967-01-31 | Avco Corp | Gas laser and method of operation |
| US3396301A (en) * | 1964-04-20 | 1968-08-06 | Nippon Electric Co | Gas laser tube having a hollow elongated cathode electrode |
| US3435363A (en) * | 1965-03-23 | 1969-03-25 | Bell Telephone Labor Inc | Self-focusing laser |
| US3437954A (en) * | 1965-03-31 | 1969-04-08 | Bell Telephone Labor Inc | Optical delay line devices |
| US3492599A (en) * | 1965-09-17 | 1970-01-27 | Bell Telephone Labor Inc | Mode-locked laser pulse generator |
| US3501714A (en) * | 1967-03-13 | 1970-03-17 | Perkin Elmer Corp | Dc excited gas laser tube with conductive sidewalls |
| US3772611A (en) * | 1971-12-27 | 1973-11-13 | Bell Telephone Labor Inc | Waveguide gas laser devices |
| US3748594A (en) * | 1972-06-22 | 1973-07-24 | Avco Corp | Radio frequency electrically excited flowing gas laser |
| US4085386A (en) * | 1973-05-30 | 1978-04-18 | Westinghouse Electric Corporation | Independent initiation technique of glow discharge production in high-pressure gas laser cavities |
| US4112392A (en) * | 1975-09-17 | 1978-09-05 | Andersson Hans E B | Method and apparatus for producing laser pulses with high reproducibility |
| JPS6026310B2 (ja) * | 1977-07-26 | 1985-06-22 | 三菱電機株式会社 | ガスレ−ザ装置 |
| FR2410382A1 (fr) * | 1977-11-24 | 1979-06-22 | Comp Generale Electricite | Laser a gaz |
| US4169251A (en) * | 1978-01-16 | 1979-09-25 | Hughes Aircraft Company | Waveguide gas laser with high frequency transverse discharge excitation |
| US4281841A (en) * | 1978-03-30 | 1981-08-04 | The United States Of America As Represented By The United States Department Of Energy | O-Ring sealing arrangements for ultra-high vacuum systems |
| US4381564A (en) * | 1979-06-28 | 1983-04-26 | United Technologies Corporation | Waveguide laser having a capacitively coupled discharge |
| DE2939121C2 (de) * | 1979-09-27 | 1982-04-29 | Karl-Heinz Dipl.-Phys. 4630 Bochum Krahn | Bifilare, helische Elektrodenanordnung |
| JPS5673484A (en) * | 1979-11-21 | 1981-06-18 | Mitsubishi Electric Corp | Voiceless discharge gas laser device |
| US4352188A (en) * | 1980-07-03 | 1982-09-28 | Hughes Aircraft Company | rf Pumped waveguide laser with inductive loading for enhancing discharge uniformity |
| US4363126A (en) * | 1980-12-10 | 1982-12-07 | United Technologies Corporation | Tuned-circuit RF-excited laser |
| US4359777A (en) * | 1981-01-22 | 1982-11-16 | The United States Of America As Represented By The Secretary Of The Army | High efficiency transversely excited electrodeless gas lasers |
| US4372565A (en) * | 1981-03-17 | 1983-02-08 | Baker Manufacturing Company | Soft metal seal |
| US4353560A (en) * | 1981-12-07 | 1982-10-12 | W-K-M Wellhead Systems, Inc. | Metal seal assembly with deformable sealing ring |
| US4455658A (en) * | 1982-04-20 | 1984-06-19 | Sutter Jr Leroy V | Coupling circuit for use with a transversely excited gas laser |
| US4464760A (en) * | 1982-04-20 | 1984-08-07 | Sutter Jr Leroy V | Elongated chambers for use in combination with a transversely excited gas laser |
| FR2530087B1 (fr) * | 1982-07-09 | 1986-02-14 | Telecommunications Sa | Generateur laser guide d'onde a gaz et procede de fabrication de son guide d'onde |
| US4481634A (en) * | 1983-04-28 | 1984-11-06 | The Regents Of The University Of California | RF Excited metal waveguide laser |
| US4477087A (en) * | 1983-07-20 | 1984-10-16 | Sutter Jr Leroy V | Seal formed out of a hard metal with a plating of soft metals |
| US7395170B2 (en) * | 2001-05-24 | 2008-07-01 | Test Advantage, Inc. | Methods and apparatus for data analysis |
-
1983
- 1983-10-07 US US06/539,993 patent/US4596018A/en not_active Expired - Lifetime
-
1984
- 1984-10-03 ES ES536482A patent/ES536482A0/es active Granted
- 1984-10-03 CA CA000464693A patent/CA1249649A/fr not_active Expired
- 1984-10-03 JP JP85500718A patent/JPS61500141A/ja active Pending
- 1984-10-03 WO PCT/US1984/001597 patent/WO1985001838A1/fr active Application Filing
- 1984-10-04 IL IL73160A patent/IL73160A/xx unknown
- 1984-10-04 EP EP84850295A patent/EP0146509A3/fr not_active Withdrawn
-
1985
- 1985-05-24 NO NO852101A patent/NO852101L/no unknown
- 1985-06-04 DK DK251185A patent/DK251185A/da not_active Application Discontinuation
- 1985-06-07 FI FI852290A patent/FI852290L/fi not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61500141A (ja) | 1986-01-23 |
| WO1985001838A1 (fr) | 1985-04-25 |
| US4596018A (en) | 1986-06-17 |
| DK251185D0 (da) | 1985-06-04 |
| FI852290A0 (fi) | 1985-06-07 |
| EP0146509A3 (fr) | 1987-06-03 |
| ES8601579A1 (es) | 1985-10-16 |
| CA1249649A (fr) | 1989-01-31 |
| ES536482A0 (es) | 1985-10-16 |
| EP0146509A2 (fr) | 1985-06-26 |
| IL73160A (en) | 1989-01-31 |
| IL73160A0 (en) | 1985-01-31 |
| FI852290L (fi) | 1985-06-07 |
| DK251185A (da) | 1985-06-04 |
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