IL73160A - External electrode transverse high frequency gas discharge laser - Google Patents

External electrode transverse high frequency gas discharge laser

Info

Publication number
IL73160A
IL73160A IL73160A IL7316084A IL73160A IL 73160 A IL73160 A IL 73160A IL 73160 A IL73160 A IL 73160A IL 7316084 A IL7316084 A IL 7316084A IL 73160 A IL73160 A IL 73160A
Authority
IL
Israel
Prior art keywords
high frequency
gas discharge
external electrode
discharge laser
frequency gas
Prior art date
Application number
IL73160A
Other languages
English (en)
Other versions
IL73160A0 (en
Original Assignee
Minnesota Laser Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Laser Corp filed Critical Minnesota Laser Corp
Publication of IL73160A0 publication Critical patent/IL73160A0/xx
Publication of IL73160A publication Critical patent/IL73160A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Pyridine Compounds (AREA)
IL73160A 1983-10-07 1984-10-04 External electrode transverse high frequency gas discharge laser IL73160A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/539,993 US4596018A (en) 1983-10-07 1983-10-07 External electrode transverse high frequency gas discharge laser

Publications (2)

Publication Number Publication Date
IL73160A0 IL73160A0 (en) 1985-01-31
IL73160A true IL73160A (en) 1989-01-31

Family

ID=24153521

Family Applications (1)

Application Number Title Priority Date Filing Date
IL73160A IL73160A (en) 1983-10-07 1984-10-04 External electrode transverse high frequency gas discharge laser

Country Status (10)

Country Link
US (1) US4596018A (xx)
EP (1) EP0146509A3 (xx)
JP (1) JPS61500141A (xx)
CA (1) CA1249649A (xx)
DK (1) DK251185A (xx)
ES (1) ES536482A0 (xx)
FI (1) FI852290L (xx)
IL (1) IL73160A (xx)
NO (1) NO852101L (xx)
WO (1) WO1985001838A1 (xx)

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US5260961A (en) * 1990-11-01 1993-11-09 Florod Corporation Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
US5528613A (en) * 1993-04-12 1996-06-18 Macken; John A. Laser apparatus utilizing a magnetically enhanced electrical discharge with transverse AC stabilization
US5592504A (en) * 1995-10-10 1997-01-07 Cameron; Harold A. Transversely excited non waveguide RF gas laser configuration
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
US5867517A (en) * 1997-04-30 1999-02-02 Universal Laser Systems, Inc. Integrated gas laser RF feed and fill apparatus and method
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US6466601B1 (en) * 2001-04-13 2002-10-15 Cymer, Inc. Beam seal for line narrowed production laser
AU2002237668A1 (en) * 2000-11-21 2002-06-03 Michael R. Adams Portable low-power gas discharge laser
US6498832B2 (en) 2001-03-13 2002-12-24 Euv Llc Electrode configuration for extreme-UV electrical discharge source
US6792011B2 (en) * 2001-04-19 2004-09-14 Hrl Laboratories, Llc Frequency modulated laser with high modulation bandwidth
US9771648B2 (en) 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US9123508B2 (en) 2004-02-22 2015-09-01 Zond, Llc Apparatus and method for sputtering hard coatings
US8295319B2 (en) 2010-11-23 2012-10-23 Iradion Laser, Inc. Ceramic gas laser having an integrated beam shaping waveguide
US8422528B2 (en) * 2011-02-24 2013-04-16 Iradion Laser, Inc. Ceramic slab, free-space and waveguide lasers
US8611391B2 (en) 2011-05-03 2013-12-17 Coherent, Inc. Waveguide CO2 laser with mutiply folded resonator
DK2565994T3 (en) 2011-09-05 2014-03-10 Alltec Angewandte Laserlicht Technologie Gmbh Laser device and method for marking an object
DK2565996T3 (da) 2011-09-05 2014-01-13 Alltec Angewandte Laserlicht Technologie Gmbh Laserindretning med en laserenhed og en fluidbeholder til en køleindretning af laserenheden
EP2564973B1 (en) * 2011-09-05 2014-12-10 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers and a combining deflection device
EP2564972B1 (en) * 2011-09-05 2015-08-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam
ES2544269T3 (es) * 2011-09-05 2015-08-28 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres de gas con tubos de resonancia y medios de deflexión ajustables individualmente
ES2544034T3 (es) 2011-09-05 2015-08-27 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con al menos un láser de gas y un termodisipador
ES2438751T3 (es) 2011-09-05 2014-01-20 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Dispositivo y procedimiento para marcar un objeto por medio de un rayo láser
ES2530070T3 (es) * 2011-09-05 2015-02-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación
JP6411120B2 (ja) * 2014-08-04 2018-10-24 株式会社アマダミヤチ レーザ装置
US10404030B2 (en) 2015-02-09 2019-09-03 Iradion Laser, Inc. Flat-folded ceramic slab lasers
US10333268B2 (en) 2016-05-05 2019-06-25 Access Laser Dielectric electrode assembly and method of manufacture thereof
US10593776B2 (en) 2016-05-05 2020-03-17 Auroma Technologies, Co., Llc. Dielectric electrode assembly and method of manufacture thereof
EP3516745A4 (en) 2016-09-20 2020-05-13 Iradion Laser, Inc. LASER WITH SETBACK OPENING

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Also Published As

Publication number Publication date
JPS61500141A (ja) 1986-01-23
WO1985001838A1 (en) 1985-04-25
US4596018A (en) 1986-06-17
DK251185D0 (da) 1985-06-04
FI852290A0 (fi) 1985-06-07
EP0146509A3 (en) 1987-06-03
ES8601579A1 (es) 1985-10-16
CA1249649A (en) 1989-01-31
ES536482A0 (es) 1985-10-16
NO852101L (no) 1985-05-24
EP0146509A2 (en) 1985-06-26
IL73160A0 (en) 1985-01-31
FI852290L (fi) 1985-06-07
DK251185A (da) 1985-06-04

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